Year |
Citation |
Score |
2016 |
Deen DA, Miller RA, Osinsky AV, Downey BP, Storm DF, Meyer DJ, Katzer DS, Nepal N. Polarization-mediated Debye-screening of surface potential fluctuations in dual-channel AlN/GaN high electron mobility transistors Journal of Applied Physics. 120: 235704. DOI: 10.1063/1.4972225 |
0.464 |
|
2016 |
Deen DA, Storm DF, Katzer DS, Bass R, Meyer DJ. Suppression of surface-originated gate lag by a dual-channel AlN/GaN high electron mobility transistor architecture Applied Physics Letters. 109: 63504. DOI: 10.1063/1.4961009 |
0.518 |
|
2014 |
Deen DA, Olson EJ, Ebrish MA, Koester SJ. Graphene-based quantum capacitance wireless vapor sensors Ieee Sensors Journal. 14: 1459-1466. DOI: 10.1109/Jsen.2013.2295302 |
0.3 |
|
2014 |
Deen DA, Storm DF, Meyer DJ, Bass R, Binari SC, Gougousi T, Evans KR. Impact of barrier thickness on transistor performance in AlN/GaN high electron mobility transistors grown on free-standing GaN substrates Applied Physics Letters. 105. DOI: 10.1063/1.4895105 |
0.565 |
|
2014 |
Deen DA, Osinsky A, Miller R. Bimodal wireless sensing with dual-channel wide bandgap heterostructure varactors Applied Physics Letters. 104: 93506. DOI: 10.1063/1.4867169 |
0.345 |
|
2013 |
Meyer DJ, Deen DA, Storm DF, Ancona MG, Scott Katzer D, Bass R, Roussos JA, Downey BP, Binari SC, Gougousi T, Paskova T, Preble EA, Evans KR. High electron velocity submicrometer AlN/GaN MOS-hemts on freestanding GaN substrates Ieee Electron Device Letters. 34: 199-201. DOI: 10.1109/Led.2012.2228463 |
0.547 |
|
2013 |
Deen DA, Champlain JG, Koester SJ. Multilayer HfO2/TiO2 gate dielectric engineering of graphene field effect transistors Applied Physics Letters. 103. DOI: 10.1063/1.4818754 |
0.437 |
|
2013 |
Storm DF, Deen DA, Katzer DS, Meyer DJ, Binari SC, Gougousi T, Paskova T, Preble EA, Evans KR, Smith DJ. Ultrathin-barrier AlN/GaN heterostructures grown by rf plasma-assisted molecular beam epitaxy on freestanding GaN substrates Journal of Crystal Growth. 380: 14-17. DOI: 10.1016/J.Jcrysgro.2013.05.029 |
0.481 |
|
2012 |
Meyer DJ, Katzer DS, Bass R, Garces NY, Ancona MG, Deen DA, Storm DF, Binari SC. N-polar n + GaN cap development for low ohmic contact resistance to inverted HEMTs Physica Status Solidi (C) Current Topics in Solid State Physics. 9: 894-897. DOI: 10.1002/Pssc.201100431 |
0.456 |
|
2011 |
Deen DA, Champlain JG. High frequency capacitance-voltage technique for the extraction of interface trap density of the heterojunction capacitor: Terman's method revised Applied Physics Letters. 99. DOI: 10.1063/1.3615279 |
0.394 |
|
2011 |
Deen DA, Storm DF, Bass R, Meyer DJ, Katzer DS, Binari SC, Lacis JW, Gougousi T. Atomic layer deposited Ta2O5 gate insulation for enhancing breakdown voltage of AlN/GaN high electron mobility transistors Applied Physics Letters. 98. DOI: 10.1063/1.3531551 |
0.555 |
|
2011 |
Deen D, Storm D, Meyer D, Katzer DS, Bass R, Binari S, Gougousi T. AlN/GaN HEMTs with high-κ ALD HfO2 or Ta2O5 gate insulation Physica Status Solidi (C) Current Topics in Solid State Physics. 8: 2420-2423. DOI: 10.1002/Pssc.201001071 |
0.526 |
|
2011 |
Meyer DJ, Katzer DS, Deen DA, Storm DF, Binari SC, Gougousi T. HfO 2-insulated gate N-polar GaN HEMTs with high breakdown voltage Physica Status Solidi (a) Applications and Materials Science. 208: 1630-1633. DOI: 10.1002/Pssa.201001080 |
0.517 |
|
2010 |
Storm DF, Katzer DS, Deen DA, Bass R, Meyer DJ, Roussos JA, Binari SC, Paskova T, Preble EA, Evans KR. Proximity effects of beryllium-doped GaN buffer layers on the electronic properties of epitaxial AlGaN/GaN heterostructures Solid-State Electronics. 54: 1470-1473. DOI: 10.1016/J.Sse.2010.05.041 |
0.534 |
|
2010 |
Deen DA, Storm DF, Katzer DS, Meyer DJ, Binari SC. Dependence of ohmic contact resistance on barrier thickness of AlN/GaN HEMT structures Solid-State Electronics. 54: 613-615. DOI: 10.1016/J.Sse.2009.11.012 |
0.43 |
|
2009 |
Deen DA, Binari SC, Storm DF, Katzer DS, Roussos JA, Hackley JC, Gougousi T. AlN/GaN insulated gate HEMTs with HfO2 gate dielectric Electronics Letters. 45: 423-424. DOI: 10.1049/El.2009.3688 |
0.523 |
|
2008 |
Zimmermann T, Deen D, Cao Y, Simon J, Fay P, Jena D, Xing HG. AlN/GaN insulated-gate HEMTs with 2.3 A/mm output current and 480 mS/mm transconductance Ieee Electron Device Letters. 29: 661-664. DOI: 10.1109/Led.2008.923318 |
0.546 |
|
2008 |
Deen D, Zimmermann T, Cao Y, Jena D, Xing HG. 2.3 nm barrier AlN/GaN HEMTs with insulated gates Physica Status Solidi (C). 5: 2047-2049. DOI: 10.1002/Pssc.200878749 |
0.6 |
|
2008 |
Zimmermann T, Deen D, Cao Y, Jena D, Xing HG. Formation of ohmic contacts to ultra-thin channel AlN/GaN HEMTs Physica Status Solidi (C). 5: 2030-2032. DOI: 10.1002/Pssc.200778724 |
0.577 |
|
2006 |
Dedigama AR, Deen D, Murphy SQ, Goel N, Keay JC, Santos MB, Suzuki K, Miyashita S, Hirayama Y. Current focusing in InSb heterostructures Physica E: Low-Dimensional Systems and Nanostructures. 34: 647-650. DOI: 10.1016/J.Physe.2006.03.050 |
0.433 |
|
2005 |
Kunets VP, Black WT, Mazur YI, Guzun D, Salamo GJ, Goel N, Mishima TD, Deen DA, Murphy SQ, Santos MB. Highly sensitive micro-Hall devices based on Al 0.12In 0.88SbInSb heterostructures Journal of Applied Physics. 98. DOI: 10.1063/1.1954867 |
0.382 |
|
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