He Ren, Ph.D.

Affiliations: 
2011 University of Wisconsin, Madison, Madison, WI 
Area:
Electronics and Electrical Engineering
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"He Ren"

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J Leon Shohet grad student 2011 UW Madison
 (Plasma-processing-induced damage of thin dielectric films.)
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Publications

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Hsu KW, Ren H, Agasie RJ, et al. (2014) Effects of neutron irradiation of ultra-thin HfO2 films Applied Physics Letters. 104
Shohet JL, Ren H, Nichols MT, et al. (2012) The effects of plasma exposure on low-k dielectric materials Proceedings of Spie - the International Society For Optical Engineering. 8328
Sinha H, Ren H, Nichols MT, et al. (2012) The effects of vacuum ultraviolet radiation on low-k dielectric films Journal of Applied Physics. 112
Ren H, Nishi Y, Shohet JL. (2011) Changes to charge and defects in dielectrics from ion and photon fluences during plasma exposure Electrochemical and Solid-State Letters. 14
Shohet JL, Sinha H, Ren H, et al. (2011) Damage to low-k porous organosilicate glass from vacuum-ultraviolet irradiation Proceedings of Spie - the International Society For Optical Engineering. 8077
Ren H, Jiang G, Antonelli GA, et al. (2011) The nature of the defects generated from plasma exposure in pristine and ultraviolet-cured low-k organosilicate glass Applied Physics Letters. 98
Ren H, Nichols MT, Jiang G, et al. (2011) Defects in low- k organosilicate glass and their response to processing as measured with electron-spin resonance Applied Physics Letters. 98
Sinha H, Sehgal A, Ren H, et al. (2011) Effect of the dielectric-substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics Thin Solid Films. 519: 5464-5466
Ren H, Antonelli GA, Nishi Y, et al. (2010) Plasma damage effects on low- k porous organosilicate glass Journal of Applied Physics. 108
Ren H, Sinha H, Sehgal A, et al. (2010) Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics Applied Physics Letters. 97
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