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Ye Xu

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2006 Materials Science and Engineering Stanford University, Palo Alto, CA 
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Charles B. Musgrave grad student 2006 Stanford
 (Quantum chemical simulations of atomic layer deposition of metal oxides and metal nitrides.)

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Xu Y, Musgrave CB. (2005) Atomic layer deposition of high- κ dielectrics on nitrided silicon surfaces Applied Physics Letters. 86: 1-3
Xu Y, Musgrave CB. (2005) A chemical mechanism for nitrogen incorporation into HfO2 ALD films using ammonia and alkylamide as precursors Surface Science. 591: L280-L285
Xu Y, Musgrave CB. (2005) Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors Chemical Physics Letters. 407: 272-275
Xu Y, Musgrave CB. (2004) A DFT Study of the Al2O3 Atomic Layer Deposition on SAMs: Effect of SAM Termination Chemistry of Materials. 16: 646-653
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