He Ren, Ph.D.
Affiliations: | 2011 | University of Wisconsin, Madison, Madison, WI |
Area:
Electronics and Electrical EngineeringGoogle:
"He Ren"Parents
Sign in to add mentorJ Leon Shohet | grad student | 2011 | UW Madison | |
(Plasma-processing-induced damage of thin dielectric films.) |
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Publications
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Hsu KW, Ren H, Agasie RJ, et al. (2014) Effects of neutron irradiation of ultra-thin HfO2 films Applied Physics Letters. 104 |
Shohet JL, Ren H, Nichols MT, et al. (2012) The effects of plasma exposure on low-k dielectric materials Proceedings of Spie - the International Society For Optical Engineering. 8328 |
Sinha H, Ren H, Nichols MT, et al. (2012) The effects of vacuum ultraviolet radiation on low-k dielectric films Journal of Applied Physics. 112 |
Ren H, Nishi Y, Shohet JL. (2011) Changes to charge and defects in dielectrics from ion and photon fluences during plasma exposure Electrochemical and Solid-State Letters. 14 |
Shohet JL, Sinha H, Ren H, et al. (2011) Damage to low-k porous organosilicate glass from vacuum-ultraviolet irradiation Proceedings of Spie - the International Society For Optical Engineering. 8077 |
Ren H, Jiang G, Antonelli GA, et al. (2011) The nature of the defects generated from plasma exposure in pristine and ultraviolet-cured low-k organosilicate glass Applied Physics Letters. 98 |
Ren H, Nichols MT, Jiang G, et al. (2011) Defects in low- k organosilicate glass and their response to processing as measured with electron-spin resonance Applied Physics Letters. 98 |
Sinha H, Sehgal A, Ren H, et al. (2011) Effect of the dielectric-substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics Thin Solid Films. 519: 5464-5466 |
Ren H, Antonelli GA, Nishi Y, et al. (2010) Plasma damage effects on low- k porous organosilicate glass Journal of Applied Physics. 108 |
Ren H, Sinha H, Sehgal A, et al. (2010) Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics Applied Physics Letters. 97 |