John Hoang, Ph.D.
Affiliations: | 2011 | University of California, Los Angeles, Los Angeles, CA |
Area:
Chemical Engineering, Nanoscience, Materials Science EngineeringGoogle:
"John Hoang"Parents
Sign in to add mentor| Jane P. Chang | grad student | 2011 | UCLA | |
| (Sequential Radical Enhanced Atomic Layer Deposition of Nanostructured Yttrium Oxide Thin Films with Spatially Controlled Yttrium (III) and Erbium (III) Co-doping for Optical Applications.) | ||||
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| Shen M, Zhou B, Zhou Y, et al. (2015) A New Etch Planarization Technology to Correct Non-Uniformity Post Chemical Mechanical Polishing Ieee Transactions On Semiconductor Manufacturing. 28: 502-507 |
| Sperling BA, Hoang J, Kimes WA, et al. (2014) Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO |
| Hsu CC, Marchack N, Martin RM, et al. (2013) Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. the effect of oxygen addition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 31 |
| Hoang J, Schwartz RN, Wang KL, et al. (2012) The effects of energy transfer on the Er 3+ 1.54 μm luminescence in nanostructured Y 2O 3 thin films with heterogeneously distributed Yb 3+ and Er 3+ codopants Journal of Applied Physics. 112 |
| Hoang J, Schwartz RN, Wang KL, et al. (2012) Er 3+ interlayer energy migration as the limiting photoluminescence quenching factor in nanostructured Er 3+:Y 2O 3 thin films Journal of Applied Physics. 112 |
| Hsu CC, Hoang J, Le V, et al. (2008) Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 1919-1925 |
| Hoang J, Hsu CC, Chang JP. (2008) Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. I. Feature scale modeling Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 1911-1918 |
| Hoang J, Chang JP. (2008) Effect of Yb 3+ Co-doping on the luminescent properties of Er 3+ :Y 2O 3Thin films Aiche Annual Meeting, Conference Proceedings |
| Hoang J, Chang JP. (2008) Simulation of profile evolution in shallow trench formation by plasma etching Aiche Annual Meeting, Conference Proceedings |
| Hoang J, Van TT, Sawkar-Mathur M, et al. (2007) Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition Journal of Applied Physics. 101 |