| Year |
Citation |
Score |
| 2023 |
Lundgren EAS, Byron C, Constantinou P, Stock TJZ, Curson NJ, Thomsen L, Warschkow O, Teplyakov AV, Schofield SR. Adsorption and Thermal Decomposition of Triphenyl Bismuth on Silicon (001). The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 127: 16433-16441. PMID 37646007 DOI: 10.1021/acs.jpcc.3c03916 |
0.52 |
|
| 2023 |
Mameli A, Teplyakov AV. Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations. Accounts of Chemical Research. 56: 2084-2095. PMID 37463289 DOI: 10.1021/acs.accounts.3c00221 |
0.428 |
|
| 2022 |
Parke T, Silva-Quinones D, Wang GT, Teplyakov AV. The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. PMID 36516050 DOI: 10.1002/cphc.202200724 |
0.72 |
|
| 2021 |
Silva-Quinones D, Butera RE, Wang GT, Teplyakov AV. Solution Chemistry to Control Boron-Containing Monolayers on Silicon: Reactions of Boric Acid and 4-Fluorophenylboronic Acid with H- and Cl-terminated Si(100). Langmuir : the Acs Journal of Surfaces and Colloids. PMID 34062064 DOI: 10.1021/acs.langmuir.1c00763 |
0.658 |
|
| 2021 |
Laborda Lalaguna P, Hedgeland H, Ryan P, Warschkow O, Muntwiler M, Teplyakov A, Schofield SR, Duncan DA. Determination of the preferred reaction pathway of acetophenone on Si(001) using photoelectron diffraction. Journal of Physics. Condensed Matter : An Institute of Physics Journal. PMID 33592594 DOI: 10.1088/1361-648X/abe6dd |
0.326 |
|
| 2020 |
He C, Cai X, Wei SH, Janotti A, Teplyakov AV. Self-Catalyzed Sensitization of CuO Nanowires via a Solvent-free Click Reaction. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 33238708 DOI: 10.1021/acs.langmuir.0c02262 |
0.482 |
|
| 2020 |
Silva-Quinones D, He C, Butera RE, Wang GT, Teplyakov AV. Reaction of BCl with H- and Cl-terminated Si(1 0 0) as a pathway for selective, monolayer doping through wet chemistry. Applied Surface Science. 533. PMID 33100450 DOI: 10.1016/J.Apsusc.2020.146907 |
0.751 |
|
| 2020 |
Silva-Quinones D, He C, Dwyer KJ, Butera RE, Wang GT, Teplyakov AV. Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si-N Bonds. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 33086003 DOI: 10.1021/acs.langmuir.0c02088 |
0.739 |
|
| 2020 |
Rani S, Byron C, Teplyakov AV. Formation of silica-supported platinum nanoparticles as a function of preparation conditions and boron impregnation. The Journal of Chemical Physics. 152: 134701. PMID 32268738 DOI: 10.1063/1.5142503 |
0.436 |
|
| 2020 |
Konh M, Lien C, Cai X, Wei S, Janotti A, Zaera F, Teplyakov AV. ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands Organometallics. 39: 1024-1034. DOI: 10.1021/Acs.Organomet.9B00781 |
0.429 |
|
| 2020 |
Chen B, Qin X, Lien C, Bouman M, Konh M, Duan Y, Teplyakov AV, Zaera F. Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces Organometallics. 39: 928-940. DOI: 10.1021/Acs.Organomet.9B00636 |
0.399 |
|
| 2019 |
Konh M, He C, Lin X, Guo X, Pallem V, Opila RL, Teplyakov AV, Wang Z, Yuan B. Molecular mechanisms of atomic layer etching of cobalt with sequential exposure to molecular chlorine and diketones. Journal of Vacuum Science & Technology. a, Vacuum, Surfaces, and Films : An Official Journal of the American Vacuum Society. 37: 021004. PMID 30940989 DOI: 10.1116/1.5082187 |
0.499 |
|
| 2019 |
O’Donnell KM, Byron C, Moore G, Thomsen L, Warschkow O, Teplyakov A, Schofield SR. Dissociation of CH3–O as a Driving Force for Methoxyacetophenone Adsorption on Si(001) The Journal of Physical Chemistry C. 123: 22239-22249. DOI: 10.1021/Acs.Jpcc.9B04954 |
0.593 |
|
| 2019 |
He C, Janzen R, Bai S, Teplyakov AV. “Clickable” Metal-Oxide Nanomaterials Surface-Engineered by Gas-Phase Covalent Functionalization with Prop-2-ynoic Acid Chemistry of Materials. 31: 2068-2077. DOI: 10.1021/Acs.Chemmater.8B05124 |
0.424 |
|
| 2019 |
Sullivan SP, Leftwich TR, Goodwin CM, Ni C, Teplyakov AV, Beebe TP. Growth and chemical modification of silicon nanostructures templated in molecule corrals: Parallels with the surface chemistry of single crystalline silicon Surface Science. 683: 38-45. DOI: 10.1016/J.Susc.2019.01.010 |
0.832 |
|
| 2019 |
Konh M, Lien C, Zaera F, Teplyakov AV. Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces Applied Surface Science. 488: 468-476. DOI: 10.1016/J.Apsusc.2019.05.209 |
0.549 |
|
| 2018 |
He C, Teplyakov A. 29,31-H Phthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains its Metalation Ability. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 30136849 DOI: 10.1021/Acs.Langmuir.8B02259 |
0.612 |
|
| 2018 |
Lien C, Konh M, Chen B, Teplyakov AV, Zaera F. Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe. The Journal of Physical Chemistry Letters. 4602-4606. PMID 30067025 DOI: 10.1021/Acs.Jpclett.8B02125 |
0.52 |
|
| 2018 |
Konh M, He C, Li Z, Bai S, Galoppini E, Gundlach L, Teplyakov AV. Comparison of ZnO surface modification with gas-phase propiolic acid at high and medium vacuum conditions. Journal of Vacuum Science & Technology. a, Vacuum, Surfaces, and Films : An Official Journal of the American Vacuum Society. 36: 041404. PMID 29983480 DOI: 10.1116/1.5031945 |
0.459 |
|
| 2018 |
Williams MG, Teplyakov AV. Indirect photopatterning of functionalized organic monolayers via copper-catalyzed "click chemistry". Applied Surface Science. 447: 535-541. PMID 29955204 DOI: 10.1016/J.Apsusc.2018.04.007 |
0.503 |
|
| 2018 |
Zhao J, Konh M, Teplyakov A. Surface Chemistry of Thermal Dry Etching of Cobalt Thin Films Using Hexafluoroacetylacetone (hfacH). Applied Surface Science. 455: 438-445. PMID 29937610 DOI: 10.1016/J.Apsusc.2018.05.182 |
0.572 |
|
| 2018 |
Barry ST, Teplyakov AV, Zaera F. The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces. Accounts of Chemical Research. PMID 29489341 DOI: 10.1021/Acs.Accounts.8B00012 |
0.521 |
|
| 2018 |
He C, Abraham B, Fan H, Harmer R, Li Z, Galoppini E, Gundlach L, Teplyakov A. Morphology-Preserving Sensitization of ZnO Nanorod Surfaces via Click-Chemistry. The Journal of Physical Chemistry Letters. PMID 29364670 DOI: 10.1021/Acs.Jpclett.7B03388 |
0.522 |
|
| 2018 |
Duan Y, Rani S, Newberg JT, Teplyakov AV. Investigation of the influence of oxygen plasma on supported silver nanoparticles. Journal of Vacuum Science & Technology. a, Vacuum, Surfaces, and Films : An Official Journal of the American Vacuum Society. 36: 01B101. PMID 28867872 DOI: 10.1116/1.4986208 |
0.412 |
|
| 2018 |
Silva-Quiñones D, He C, Jacome-Collazos M, Benndorf C, Teplyakov AV, Rodriguez-Reyes JCF. Identification of Surface Processes in Individual Minerals of a Complex Ore through the Analysis of Polished Sections Using Polarization Microscopy and X-ray Photoelectron Spectroscopy (XPS) Minerals. 8: 427. DOI: 10.3390/Min8100427 |
0.473 |
|
| 2017 |
Gao F, Aminane S, Bai S, Teplyakov AV. Chemical Protection of Material Morphology: Robust and Gentle Gas-Phase Surface Functionalization of ZnO with Propiolic Acid. Chemistry of Materials : a Publication of the American Chemical Society. 29: 4063-4071. PMID 29151674 DOI: 10.1021/Acs.Chemmater.7B00747 |
0.525 |
|
| 2017 |
Zhao J, Gao F, Pujari SP, Zuilhof H, Teplyakov A. Universal Calibration of Computationally Predicted N 1s Binding Energies for Interpretation of XPS Experimental Measurements. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28921989 DOI: 10.1021/Acs.Langmuir.7B02301 |
0.39 |
|
| 2017 |
Duan Y, Rani S, Zhang Y, Ni C, Newberg JT, Teplyakov AV. Silver Deposition onto Modified Silicon Substrates. The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 121: 7240-7247. PMID 28652890 DOI: 10.1021/Acs.Jpcc.6B12896 |
0.478 |
|
| 2017 |
Duan Y, Teplyakov AV. Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursor. The Journal of Chemical Physics. 146: 052814. PMID 28178799 DOI: 10.1063/1.4971287 |
0.539 |
|
| 2017 |
Williams MG, Gao F, BenDhiab I, Teplyakov A. Carbon Nanotubes Covalently Attached to Functionalized Surfaces Directly through the Carbon Cage. Langmuir : the Acs Journal of Surfaces and Colloids. 33: 1121-1131. PMID 28166639 DOI: 10.1021/Acs.Langmuir.6B02641 |
0.42 |
|
| 2017 |
Gao F, Teplyakov AV. A Monolayer of Hydrazine Facilitates Direct Covalent Attachment of C60 Fullerene to Silicon Surface. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28157324 DOI: 10.1021/Acs.Langmuir.6B03975 |
0.543 |
|
| 2017 |
Chen B, Duan Y, Yao Y, Ma Q, Coyle JP, Barry ST, Teplyakov AV, Zaera F. Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 01B124. DOI: 10.1116/1.4971990 |
0.483 |
|
| 2017 |
Zhao J, Noffke BW, Raghavachari K, Teplyakov AV. Temperature-Programmed Desorption (TPD) and Density Functional Theory (DFT) Study Comparing the Adsorption of Ethyl Halides on the Si(100) Surface The Journal of Physical Chemistry C. 121: 7208-7213. DOI: 10.1021/Acs.Jpcc.6B12184 |
0.508 |
|
| 2017 |
Gao F, Teplyakov AV. Challenges and opportunities in chemical functionalization of semiconductor surfaces Applied Surface Science. 399: 375-386. DOI: 10.1016/J.Apsusc.2016.12.083 |
0.52 |
|
| 2016 |
Gao F, Teplyakov AV. Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces. The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 120: 5539-5548. PMID 27822334 DOI: 10.1021/Acs.Jpcc.5B12424 |
0.616 |
|
| 2016 |
Duan Y, Pirolli L, Teplyakov AV. Investigation of the H2S poisoning process for sensing composite material based on carbon nanotubes and metal oxides. Sensors and Actuators. B, Chemical. 235: 213-221. PMID 27812240 DOI: 10.1016/J.Snb.2016.05.014 |
0.779 |
|
| 2016 |
Williams MG, Teplyakov AV. Building High-Coverage Monolayers of Covalently Bound Magnetic Nanoparticles. Applied Surface Science. 388: 461-467. PMID 27789916 DOI: 10.1016/J.Apsusc.2015.11.212 |
0.403 |
|
| 2016 |
Kung H, Duan Y, Williams MG, Teplyakov AV. Transmetalation Process as a Route for Preparation of Zinc Oxide-Supported Copper Nanoparticles. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 27351220 DOI: 10.1021/Acs.Langmuir.6B00061 |
0.392 |
|
| 2016 |
Liu Y, Williams MG, Miller TJ, Teplyakov AV. Nanoparticle layer deposition for highly controlled multilayer formation based on high- coverage monolayers of nanoparticles. Thin Solid Films. 598: 16-24. PMID 26726273 DOI: 10.1016/J.Tsf.2015.11.082 |
0.343 |
|
| 2016 |
Zhao J, Madachik MR, O’Donnell KM, Moore G, Thomsen L, Warschkow O, Schofield SR, Teplyakov A. Adsorption and Dissociation of a Bicyclic Tertiary Diamine, Triethylenediamine, on a Si(100)-2 × 1 Surface The Journal of Physical Chemistry C. 120: 28672-28681. DOI: 10.1021/Acs.Jpcc.6B10485 |
0.864 |
|
| 2016 |
Gao F, Teplyakov AV. Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces Journal of Physical Chemistry C. 120: 5539-5548. DOI: 10.1021/acs.jpcc.5b12424 |
0.541 |
|
| 2015 |
Duan Y, Gao F, Teplyakov AV. Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface. The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 119: 27018-27027. PMID 27482303 DOI: 10.1021/Acs.Jpcc.5B08287 |
0.453 |
|
| 2015 |
Kung H, Teplyakov A. Selectivity and Mechanism of Thermal Decomposition of β-diketones on ZnO Powder. Journal of Catalysis. 330: 145-153. PMID 26309333 DOI: 10.1016/J.Jcat.2015.07.021 |
0.465 |
|
| 2015 |
Zhao J, Lin JM, Rodríguez-Reyes JCF, Teplyakov AV. Interpretation of temperature-programmed desorption data with multivariate curve resolution: Distinguishing sample and background desorption mathematically Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33. DOI: 10.1116/1.4934763 |
0.654 |
|
| 2015 |
Duan Y, Gao F, Teplyakov AV. Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface Journal of Physical Chemistry C. 119: 27018-27027. DOI: 10.1021/acs.jpcc.5b08287 |
0.476 |
|
| 2015 |
Duan Y, Lin JM, Teplyakov AV. Computational investigation of electronic and steric effects in surface reactions of metalorganic precursors on functionalized silicon surfaces Journal of Physical Chemistry C. 119: 13670-13681. DOI: 10.1021/Acs.Jpcc.5B02722 |
0.718 |
|
| 2014 |
Kung H, Teplyakov A. In situ investigation of organic ligand displacement processes on ZnO powder surface. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 27: 054007. PMID 25414158 DOI: 10.1088/0953-8984/27/5/054007 |
0.421 |
|
| 2014 |
Kung H, Teplyakov A. In situ investigation of organic ligand displacement processes on ZnO powder surface. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 27: 054007. PMID 25414158 DOI: 10.1088/0953-8984/27/5/054007 |
0.421 |
|
| 2014 |
Miller T, Teplyakov AV. Attachment chemistry of PCBM to a primary-amine-terminated organic monolayer on a Si(111) surface. Langmuir : the Acs Journal of Surfaces and Colloids. 30: 5105-14. PMID 24735094 DOI: 10.1021/La404798K |
0.593 |
|
| 2014 |
Gao F, Teplyakov AV. Reaction of hydrazine with a chlorine-terminated Si(111) surface Journal of Physical Chemistry C. 118: 27998-28006. DOI: 10.1021/Jp5095307 |
0.62 |
|
| 2014 |
Cui Y, Tian F, Gao F, Teplyakov AV. Building organic monolayers based on fluorinated amines on the Si(111) surface Journal of Physical Chemistry C. 118: 26721-26728. DOI: 10.1021/Jp507158X |
0.752 |
|
| 2014 |
Tian F, Cui Y, Teplyakov AV. Nitroxidation of H-terminated Si(111) surfaces with nitrobenzene and nitrosobenzene Journal of Physical Chemistry C. 118: 502-512. DOI: 10.1021/Jp4102702 |
0.728 |
|
| 2014 |
Kung H, Teplyakov AV. Formation of copper nanoparticles on ZnO powder by a surface-limited reaction Journal of Physical Chemistry C. 118: 1990-1998. DOI: 10.1021/Jp409902C |
0.495 |
|
| 2014 |
Miller T, Pirolli L, Deng F, Ni C, Teplyakov AV. Structurally different interfaces between electrospark-deposited titanium carbonitride and tungsten carbide films on steel Surface and Coatings Technology. 258: 814-821. DOI: 10.1016/J.Surfcoat.2014.07.076 |
0.781 |
|
| 2014 |
Gao J, Teplyakov AV. Chemical transformations of acetone on ZnO powder Journal of Catalysis. 319: 136-141. DOI: 10.1016/J.Jcat.2014.08.014 |
0.477 |
|
| 2014 |
Gao J, Teplyakov AV. Thermal transformations of 2-chlorophenol on a surface of ZnO powder catalyst Catalysis Today. 238: 111-117. DOI: 10.1016/J.Cattod.2013.12.053 |
0.513 |
|
| 2013 |
Tian F, Teplyakov AV. Silicon surface functionalization targeting Si-N linkages. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 13-28. PMID 23094599 DOI: 10.1021/La303505S |
0.663 |
|
| 2013 |
Teplyakov AV, Bent SF. Semiconductor surface functionalization for advances in electronics, energy conversion, and dynamic systems Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4810784 |
0.642 |
|
| 2013 |
Lin JM, Teplyakov AV, Rodríguez-Reyes JCF. Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4774031 |
0.67 |
|
| 2013 |
Gao J, Teplyakov AV. Surface species formed during thermal transformation of ethanol on ZnO powder Journal of Catalysis. 300: 163-173. DOI: 10.1016/J.Jcat.2012.12.026 |
0.522 |
|
| 2013 |
Lin JM, Teplyakov AV. Computational investigation of surface reactivity of functionalized silicon surfaces in deposition processes Theoretical Chemistry Accounts. 132: 1-14. DOI: 10.1007/S00214-013-1404-2 |
0.715 |
|
| 2012 |
Liu Y, Chen J, Teplyakov AV. Chemical passivation processes for biofunctionalization schemes on semiconductor surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 15521-8. PMID 23025426 DOI: 10.1021/La302819J |
0.558 |
|
| 2012 |
Perrine KA, Lin JM, Teplyakov AV. Controlling the formation of metallic nanoparticles on functionalized silicon surfaces Journal of Physical Chemistry C. 116: 14431-14444. DOI: 10.1021/Jp3036555 |
0.866 |
|
| 2012 |
Miller T, Lin JM, Pirolli L, Coquilleau L, Luharuka R, Teplyakov AV. Investigation of thin titanium carbonitride coatings deposited onto stainless steel Thin Solid Films. 522: 193-198. DOI: 10.1016/J.Tsf.2012.08.012 |
0.793 |
|
| 2012 |
Tian F, Yang D, Opila RL, Teplyakov AV. Chemical and electrical passivation of Si(1 1 1) surfaces Applied Surface Science. 258: 3019-3026. DOI: 10.1016/J.Apsusc.2011.11.030 |
0.721 |
|
| 2011 |
Tian F, Taber DF, Teplyakov AV. -NH- termination of the Si(111) surface by wet chemistry. Journal of the American Chemical Society. 133: 20769-77. PMID 22081982 DOI: 10.1021/Ja205140H |
0.741 |
|
| 2011 |
Bent SF, Kachian JS, Rodríguez-Reyes JCF, Teplyakov AV. Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity Proceedings of the National Academy of Sciences of the United States of America. 108: 956-960. PMID 21068370 DOI: 10.1073/Pnas.1006656107 |
0.713 |
|
| 2011 |
Perrine KA, Rodríguez-Reyes JCF, Teplyakov AV. Simulating the reactivity of a disordered surface of the TiCN thin film Journal of Physical Chemistry C. 115: 15432-15439. DOI: 10.1021/Jp203294D |
0.781 |
|
| 2011 |
Tian F, Taber DF, Teplyakov AV. NH- termination of the Si(111) surface by wet chemistry Journal of the American Chemical Society. 133: 20769-20777. DOI: 10.1021/ja205140h |
0.678 |
|
| 2010 |
Perrine KA, Teplyakov AV. Metallic nanostructure formation limited by the surface hydrogen on silicon. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 12648-58. PMID 20608693 DOI: 10.1021/La100269M |
0.797 |
|
| 2010 |
Perrine KA, Teplyakov AV. Reactivity of selectively terminated single crystal silicon surfaces. Chemical Society Reviews. 39: 3256-74. PMID 20596551 DOI: 10.1039/B822965C |
0.821 |
|
| 2010 |
Rodríguez-Reyes JCF, Teplyakov AV, Brown SD. Qualitative and quantitative analysis of complex temperature-programmed desorption data by multivariate curve resolution Surface Science. 604: 2043-2054. DOI: 10.1016/J.Susc.2010.08.019 |
0.486 |
|
| 2010 |
Douglass K, Hunt S, Teplyakov A, Opila RL. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire Applied Surface Science. 257: 1469-1472. DOI: 10.1016/J.Apsusc.2010.08.074 |
0.506 |
|
| 2010 |
Tian F, Ni C, Teplyakov AV. Integrity of functional self-assembled monolayers on hydrogen-terminated silicon-on-insulator wafers Applied Surface Science. 257: 1314-1318. DOI: 10.1016/J.Apsusc.2010.08.058 |
0.659 |
|
| 2009 |
Madachik MR, Teplyakov AV. Coadsorption of ethylene and nitrobenzene on Si(100)-2 × 1: Toward surface patterning at the molecular level Journal of Physical Chemistry C. 113: 18270-18275. DOI: 10.1021/Jp9059592 |
0.864 |
|
| 2009 |
Perrine KA, Leftwich TR, Weiland CR, Madachik MR, Opila RL, Teplyakov AV. Reactions of aromatic bifunctional molecules on silicon surfaces: nitrosobenzene and nitrobenzene Journal of Physical Chemistry C. 113: 6643-6653. DOI: 10.1021/Jp8082826 |
0.846 |
|
| 2009 |
Rodríguez-Reyes JCF, Ni C, Bui HP, Beebe TP, Teplyakov AV. Reversible tuning of the surface chemical reactivity of titanium nitride and nitride-carbide diffusion barrier thin films Chemistry of Materials. 21: 5163-5169. DOI: 10.1021/Cm902107H |
0.526 |
|
| 2009 |
Zhang X, Kumar S, Chen J, Teplyakov AV. Covalent attachment of shape-restricted DNA molecules on amine-functionalized Si(1 1 1) surface Surface Science. 603: 2445-2457. DOI: 10.1016/J.Susc.2009.05.023 |
0.457 |
|
| 2009 |
Leftwich TR, Teplyakov AV. Calibration of computationally predicted N 1s binding energies by comparison with X-ray photoelectron spectroscopy measurements Journal of Electron Spectroscopy and Related Phenomena. 175: 31-40. DOI: 10.1016/J.Elspec.2009.07.002 |
0.783 |
|
| 2009 |
Zhang X, Antonopoulos IH, Kumar S, Chen J, Teplyakov AV. Tuning the geometry of shape-restricted DNA molecules on the functionalized Si(1 1 1) Applied Surface Science. 256: 815-818. DOI: 10.1016/J.Apsusc.2009.08.066 |
0.436 |
|
| 2008 |
Leftwich TR, Madachik MR, Teplyakov AV. Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): an ex situ tool for the modification of semiconductor surfaces. Journal of the American Chemical Society. 130: 16216-23. PMID 18989960 DOI: 10.1021/Ja802645T |
0.843 |
|
| 2008 |
Zhang X, Teplyakov AV. Adsorption of C60 buckminster fullerenes on an 11-amino-1-undecene-covered Si(111) substrate. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 810-20. PMID 18085804 DOI: 10.1021/La702631G |
0.558 |
|
| 2008 |
Madachik MR, Teplyakov AV. Unique lack of chemical reactivity for 2,3-dimethyl-2-butene on a Si(100)-2 × 1 surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1241-1247. DOI: 10.1116/1.2966427 |
0.873 |
|
| 2008 |
Rodríguez-Reyes JCF, Teplyakov AV. Role of surface strain in the subsurface migration of adsorbates on silicon Physical Review B - Condensed Matter and Materials Physics. 78. DOI: 10.1103/Physrevb.78.165314 |
0.588 |
|
| 2008 |
Rodríguez-Reyes JCF, Teplyakov AV. Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth Journal of Applied Physics. 104. DOI: 10.1063/1.3000654 |
0.444 |
|
| 2008 |
Rodríguez-Reyes JCF, Teplyakov AV. Chemisorption of tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C-H and C-N bond reactivity leading to low-temperature decomposition pathways Journal of Physical Chemistry C. 112: 9695-9705. DOI: 10.1021/Jp800436W |
0.547 |
|
| 2008 |
Leftwich TR, Teplyakov AV. Cycloaddition reactions of phenylazide and benzylazide on a Si(100)-2 × 1 surface Journal of Physical Chemistry C. 112: 4297-4303. DOI: 10.1021/Jp711367S |
0.84 |
|
| 2008 |
Perrine KA, Skliar DB, Willis BG, Teplyakov AV. Molecular level investigation of 2,2,6,6-tetramethyl-3,5-heptanedione on Si(1 0 0)-2 × 1: Spectroscopic and computational studies Surface Science. 602: 2222-2231. DOI: 10.1016/J.Susc.2008.04.041 |
0.816 |
|
| 2008 |
Leftwich TR, Teplyakov AV. Chemical manipulation of multifunctional hydrocarbons on silicon surfaces Surface Science Reports. 63: 1-71. DOI: 10.1016/J.Surfrep.2007.08.001 |
0.856 |
|
| 2008 |
Madachik MR, Teplyakov AV. Selective blocking of surface reactions on a Si(100)-2×1 surface with reversible coadsorption Acs National Meeting Book of Abstracts. |
0.862 |
|
| 2007 |
Rodríguez-Reyes JC, Teplyakov AV. Chemistry of organometallic compounds on silicon: the first step in film growth. Chemistry (Weinheim An Der Bergstrasse, Germany). 13: 9164-76. PMID 17847150 DOI: 10.1002/Chem.200700856 |
0.806 |
|
| 2007 |
Rodríguez-Reyes JCF, Teplyakov AV. Cooperative nitrogen insertion processes: Thermal transformation of N H3 on a Si(100) surface Physical Review B - Condensed Matter and Materials Physics. 76. DOI: 10.1103/Physrevb.76.075348 |
0.502 |
|
| 2007 |
Rodríguez-Reyes JCF, Teplyakov AV. Surface transamination reaction for tetrakis(dimethylamido)titanium with NH X-terminated Si(100) surfaces Journal of Physical Chemistry C. 111: 16498-16505. DOI: 10.1021/Jp074656R |
0.652 |
|
| 2007 |
Rodríguez-Reyes JCF, Teplyakov AV. Chemistry of diffusion barrier film formation: Adsorption and dissociation of tetrakis(dimethylamino)titanium on Si(100)-2 × 1 Journal of Physical Chemistry C. 111: 4800-4808. DOI: 10.1021/Jp067929B |
0.585 |
|
| 2007 |
Ni C, Zhang Z, Wells M, Beebe TP, Pirolli L, Méndez De Leo LP, Teplyakov AV. Effect of film thickness and the presence of surface fluorine on the structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2 × 1 substrate Thin Solid Films. 515: 3030-3039. DOI: 10.1016/J.Tsf.2006.08.046 |
0.801 |
|
| 2007 |
Pirolli L, Teplyakov AV. Adsorption and thermal chemistry of 1,1,1,5,5,5,-hexafluoro-2,4-pentanedione (hfacH) and (hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) ((hfac)Cu(VTMS)) on TiCN-covered Si(1 0 0) surface Surface Science. 601: 155-164. DOI: 10.1016/J.Susc.2006.09.018 |
0.824 |
|
| 2006 |
Méndez De Leo LP, Pirolli L, Teplyakov AV. Chemistry of 1,1,1,5,5,5-hexafluoro-2,4-pentanedione on Si(100)-2x1. The Journal of Physical Chemistry. B. 110: 14337-44. PMID 16854140 DOI: 10.1021/Jp061512O |
0.862 |
|
| 2006 |
Bocharov S, Dmitrenko O, Méndez De Leo LP, Teplyakov AV. Azide reactions for controlling clean silicon surface chemistry: benzylazide on Si(100)-2 x 1. Journal of the American Chemical Society. 128: 9300-1. PMID 16848443 DOI: 10.1021/Ja0623663 |
0.802 |
|
| 2006 |
Méndez De Leo LP, Teplyakov AV. Nitro group as a means of attaching organic molecules to silicon: nitrobenzene on Si(100)-2 x 1. The Journal of Physical Chemistry. B. 110: 6899-905. PMID 16571000 DOI: 10.1021/Jp057415X |
0.632 |
|
| 2006 |
Pirolli L, Teplyakov AV. Vinyltrimethylsilane (VTMS) as a probe of chemical reactivity of a TiCN diffusion barrier-covered silicon surface. The Journal of Physical Chemistry. B. 110: 4708-16. PMID 16526706 DOI: 10.1021/Jp055904R |
0.866 |
|
| 2006 |
Pirolli L, Teplyakov AV. Molecular view of copper deposition chemistry: (Hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) on a Si(1 0 0)-2 × 1 surface Surface Science. 600: 3313-3320. DOI: 10.1016/J.Susc.2006.06.019 |
0.842 |
|
| 2005 |
Pirolli L, Teplyakov AV. Complex thermal chemistry of vinyltrimethylsilane on Si(100)-2x1. The Journal of Physical Chemistry. B. 109: 8462-8. PMID 16851993 DOI: 10.1021/Jp0467853 |
0.866 |
|
| 2005 |
Bocharov S, Zhang Z, Beebe TP, Teplyakov AV. Structure of a thin barrier film deposited from tetrakis-(dimemylamino)-titanium onto a Si(100)-2×1 substrate Thin Solid Films. 471: 159-165. DOI: 10.1016/J.Tsf.2004.06.136 |
0.733 |
|
| 2004 |
Bocharov S, Teplyakov AV. Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2 × 1 Surface Science. 573: 403-412. DOI: 10.1016/J.Susc.2004.09.044 |
0.815 |
|
| 2004 |
Bocharov S, Teplyakov AV. Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2x1 Acs National Meeting Book of Abstracts. 228. |
0.793 |
|
| 2003 |
Bocharov S, Teplyakov AV. Spectroscopic evidence for hydrogen diffusion through a several-nanometers-thick titanium carbonitride layer on silicon. Journal of the American Chemical Society. 125: 7196-7. PMID 12797791 DOI: 10.1021/Ja035026F |
0.731 |
|
| 2003 |
Müller T, Flynn GW, Mathauser AT, Teplyakov AV. Temperature-programmed desorption studies of n-alkane derivatives on graphite: Desorption energetics and the influence of functional groups on adsorbate self-assembly Langmuir. 19: 2812-2821. DOI: 10.1021/La020856C |
0.812 |
|
| 2003 |
Bocharov S, Mathauser AT, Teplyakov AV. Adsorption and thermal chemistry of nitroethane on Si(100)-2 × 1 Journal of Physical Chemistry B. 107: 7776-7782. DOI: 10.1021/Jp030162S |
0.864 |
|
| 2003 |
Dmitrenko O, Huang W, Polenova TE, Francesconi LC, Wingrave JA, Teplyakov AV. Effect of Cations in Infrared and Computational Analysis of Vanadium-Containing Six-Coordinate Oxotungstates Journal of Physical Chemistry B. 107: 7747-7752. DOI: 10.1021/Jp022560L |
0.309 |
|
| 2003 |
Bulanin KM, Kong MJ, Pirolli L, Mathauser AT, Teplyakov AV. Adsorption and thermal decomposition of diethylaluminum hydride on Si(1 0 0)-2 × 1 Surface Science. 542: 167-176. DOI: 10.1016/S0039-6028(03)01025-2 |
0.857 |
|
| 2003 |
Mathauser AT, Teplyakov AV. The effects of surface poisoning by HCl on cyclization processes on a Cu3Pt(1 1 1) surface Surface Science. 523: 37-47. DOI: 10.1016/S0039-6028(02)02350-6 |
0.841 |
|
| 2002 |
Bulanin KM, Shah AG, Fitzgerald DR, Doren DJ, Teplyakov AV. Kinetically favored adsorbate ordering: Hydrogen and iodine on the Si(100)-2 × 1 surface Journal of Physical Chemistry B. 106: 7286-7289. DOI: 10.1021/Jp020421Y |
0.536 |
|
| 2001 |
Bulanin KM, Shah AG, Teplyakov AV. Infrared spectroscopy studies of iodoethane on Si(100)-2×1: Adsorption and thermal decomposition leading to adsorbate ordering Journal of Chemical Physics. 115: 7187-7195. DOI: 10.1063/1.1405156 |
0.561 |
|
| 2001 |
Mathauser AT, Teplyakov AV. Naphthalene formation on Cu3Pt(111): Dehydrocyclization of 4-phenyl-1-butene Catalysis Letters. 73: 207-210. DOI: 10.1023/A:1016618520988 |
0.808 |
|
| 2001 |
Mathauser AT, He H, Teplyakov AV. Adsorption and thermally induced reactions of halocyclohexanes on a Cu3Pt(1 1 1) surface Surface Science. 479: 213-223. DOI: 10.1016/S0039-6028(01)00971-2 |
0.849 |
|
| 2000 |
Kong MJ, Teplyakov AV, Jagmohan J, Lyubovitsky JG, Mui C, Bent SF. Interaction of Ce cyclic hydrocarbons with a Si(100)-2×1 surface: Adsorption and hydrogenation reactions Journal of Physical Chemistry B. 104: 3000-3007. DOI: 10.1021/Jp992875+ |
0.851 |
|
| 2000 |
He H, Mathauser AT, Teplyakov AV. Self-limiting heterogeneous reactions: Bifunctional hydrocarbon on a bimetallic alloy surface Journal of Physical Chemistry B. 104: 12306-12314. DOI: 10.1021/Jp0026787 |
0.858 |
|
| 1999 |
Lal P, Teplyakov AV, Noah Y, Kong MJ, Wang GT, Bent SF. Adsorption of ethylene on the Ge(100)-2×1 surface: Coverage and time-dependent behavior Journal of Chemical Physics. 110: 10545-10553. DOI: 10.1063/1.478986 |
0.767 |
|
| 1999 |
Gurevich AB, Bent BE, Teplyakov AV, Chen JG. NEXAFS investigation of the formation and decomposition of CuO and Cu2O thin films on Cu(100) Surface Science. 442. DOI: 10.1016/S0039-6028(99)00913-9 |
0.694 |
|
| 1998 |
Teplyakov AV, Kong MJ, Bent SF. Diels-Alder reactions of butadienes with the Si(100)-2×1 surface as a dienophile: Vibrational spectroscopy, thermal desorption and near edge x-ray absorption fine structure studies Journal of Chemical Physics. 108: 4599-4606. DOI: 10.1063/1.475870 |
0.737 |
|
| 1998 |
Teplyakov AV, Gurevich AB, Garland ER, Bent BE, Chen JG. Mechanism of dehydrocyclization of 1-hexene to benzene on Cu3Pt(111): Identification of 1,3,5-hexatriene as reaction intermediate Langmuir. 14: 1337-1344. DOI: 10.1021/La970731L |
0.755 |
|
| 1998 |
Gurevich AB, Teplyakov AV, Yang MX, Bent BE, Holbrook MT, Bare SR. Synthesis, bonding, and reactions of π-bonded allyl groups on Cu(100): Allyl radical ejection Langmuir. 14: 1419-1427. DOI: 10.1021/La970724X |
0.744 |
|
| 1998 |
Teplyakov AV, Lal P, Noah YA, Bent SF. Evidence for a retro-Diels-Alder reaction on a single crystalline surface: Butadienes on Ge(100) [16] Journal of the American Chemical Society. 120: 7377-7378. DOI: 10.1021/Ja980243F |
0.687 |
|
| 1998 |
Teplyakov A, Bent B, Eng J, Chen J. Vibrational mode-softening of alkanes on clean and modified Cu and Mo surfaces: absence of a simple correlation with thermal desorption temperatures Surface Science. 399: L342-L350. DOI: 10.1016/S0039-6028(97)00992-8 |
0.692 |
|
| 1998 |
Lusvardi VS, Barteau MA, Chen JG, Eng J, Frühberger B, Teplyakov A. An NEXAFS investigation of the reduction and reoxidation of TiO2(001) Surface Science. 397: 237-250. DOI: 10.1016/S0039-6028(97)00740-1 |
0.456 |
|
| 1998 |
Teplyakov AV, Gurevich AB, Yang MX, Bent BE, Chen JG. NEXAFS and TPD studies of molecular adsorption of hydrocarbons on Cu(100): segmental correlations with the heats of adsorption Surface Science. 396: 340-348. DOI: 10.1016/S0039-6028(97)00688-2 |
0.725 |
|
| 1998 |
Yang MX, Teplyakov AV, Bent BE. Regioselectivity of deuterium atom addition to olefin monolayers on Cu(100) Journal of Physical Chemistry B. 102: 2985-2990. |
0.343 |
|
| 1998 |
Kong MJ, Teplyakov AV, Lyubovitsky JG, Bent SF. NEXAFS studies of adsorption of benzene on Si(100)-2 x 1 Surface Science. 411: 286-293. |
0.56 |
|
| 1998 |
Teplyakov AV, Gurevich AB, Yang MX, Bent BE, Chen JG. NEXAFS and TPD studies of molecular adsorption of hydrocarbons on Cu(100): Segmental correlations with the heats of adsorption Surface Science. 396: 340-348. |
0.371 |
|
| 1997 |
Teplyakov AV, Kong MJ, Bent SF. Vibrational spectroscopic studies of Diels-Alder reactions with the Si(100)-2x1 surface as a dienophile Journal of the American Chemical Society. 119: 11100-11101. DOI: 10.1021/Ja972246I |
0.679 |
|
| 1997 |
Teplyakov AV, Bent BE. Mechanism of dehydrocyclization of 1-hexene to benzene on Cu3Pt(111) Journal of Physical Chemistry B. 101: 9052-9059. |
0.386 |
|
| 1997 |
Kash PW, Yang MX, Teplyakov AV, Flynn GW, Bent BE. Chemical displacement of molecules adsorbed on copper surfaces: Low-temperature studies with applications to surface reactions Journal of Physical Chemistry B. 101: 7908-7918. |
0.493 |
|
| 1996 |
Teplyakov AV, Bent BE. Infrared spectroscopic study of the chemical displacement of hydrocarbon monolayers from a Cu(100) surface Chemical Physics Letters. 260: 65-70. DOI: 10.1016/0009-2614(96)00846-9 |
0.75 |
|
| 1996 |
Teplyakov AV, Bent BE. Dehydrocyclization of 1-hexene to benzene on Cu3Pt(111) Catalysis Letters. 42: 1-4. DOI: 10.1007/Bf00814459 |
0.755 |
|
| 1995 |
Teplyakov AV, Bent BE. Distinguishing direct and quasi-direct mechanisms for an Eley-Rideal gas/surface reaction. Stereochemistry of H addition to cyclohexene on Cu(100) Journal of the Chemical Society, Faraday Transactions. 91: 3645-3654. DOI: 10.1039/Ft9959103645 |
0.767 |
|
| 1995 |
Teplyakov AV, Bent BE. .beta.-Hydride Elimination from Alkyl and Cycloalkyl Groups on a Cu(100) Surface: Ring Strain and Planarity of the Transition State Journal of the American Chemical Society. 117: 10076-10087. DOI: 10.1021/Ja00145A019 |
0.651 |
|
| 1995 |
Teplyakov AV, Bent BE. β-hydride elimination from alkyl and cycloalkyl groups on a Cu(100) surface: Ring strain and planarity of the transition state Journal of the American Chemical Society. 117: 10076-10087. |
0.339 |
|
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