Erik N. Hoggan, Ph.D.
Affiliations: | 2002 | North Carolina State University, Raleigh, NC |
Area:
Chemical EngineeringGoogle:
"Erik Hoggan"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Ruben G. Carbonell | grad student | 2002 | NCSU | |
| (Spin coating and photolithography using liquid and supercritical carbon dioxide.) | ||||
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Publications
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| Hoggan EN, Wang K, Flowers D, et al. (2004) "Dry" lithography using liquid and supercritical carbon dioxide based chemistries and processes Ieee Transactions On Semiconductor Manufacturing. 17: 510-516 |
| Hoggan EN, Flowers D, Wang K, et al. (2004) Spin Coating of Photoresists Using Liquid Carbon Dioxide Industrial and Engineering Chemistry Research. 43: 2113-2122 |
| Hoggan EN, Flowers D, DeSimone JM, et al. (2002) Spin coating and photolithography using liquid and supercritical carbon dioxide Proceedings of Spie - the International Society For Optical Engineering. 4690: 1217-1223 |
| Flowers D, Hoggan E, DeSimone JM, et al. (2001) Designing Photoresist Systems for Microlithography in Carbon Dioxide Mrs Proceedings. 705 |
| Flowers D, Hoggan E, DeSimone JM, et al. (2001) All CO2-Processed Fluoropolymer-Containing Photoresist Systems Mrs Proceedings. 705 |
| McAdams CL, Flowers D, Hoggan EN, et al. (2001) All CO2-processed 157-nm fluoropolymer-containing photoresist systems Proceedings of Spie - the International Society For Optical Engineering. 4345: 327-334 |