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Elizabeth A. Costner, Ph.D. - Publications

Affiliations: 
2009 Chemical Engineering University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
Chemical Engineering
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Gu X, Bates C, Cho Y, Costner E, Marzuka F, Nagai T, Ogata T, Shi C, Sundaresan AK, Turro NJ, Bristol R, Zimmerman P, Willson CG. A new materials-based pitch division technique Journal of Photopolymer Science and Technology. 22: 773-781. DOI: 10.2494/Photopolymer.22.773  0.593
2009 Costner EA, Long BK, Navar C, Jockusch S, Lei X, Zimmerman P, Campion A, Turro NJ, Willson CG. Fundamental optical properties of linear and cyclic alkanes: VUV absorbance and index of refraction. The Journal of Physical Chemistry. A. 113: 9337-47. PMID 19630422 DOI: 10.1021/Jp903435C  0.495
2009 Costner EA, Lin MW, Jen WL, Willson CG. Nanoimprint lithography materials development for semiconductor device fabrication Annual Review of Materials Research. 39: 155-180. DOI: 10.1146/Annurev-Matsci-082908-145336  0.501
2009 Meiring JE, Lee S, Costner EA, Schmid MJ, Michaelson TB, Willson CG, Grayson SM. Pattern recognition of shape-encoded hydrogel biosensor arrays Optical Engineering. 48. DOI: 10.1117/1.3099722  0.382
2008 Costner EA, Matsumoto K, Long BK, Taylor JC, Wojtczak W, Willson CG. New high index fluids: exploiting anomalous dispersion for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772979  0.533
2008 Taylor JC, Costner EA, Goh S, Wojtczak W, Dewulf D, Willson CG. The effect of added salts on the optical properties of water for high index immersion lithography fluids Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 506-513. DOI: 10.1116/1.2839863  0.524
2008 Matsumoto K, Costner EA, Nishimura I, Ueda M, Willson CG. High index resist for 193 nm immersion lithography Macromolecules. 41: 5674-5680. DOI: 10.1021/ma800295s  0.456
2008 Matsumoto K, Costner E, Nishimura I, Ueda M, Willson CG. High index resists for 193 nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1021/Ma800295S  0.537
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