Year |
Citation |
Score |
2019 |
Gungor N, Alevli M. Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science and Technology. 37: 50901. DOI: 10.1116/1.5097467 |
0.493 |
|
2019 |
Alkis S, Chowdhury FI, Alevli M, Dietz N, Yalızay B, Aktürk S, Nayfeh A, Okyay AK. Corrigendum: Enhancement of polycrystalline silicon solar cells efficiency using indium nitride particles (2015 J. Opt. 17 105903) Journal of Optics. 21: 049501. DOI: 10.1088/2040-8986/Ab0Ac0 |
0.512 |
|
2018 |
Gungor N, Alevli M. Role of film thickness on the structural and optical properties of GaN on Si (100) grown by hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science and Technology. 36: 21514. DOI: 10.1116/1.5003154 |
0.509 |
|
2018 |
Alevli M, Gungor N. Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science and Technology. 36. DOI: 10.1116/1.4998920 |
0.388 |
|
2016 |
Alevli M, Haider A, Kizir S, Leghari SA, Biyikli N. Comparison of trimethylgallium and triethylgallium as "ga" source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4937725 |
0.518 |
|
2016 |
Alevli M, Gungor N, Haider A, Kizir S, Leghari SA, Biyikli N. Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4936230 |
0.489 |
|
2015 |
Alkis S, Chowdhury FI, Alevli M, Dietz N, Yalizay B, Aktürk S, Nayfeh A, Okyay AK. Enhancement of polycrystalline silicon solar cells efficiency using indium nitride particles Journal of Optics (United Kingdom). 17. DOI: 10.1088/2040-8978/17/10/105903 |
0.545 |
|
2015 |
Alevli M, Gungor N, Alkis S, Ozgit-Akgun C, Donmez I, Okyay AK, Gamage S, Senevirathna I, Dietz N, Biyikli N. Effect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition Physica Status Solidi (C) Current Topics in Solid State Physics. 12: 423-429. DOI: 10.1002/Pssc.201400171 |
0.719 |
|
2014 |
Tekcan B, Alkis S, Alevli M, Dietz N, Ortac B, Biyikli N, Okyay AK. A near-infrared range photodetector based on indium nitride nanocrystals obtained through laser ablation Ieee Electron Device Letters. 35: 936-938. DOI: 10.1109/Led.2014.2336795 |
0.659 |
|
2014 |
El-Atab N, Cimen F, Alkis S, Ortaç B, Alevli M, Dietz N, Okyay AK, Nayfeh A. Enhanced memory effect via quantum confinement in 16 nm InN nanoparticles embedded in ZnO charge trapping layer Applied Physics Letters. 104: 253106. DOI: 10.1063/1.4885397 |
0.554 |
|
2013 |
Acharya AR, Gamage S, Senevirathna MKI, Alevli M, Bahadir K, Melton AG, Ferguson I, Dietz N, Thoms BD. Thermal stability of InN epilayers grown by high pressure chemical vapor deposition Applied Surface Science. 268: 1-5. DOI: 10.1016/J.Apsusc.2012.10.184 |
0.653 |
|
2012 |
Alevli M, Ozgit C, Donmez I, Biyikli N. Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3687937 |
0.551 |
|
2012 |
Ozgit C, Donmez I, Alevli M, Biyikli N. Atomic layer deposition of GaN at low temperatures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3664102 |
0.479 |
|
2012 |
Ozgit C, Donmez I, Alevli M, Biyikli N. Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition Thin Solid Films. 520: 2750-2755. DOI: 10.1016/J.Tsf.2011.11.081 |
0.495 |
|
2012 |
Alkis S, Alevli M, Burzhuev S, Vural HA, Okyay AK, Ortaç B. Generation of InN nanocrystals in organic solution through laser ablation of high pressure chemical vapor deposition-grown InN thin film Journal of Nanoparticle Research. 14. DOI: 10.1007/S11051-012-1048-5 |
0.431 |
|
2012 |
Alevli M, Ozgit C, Donmez I, Biyikli N. Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures Physica Status Solidi (a) Applications and Materials Science. 209: 266-271. DOI: 10.1002/Pssa.201127430 |
0.458 |
|
2011 |
Alevli M, Ozgit C, Donmez I. The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition Acta Physica Polonica A. 120. DOI: 10.12693/Aphyspola.120.A-58 |
0.536 |
|
2011 |
Alevli M, Ozgit C, Donmez I, Biyikli N. The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition Journal of Crystal Growth. 335: 51-57. DOI: 10.1016/J.Jcrysgro.2011.09.003 |
0.469 |
|
2010 |
Kirste R, Wagner MR, Schulze JH, Strittmatter A, Collazo R, Sitar Z, Alevli M, Dietz N, Hoffmann A. Optical properties of InN grown on templates with controlled surface polarities Physica Status Solidi (a) Applications and Materials Science. 207: 2351-2354. DOI: 10.1002/Pssa.201026086 |
0.695 |
|
2010 |
Durkaya G, Buegler M, Atalay R, Senevirathna I, Alevli M, Hitzemann O, Kaiser M, Kirste R, Hoffmann A, Dietz N. The influence of the group V/III molar precursor ratio on the structural properties of ingan layers grown by HPCVD Physica Status Solidi (a) Applications and Materials Science. 207: 1379-1382. DOI: 10.1002/Pssa.200983622 |
0.799 |
|
2010 |
Durkaya G, Alevli M, Buegler M, Atalay R, Gamage S, Kaiser M, Kirste R, Hoffmann A, Jamil M, Ferguson I, Dietz N. Growth temperature - Phase stability relation in In1-xGa xN epilayers grown by high-pressure CVD Materials Research Society Symposium Proceedings. 1202: 277-282. |
0.825 |
|
2009 |
Durkaya G, Alevli M, Buegler M, Atalay R, Gamage S, Kaiser M, Kirste R, Jamil M, Ferguson I, Dietz N. Growth temperature - phase stability relation in In 1-x Ga x N epilayers grown by high-pressure CVD Mrs Proceedings. 1202. DOI: 10.1557/Proc-1202-I05-21 |
0.802 |
|
2009 |
Buegler M, Alevli M, Atalay R, Durkaya G, Senevirathna I, Jamil M, Ferguson I, Dietz N. Optical and structural properties of InN grown by HPCVD Proceedings of Spie - the International Society For Optical Engineering. 7422. DOI: 10.1117/12.828163 |
0.815 |
|
2008 |
Alevli M, Atalay R, Durkaya G, Weesekara A, Perera AGU, Dietz N, Kirste R, Hoffmann A. Optical characterization of InN layers grown by high-pressure chemical vapor deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1023-1026. DOI: 10.1116/1.2908736 |
0.808 |
|
2008 |
Dietz N, Alevli M, Atalay R, Durkaya G, Collazo R, Tweedie J, Mita S, Sitar Z. The influence of substrate polarity on the structural quality of InN layers grown by high-pressure chemical vapor deposition Applied Physics Letters. 92. DOI: 10.1063/1.2840192 |
0.803 |
|
2008 |
Bhatta RP, Thoms BD, Alevli M, Dietz N. Desorption of hydrogen from InN(0 0 0 over(1, ̄)) observed by HREELS Surface Science. 602: 1428-1432. DOI: 10.1016/J.Susc.2008.02.003 |
0.577 |
|
2007 |
Bhatta RP, Thoms BD, Weerasekera A, Perera AGU, Alevli M, Dietz N. Carrier concentration and surface electron accumulation in indium nitride layers grown by high pressure chemical vapor deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 25: 967-970. DOI: 10.1116/1.2712185 |
0.672 |
|
2007 |
Bhatta RP, Thoms BD, Alevli M, Dietz N. Surface electron accumulation in indium nitride layers grown by high pressure chemical vapor deposition Surface Science. 601: L120-L123. DOI: 10.1016/J.Susc.2007.07.018 |
0.65 |
|
2007 |
Perera AGU, Ariyawansa G, Rinzan MBM, Stevens M, Alevli M, Dietz N, Matsik SG, Asghar A, Ferguson IT, Luo H, Bezinger A, Liu HC. Performance improvements of ultraviolet/infrared dual-band detectors Infrared Physics and Technology. 50: 142-148. DOI: 10.1016/J.Infrared.2006.10.013 |
0.552 |
|
2006 |
Alevli M, Durkaya G, Kirste R, Weesekara A, Perera U, Fenwick W, Woods V, Ferguson IT, Hoffmann A, Dietz N. Properties of InN layers grown by High Pressure CVD Mrs Proceedings. 955. DOI: 10.1557/Proc-0955-I08-04 |
0.821 |
|
2006 |
Strassburg M, Kane MH, Asghar A, Song Q, Zhang ZJ, Senawiratne J, Alevli M, Dietz N, Summers CJ, Ferguson IT. The Fermi level dependence of the optical and magnetic properties of Ga1-xMnxN grown by metal-organic chemical vapour deposition Journal of Physics Condensed Matter. 18: 2615-2622. DOI: 10.1088/0953-8984/18/9/001 |
0.772 |
|
2006 |
Alevli M, Durkaya G, Weerasekara A, Perera AGU, Dietz N, Fenwick W, Woods V, Ferguson I. Characterization of InN layers grown by high-pressure chemical vapor deposition Applied Physics Letters. 89. DOI: 10.1063/1.2352797 |
0.828 |
|
2006 |
Ariyawansa G, Rinzan MBM, Alevli M, Strassburg M, Dietz N, Perera AGU, Matsik SG, Asghar A, Ferguson IT, Luo H, Bezinger A, Liu HC. GaN/AlGaN ultraviolet/infrared dual-band detector Applied Physics Letters. 89. DOI: 10.1063/1.2345226 |
0.595 |
|
2006 |
Bhatta RP, Thoms BD, Alevli M, Woods V, Dietz N. Surface structure, composition, and polarity of indium nitride grown by high-pressure chemical vapor deposition Applied Physics Letters. 88. DOI: 10.1063/1.2187513 |
0.799 |
|
2006 |
Alevli M, Durkaya G, Woods V, Haboeck U, Kang H, Senawiratne J, Strassburg M, Ferguson IT, Hoffmann A, Dietz N. Properties of InN grown by high-pressure CVD Materials Research Society Symposium Proceedings. 892: 77-82. |
0.846 |
|
2006 |
Alevli M, Durkaya G, Kirste R, Weesekara A, Perera U, Fenwick W, Woods V, Ferguson IT, Hoffmann A, Dietz N. Properties of InN layers grown by high pressure CVD Materials Research Society Symposium Proceedings. 955: 291-296. |
0.81 |
|
2005 |
Alevli M, Durkaya G, Woods V, Habeck U, Kang H, Senawiratne J, Strassburg M, Ferguson IT, Hoffmann A, Dietz N. Properties of InN grown by High-Pressure CVD Mrs Proceedings. 892. DOI: 10.1557/Proc-0892-Ff06-02 |
0.831 |
|
2005 |
Dietz N, Alevli M, Kang H, Straßburg M, Woods V, Ferguson IT, Moore CE, Cardelino BH. The growth of InN and related alloys by high-pressure CVD Proceedings of Spie - the International Society For Optical Engineering. 5912: 1-8. DOI: 10.1117/12.616699 |
0.842 |
|
2005 |
Dietz N, Alevli M, Woods V, Strassburg M, Kang H, Ferguson IT. The characterization of InN growth under high-pressure CVD conditions Physica Status Solidi (B) Basic Research. 242: 2985-2994. DOI: 10.1002/Pssb.200562246 |
0.843 |
|
2003 |
Perera AGU, Matsik SG, Rinzan MBM, Weerasekara A, Alevli M, Liu HC, Buchanan M, Zvonkov B, Gavrilenko V. The effects of light-heavy hole transitions on the cutoff wavelengths of far infrared detectors Infrared Physics and Technology. 44: 347-353. DOI: 10.1016/S1350-4495(03)00154-3 |
0.339 |
|
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