Vibhu Jindal, Ph.D.
Affiliations: | 2008 | State University of New York, Albany, Albany, NY, United States |
Area:
Electronics and Electrical Engineering, Materials Science EngineeringGoogle:
"Vibhu Jindal"Parents
Sign in to add mentor| Fatemeh Shahedipour-Sandvik | grad student | 2008 | SUNY Albany | |
| (Development of III-nitride nanostructures by metal-organic chemical vapor deposition.) | ||||
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Publications
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| Upadhyaya M, Jindal V, Basavalingappa A, et al. (2015) Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Upadhyaya M, Jindal V, Basavalingappa A, et al. (2015) Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Upadhyaya M, Basavalingappa A, Herbol H, et al. (2015) Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33 |
| Upadhyaya M, Jindal V, Herbol H, et al. (2014) Investigating printability of native defects on EUV mask blanks through simulations and experiments Proceedings of Spie - the International Society For Optical Engineering. 9048 |
| Jindal V, John A, Harris-Jones J, et al. (2013) Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique Proceedings of Spie - the International Society For Optical Engineering. 8679 |
| Jindal V, Kearney P, Antohe A, et al. (2013) Challenges in EUV mask blank deposition for high volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 8679 |
| Harris-Jones J, Stinzianni E, Lin C, et al. (2013) Applications of advanced metrology techniques for the characterization of extreme ultraviolet mask blank defects Journal of Micro/Nanolithography, Mems, and Moems. 12 |
| Kageyama J, Yoshimoto M, Matsuda A, et al. (2013) Influence of shield roughness on Mo/Si defect density for extreme ultraviolet lithography mask blanks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 31 |
| Upadhyaya M, Denbeaux G, JohnKadaksham A, et al. (2012) A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks Proceedings of Spie - the International Society For Optical Engineering. 8322 |
| Jindal V, Kearney P, Sohn J, et al. (2012) Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks Proceedings of Spie - the International Society For Optical Engineering. 8322 |