Fee L. Lie, Ph.D.

2011 Chemical Engineering University of Arizona, Tucson, AZ 
Chemical Engineering, Materials Science Engineering, Electronics and Electrical Engineering
"Fee Lie"


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Anthony J. Muscat grad student 2011 University of Arizona
 (Interface Formation Between High Dielectric Permittivity Films and III-V Compound Semiconductors using HF Chemistries and Atomic Layer Deposition.)
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Granados-Alpizar B, Li Lie F, Muscat AJ. (2013) Interfacial chemistry of hydrofluoric acid-treated In0.53Ga 0.47As(100) during atomic layer deposition of aluminum oxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31
Lie FL, Rachmady W, Muscat AJ. (2011) Oxide removal and selective etching of in from InSb(100) with TiCl 4 Journal of Physical Chemistry C. 115: 19733-19740
Lie FL, Muscat AJ. (2011) Controlled oxide removal and surface morphology on InSb(100) using gas phase HF/H2O Journal of Physical Chemistry C. 115: 7440-7449
Imangholi B, Lie FL, Parks HG, et al. (2010) Effect of deep-level defects on surface recombination velocity at the interface between silicon and dielectric films Ieee Transactions On Electron Devices. 57: 877-889
Lie FL, Rachmady W, Muscat AJ. (2010) In0.53Ga0.47As(1 0 0) native oxide removal by liquid and gas phase HF/H2O chemistries Microelectronic Engineering. 87: 1656-1660
Deng Z, Lie FL, Shen S, et al. (2009) Water-based route to ligand-selective synthesis of ZnSe and Cd-doped ZnSe quantum dots with tunable ultraviolet A to blue photoluminescence. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 434-42
Lie FL, Rachmady W, Muscat AJ. (2009) A comparison of liquid and gas phase surface preparation of III-V compound semiconductors for atomic layer deposition Microelectronic Engineering. 86: 122-127
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