Frank E. Gennari, Ph.D. - Publications

Affiliations: 
2004 University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices

12 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2014 Cain JP, Rodriguez NP, Sweis J, Gennari FE, Lai YC. A pattern-driven design regularization methodology Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2047741  0.359
2014 Teoh E, Dai V, Capodieci L, Lai YC, Gennari F. Systematic data mining using a pattern database to accelerate yield ramp Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2047307  0.434
2014 Dai V, Lai YC, Gennari F, Teoh E, Capodieci L. Systematic physical verification with topological patterns Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2046709  0.387
2010 Yang J, Rodriguez N, Omedes O, Gennari F, Lai YC, Mankad V. DRCPlus in a router: Automatic elimination of lithography hotspots using 2D pattern detection and correction Proceedings of Spie - the International Society For Optical Engineering. 7641. DOI: 10.1117/12.846650  0.347
2004 Neureuther AR, McIntyre G, Gennari F, Lam M, Cain J, Robins G, Huang E, Choi J, Wang L, Yuan L, Oshima H. Feature level test patterns for characterizing residual process effects Proceedings of Spie - the International Society For Optical Engineering. 5379: 76-84. DOI: 10.1117/12.540685  0.673
2004 Hafeman S, Gennari F, Neureuther AR. Fast algorithm for extraction of worst-case image degradation due to flare Proceedings of Spie - the International Society For Optical Engineering. 5377: 1397-1404. DOI: 10.1117/12.535832  0.558
2004 Gennari FE, Neureuther AR. A pattern matching system for linking TCAD and EDA Proceedings - 5th International Symposium On Quality Electronic Design, Isqued 2004. 165-170. DOI: 10.1109/ISQED.2004.1283668  0.597
2003 Gennari F, Madahar S, Neureuther AR. Web tool for worst-case assessment of aberration effects in printing a layout Proceedings of Spie - the International Society For Optical Engineering. 5040: 1591-1599. DOI: 10.1117/12.485448  0.606
2002 Gennari FE, Robins G, Neureuther AR. Validation of the aberration pattern-matching OPC strategy Proceedings of Spie - the International Society For Optical Engineering. 4692: 444-453. DOI: 10.1117/12.475679  0.684
2002 Neureuther AR, Gennari F. No-fault assurance: Linking fast process CAD and EDA Proceedings of Spie - the International Society For Optical Engineering. 4889: 871-878. DOI: 10.1117/12.467898  0.582
2001 Gennari FE, Neureuther AR. Aberrations are a big part of OPC for phase-shifting masks Proceedings of Spie - the International Society For Optical Engineering. 4562: 1077-1086. DOI: 10.1117/12.458272  0.618
2001 Lee SI, Ng KC, Orimoto T, Pittenger J, Horie T, Adam K, Cheng M, Croffie E, Deng Y, Gennari F, Pistor T, Robins G, Williamson M, Wu B, Yuan L, et al. LAVA web-based remote simulation: Enhancements for education and technology innovation Proceedings of Spie - the International Society For Optical Engineering. 4346: 1500-1506. DOI: 10.1117/12.435691  0.467
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