Year |
Citation |
Score |
2014 |
Williams EH, Davydov AV, Oleshko VP, Steffens KL, Levina I, Lin NJ, Bertness KA, Manocchi AK, Schreifels JA, Rao MV. Solution-based functionalization of galliumnitride nanowires for protein sensor development Surface Science. 627: 23-28. DOI: 10.1016/J.Susc.2014.04.010 |
0.367 |
|
2012 |
Williams EH, Davydov AV, Motayed A, Sundaresan SG, Bocchini P, Richter LJ, Stan G, Steffens K, Zangmeister R, Schreifels JA, Rao MV. Immobilization of streptavidin on 4H-SiC for biosensor development Applied Surface Science. 258: 6056-6063. DOI: 10.1016/J.Apsusc.2012.02.137 |
0.359 |
|
2008 |
Sundaresan SG, Mahadik NA, Qadri SB, Schreifels JA, Tian YL, Zhang Q, Gomar-Nadal E, Rao MV. Ultra-low resistivity Al+ implanted 4H-SiC obtained by microwave annealing and a protective graphite cap Solid-State Electronics. 52: 140-145. DOI: 10.1016/J.Sse.2007.06.021 |
0.321 |
|
2007 |
Sundaresan SG, Murthy M, Rao MV, Schreifels JA, Mastro MA, Eddy CR, Holm RT, Henry RL, Freitas JA, Gomar-Nadal E, Vispute RD, Tian YL. Characteristics of in situ Mg-doped GaN epilayers subjected to ultra-high-temperature microwave annealing using protective caps Semiconductor Science and Technology. 22: 1151-1156. DOI: 10.1088/0268-1242/22/10/012 |
0.4 |
|
2007 |
Sundaresan SG, Rao MV, Tian Y, Schreifels JA, Wood MC, Jones KA, Davydov AV. Comparison of solid-state microwave annealing with conventional furnace annealing of ion-implanted SiC Journal of Electronic Materials. 36: 324-331. DOI: 10.1007/S11664-006-0032-1 |
0.336 |
|
2006 |
Rothbart D, Schreifels J. Visualizing Instrumental Techniques of Surface Chemistry Boston Studies in the Philosophy of Science. 242: 309-324. DOI: 10.1007/1-4020-3261-7_16 |
0.327 |
|
2000 |
Turner NH, Schreifels JA. Surface analysis: X-ray photoelectron spectroscopy and Auger electron spectroscopy Analytical Chemistry. 72: 99R-110R. DOI: 10.1021/Ac00163A024 |
0.309 |
|
1999 |
Chusuei CC, De La Peña JV, Schreifels JA. Contour temperature programmed desorption for monitoring multiple chemical reaction products Review of Scientific Instruments. 70: 3719-3722. DOI: 10.1063/1.1149983 |
0.611 |
|
1999 |
Chusuei CC, Morris RE, Schreifels JA. Decomposition products of N,N′-disalicylidene-1,2-propanediamine adsorbed on 304 stainless steel Applied Surface Science. 153: 23-34. DOI: 10.1016/S0169-4332(99)00336-0 |
0.629 |
|
1998 |
Chusuei CC, Morris RE, Schreifels JA. Adsorption of N,N′-disalicylidene-1,2-propanediamine on 304 stainless steel Industrial and Engineering Chemistry Research. 37: 3610-3617. DOI: 10.1021/Ie980076S |
0.637 |
|
1998 |
Morris RE, Towhid Hasan M, Su TCK, Wechter MA, Turner NH, Schreifels JA. Significance of copper complex thermal stability in the use of metal deactivators at elevated temperatures Energy and Fuels. 12: 371-378. DOI: 10.1021/Ef970143F |
0.322 |
|
1995 |
Schreifels JA, Turner NH, Morris RE. A comparison of X-ray photoelectron spectroscopy and Auger electron spectroscopy depth profiles for magnesium implants Applied Surface Science. 84: 23-29. DOI: 10.1016/0169-4332(94)00362-9 |
0.301 |
|
1992 |
Chusuei CC, Gwynn LK, Schreifels JA. Two-level liquid-nitrogen-cooled sample mounting assembly for surface analysis Review of Scientific Instruments. 63: 3218-3219. DOI: 10.1063/1.1142583 |
0.602 |
|
1991 |
Schreifels JA, Morris RE, Turner NH, Mowery RL, Hues SM. Adsorption of a metal deactivator additive onto metal surfaces Energy & Fuels. 5: 263-268. DOI: 10.1021/Ef00026A007 |
0.449 |
|
1982 |
Schreifels JA, Deffeyes JE, Neff LD, White JM. An X-ray photoelectron spectroscopic study of the adsorption of N2, NH3, NO, and N2O on dysprosium Journal of Electron Spectroscopy and Related Phenomena. 25: 191-209. DOI: 10.1016/0368-2048(82)85017-2 |
0.344 |
|
1982 |
Kim Y, Schreifels JA, White JM. Adsorption of N2O on Ru(001) Surface Science. 114: 349-361. DOI: 10.1016/0039-6028(82)90476-9 |
0.327 |
|
1980 |
Schreifels JA, Maybury PC, Swartz WE. X-Ray photoelectron spectroscopy of nickel boride catalysts: Correlation of surface states with reaction products in the hydrogenation of acrylonitrile Journal of Catalysis. 65: 195-206. DOI: 10.1016/0021-9517(80)90294-8 |
0.35 |
|
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