Vincent T. Woods, Ph.D.
Affiliations: | 2006 | Georgia State University, Atlanta, GA, United States |
Area:
Condensed Matter PhysicsGoogle:
"Vincent Woods"Parents
Sign in to add mentorNikolaus Dietz | grad student | 2006 | Georgia State | |
(High pressure chemical vapor deposition: A novel approach for the growth of indium nitride.) |
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Publications
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Alevli M, Durkaya G, Kirste R, et al. (2006) Properties of InN layers grown by High Pressure CVD Mrs Proceedings. 955 |
Alevli M, Durkaya G, Weerasekara A, et al. (2006) Characterization of InN layers grown by high-pressure chemical vapor deposition Applied Physics Letters. 89 |
Bhatta RP, Thoms BD, Alevli M, et al. (2006) Surface structure, composition, and polarity of indium nitride grown by high-pressure chemical vapor deposition Applied Physics Letters. 88 |
Woods V, Dietz N. (2006) InN growth by high-pressures chemical vapor deposition: Real-time optical growth characterization Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 127: 239-250 |
Fenwick WE, Woods VT, Pan M, et al. (2006) Metal organic chemical vapor deposition of ZnO Materials Research Society Symposium Proceedings. 891: 393-398 |
Fenwick WE, Woods VT, Pan M, et al. (2005) Metal Organic Chemical Vapor Deposition of Zinc Oxide Mrs Proceedings. 892 |
Alevli M, Durkaya G, Woods V, et al. (2005) Properties of InN grown by High-Pressure CVD Mrs Proceedings. 892 |
Dietz N, Alevli M, Kang H, et al. (2005) The growth of InN and related alloys by high-pressure CVD Proceedings of Spie - the International Society For Optical Engineering. 5912: 1-8 |
Woods V, Senawirante J, Dietz N. (2005) Nucleation and growth of InN by high-pressure chemical vapor deposition: Optical monitoring Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1790-1794 |
Dietz N, Straßburg M, Woods V. (2005) Real-time optical monitoring of ammonia flow and decomposition kinetics under high-pressure chemical vapor deposition conditions Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1221-1227 |