Andrew V. Teplyakov
Affiliations: | Department of Chemistry and Biochemistry | University of Delaware, Newark, DE, United States |
Area:
Analytical ChemistryWebsite:
https://www.chem.udel.edu/people/full-list-searchable/andrewtGoogle:
"Andrew V. Teplyakov"Bio:
http://www1.udel.edu/chem/teplyakov/main.htm
https://sites.udel.edu/teplyakov/andrew-v-teplyakov-cv/
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Parents
Sign in to add mentorBrian Edward Bent | grad student | 1997 | Columbia | |
(Bonding and reactions of hydrocarbons and their fragments on single crystal surfaces of copper and copper-platinum alloy: identification of surface intermediates and reaction mechanisms.) | ||||
Stacey F. Bent | post-doc | 1996-1998 | NYU |
Children
Sign in to add traineeAnna T. Mathauser | grad student | 2004 | University of Delaware |
Semyon Bocharov | grad student | 2006 | University of Delaware |
Laurent Pirolli | grad student | 2006 | University of Delaware |
Timothy R. Leftwich | grad student | 2009 | University of Delaware |
Mark R. Madachik | grad student | 2010 | University of Delaware |
Juan C. Rodriguez-Reyes | grad student | 2010 | University of Delaware |
Kathryn A. Perrine | grad student | 2011 | University of Delaware |
Fangyuan Tian | grad student | 2013 | University of Delaware |
Jia-Ming Lin | grad student | 2014 | University of Delaware |
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Publications
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Lundgren EAS, Byron C, Constantinou P, et al. (2023) Adsorption and Thermal Decomposition of Triphenyl Bismuth on Silicon (001). The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 127: 16433-16441 |
Mameli A, Teplyakov AV. (2023) Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations. Accounts of Chemical Research. 56: 2084-2095 |
Parke T, Silva-Quinones D, Wang GT, et al. (2022) The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry |
Silva-Quinones D, Butera RE, Wang GT, et al. (2021) Solution Chemistry to Control Boron-Containing Monolayers on Silicon: Reactions of Boric Acid and 4-Fluorophenylboronic Acid with H- and Cl-terminated Si(100). Langmuir : the Acs Journal of Surfaces and Colloids |
Laborda Lalaguna P, Hedgeland H, Ryan P, et al. (2021) Determination of the preferred reaction pathway of acetophenone on Si(001) using photoelectron diffraction. Journal of Physics. Condensed Matter : An Institute of Physics Journal |
He C, Cai X, Wei SH, et al. (2020) Self-Catalyzed Sensitization of CuO Nanowires via a Solvent-free Click Reaction. Langmuir : the Acs Journal of Surfaces and Colloids |
Silva-Quinones D, He C, Butera RE, et al. (2020) Reaction of BCl with H- and Cl-terminated Si(1 0 0) as a pathway for selective, monolayer doping through wet chemistry. Applied Surface Science. 533 |
Silva-Quinones D, He C, Dwyer KJ, et al. (2020) Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si-N Bonds. Langmuir : the Acs Journal of Surfaces and Colloids |
Rani S, Byron C, Teplyakov AV. (2020) Formation of silica-supported platinum nanoparticles as a function of preparation conditions and boron impregnation. The Journal of Chemical Physics. 152: 134701 |
Konh M, Lien C, Cai X, et al. (2020) ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands Organometallics. 39: 1024-1034 |