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Nicholas C. Fuller, Ph.D. - Publications

Affiliations: 
Columbia University, New York, NY 
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6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Volksen W, Purushothaman S, Darnon M, Lofaro MF, Cohen SA, Doyle JP, Fuller N, Magbitang TP, Rice PM, Krupp LE, Nakagawa H, Nobe Y, Kokubo T, Duboisa GJM. Integration of a manufacturing grade, k = 2.0 spin-on material in a single damascene structure Ecs Journal of Solid State Science and Technology. 1. DOI: 10.1149/2.013205Jss  0.341
2012 Shohet JL, Ren H, Nichols MT, Sinha H, Lu W, Mavrakakis K, Lin Q, Russell NM, Tomoyasu M, Antonelli GA, Engelmann SU, Fuller NC, Ryan V, Nishi Y. The effects of plasma exposure on low-k dielectric materials Proceedings of Spie - the International Society For Optical Engineering. 8328. DOI: 10.1117/12.917967  0.345
2012 Tsai HY, Miyazoe H, Engelmann S, To B, Sikorski E, Bucchignano J, Klaus D, Liu CC, Cheng J, Sanders D, Fuller N, Guillorn M. Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4767237  0.337
2012 Sinha H, Ren H, Nichols MT, Lauer JL, Tomoyasu M, Russell NM, Jiang G, Antonelli GA, Fuller NC, Engelmann SU, Lin Q, Ryan V, Nishi Y, Shohet JL. The effects of vacuum ultraviolet radiation on low-k dielectric films Journal of Applied Physics. 112. DOI: 10.1063/1.4751317  0.309
2010 Lin Q, Chen ST, Nelson A, Brock P, Cohen S, Davis B, Fuller N, Kaplan R, Kwong R, Liniger E, Neumayer D, Patel J, Shobha H, Sooriyakumaran R, Purushothaman S, et al. Multi-level integration of patternable low-κ material into advanced Cu BEOL Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.851225  0.328
2009 Guillorn M, Chang J, Fuller N, Patel J, Darnon M, Pyzyna A, Joseph E, Engelmann S, Ott J, Newbury J, Klaus D, Bucchignano J, Joshi P, Scerbo C, Kratschmer E, et al. Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2588-2592. DOI: 10.1116/1.3246357  0.327
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