Seshu B. Desu

Affiliations: 
Electrical & Computer Engineering University of Massachusetts, Amherst, Amherst, MA 
Area:
Electronics and Electrical Engineering
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"Seshu Desu"
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Publications

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Hamasha MM, Alzoubi K, Switzer JC, et al. (2011) A study on crack propagation and electrical resistance change of sputtered aluminum thin film on poly ethylene terephthalate substrate under stretching Thin Solid Films. 519: 7918-7924
Hamasha MM, Alzoubi K, Lu S, et al. (2011) Durability study on sputtered indium tin oxide thin film on Poly Ethylene Terephthalate substrate Thin Solid Films. 519: 6033-6038
Rastogi AC, Lim SH, Desu SB. (2008) Structure and optoelectronic properties of spray deposited Mg doped p-CuCrO2 semiconductor oxide thin films Journal of Applied Physics. 104
Sharma RK, Rastogi AC, Desu SB. (2008) Manganese oxide embedded polypyrrole nanocomposites for electrochemical supercapacitor Electrochimica Acta. 53: 7690-7695
Sharma RK, Rastogi AC, Desu SB. (2007) Nano crystalline porous silicon as large-area electrode for electrochemical synthesis of polypyrrole Physica B: Condensed Matter. 388: 344-349
Rastogi AC, Desu SB. (2006) Structural development and electronic properties of hot filament low pressure chemical vapor deposited fluorocarbon polymer films Journal of Materials Research. 21: 242-254
Rastogi AC, Desu SB. (2006) Characterization of low pressure chemical vapor deposited polymeric fluorinated carbon m (C:FX)n thin films with low dielectric constant Applied Physics a: Materials Science and Processing. 83: 57-66
Rastogi AC, Desu SB. (2006) Ferroelectric poly(vinylidene fluoride) thin films grown by low-pressure chemical vapor polymerization Chemical Vapor Deposition. 12: 742-750
Rastogi AC, Desu SB. (2005) Thermal chemical vapor deposition of fluorocarbon polymer thin films in a hot filament reactor Polymer. 46: 3440-3451
Lim SH, Rastogi AC, Desu SB. (2004) Electrical properties of metal-ferroelectric-insulator-semiconductor structures based on ferroelectric polyvinylidene fluoride copolymer film gate for nonvolatile random access memory application Journal of Applied Physics. 96: 5673-5682
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