Year |
Citation |
Score |
2020 |
Moon J, Wong J, Grabar B, Antcliffe M, Chen P, Arkun E, Khalaf I, Corrion A, Chappell J, Venkatesan N, Fay P. 360 GHz f MAX Graded-Channel AlGaN/GaN HEMTs for mmW Low-Noise Applications Ieee Electron Device Letters. 41: 1173-1176. DOI: 10.1109/Led.2020.3005337 |
0.419 |
|
2020 |
Moon JS, Grabar R, Wong J, Antcliffe M, Chen P, Arkun E, Khalaf I, Corrion A, Chappell J, Venkatesan N, Fay P. High-speed graded-channel AlGaN/GaN HEMTs with power added efficiency >70% at 30 GHz Electronics Letters. 56: 678-680. DOI: 10.1049/El.2020.0281 |
0.449 |
|
2018 |
Wong JC, Micovic M, Brown DF, Khalaf I, Williams A, Corrion A. Selective anisotropic etching of GaN over AlGaN for very thin films Journal of Vacuum Science and Technology. 36: 30603. DOI: 10.1116/1.5012530 |
0.381 |
|
2015 |
Tang Y, Shinohara K, Regan D, Corrion A, Brown D, Wong J, Schmitz A, Fung H, Kim S, Micovic M. Ultrahigh-speed GaN high-electron-mobility transistors with fT/fmax of 454/444 GHz Ieee Electron Device Letters. 36: 549-551. DOI: 10.1109/Led.2015.2421311 |
0.483 |
|
2011 |
Chu R, Corrion A, Chen M, Li R, Wong D, Zehnder D, Hughes B, Boutros K. 1200-V Normally Off GaN-on-Si Field-Effect Transistors With Low Dynamic on -Resistance Ieee Electron Device Letters. 32: 632-634. DOI: 10.1109/Led.2011.2118190 |
0.366 |
|
2008 |
Arehart AR, Corrion A, Poblenz C, Speck JS, Mishra UK, Ringel SA. Deep level optical and thermal spectroscopy of traps in n -GaN grown by ammonia molecular beam epitaxy Applied Physics Letters. 93. DOI: 10.1063/1.2981571 |
0.621 |
|
2008 |
Armstrong A, Caudill J, Corrion A, Poblenz C, Mishra UK, Speck JS, Ringel SA. Characterization of majority and minority carrier deep levels in p -type GaN:Mg grown by molecular beam epitaxy using deep level optical spectroscopy Journal of Applied Physics. 103. DOI: 10.1063/1.2891673 |
0.615 |
|
2006 |
Shen L, Palacios T, Poblenz C, Corrion A, Chakraborty A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK. Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment Ieee Electron Device Letters. 27: 214-216. DOI: 10.1109/Led.2006.871887 |
0.638 |
|
2006 |
Recht F, McCarthy L, Rajan S, Chakraborty A, Poblenz C, Corrion A, Speck JS, Mishra UK. Nonalloyed ohmic contacts in AlGaN/GaN HEMTs by ion implantation with reduced activation annealing temperature Ieee Electron Device Letters. 27: 205-207. DOI: 10.1109/Led.2006.870419 |
0.624 |
|
2006 |
Corrion A, Poblenz C, Waltereit P, Palacios T, Rajan S, Mishra UK, Speck JS. Review of Recent Developments in Growth of AlGaN/GaN High-Electron Mobility Transistors on 4H-SiC by Plasma-Assisted Molecular Beam Epitaxy Ieice Transactions On Electronics. 89: 906-912. DOI: 10.1093/Ietele/E89-C.7.906 |
0.655 |
|
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