Year |
Citation |
Score |
2014 |
Cain JP, Rodriguez NP, Sweis J, Gennari FE, Lai YC. A pattern-driven design regularization methodology Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2047741 |
0.359 |
|
2014 |
Teoh E, Dai V, Capodieci L, Lai YC, Gennari F. Systematic data mining using a pattern database to accelerate yield ramp Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2047307 |
0.434 |
|
2014 |
Dai V, Lai YC, Gennari F, Teoh E, Capodieci L. Systematic physical verification with topological patterns Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2046709 |
0.387 |
|
2010 |
Yang J, Rodriguez N, Omedes O, Gennari F, Lai YC, Mankad V. DRCPlus in a router: Automatic elimination of lithography hotspots using 2D pattern detection and correction Proceedings of Spie - the International Society For Optical Engineering. 7641. DOI: 10.1117/12.846650 |
0.347 |
|
2004 |
Neureuther AR, McIntyre G, Gennari F, Lam M, Cain J, Robins G, Huang E, Choi J, Wang L, Yuan L, Oshima H. Feature level test patterns for characterizing residual process effects Proceedings of Spie - the International Society For Optical Engineering. 5379: 76-84. DOI: 10.1117/12.540685 |
0.673 |
|
2004 |
Hafeman S, Gennari F, Neureuther AR. Fast algorithm for extraction of worst-case image degradation due to flare Proceedings of Spie - the International Society For Optical Engineering. 5377: 1397-1404. DOI: 10.1117/12.535832 |
0.558 |
|
2004 |
Gennari FE, Neureuther AR. A pattern matching system for linking TCAD and EDA Proceedings - 5th International Symposium On Quality Electronic Design, Isqued 2004. 165-170. DOI: 10.1109/ISQED.2004.1283668 |
0.597 |
|
2003 |
Gennari F, Madahar S, Neureuther AR. Web tool for worst-case assessment of aberration effects in printing a layout Proceedings of Spie - the International Society For Optical Engineering. 5040: 1591-1599. DOI: 10.1117/12.485448 |
0.606 |
|
2002 |
Gennari FE, Robins G, Neureuther AR. Validation of the aberration pattern-matching OPC strategy Proceedings of Spie - the International Society For Optical Engineering. 4692: 444-453. DOI: 10.1117/12.475679 |
0.684 |
|
2002 |
Neureuther AR, Gennari F. No-fault assurance: Linking fast process CAD and EDA Proceedings of Spie - the International Society For Optical Engineering. 4889: 871-878. DOI: 10.1117/12.467898 |
0.582 |
|
2001 |
Gennari FE, Neureuther AR. Aberrations are a big part of OPC for phase-shifting masks Proceedings of Spie - the International Society For Optical Engineering. 4562: 1077-1086. DOI: 10.1117/12.458272 |
0.618 |
|
2001 |
Lee SI, Ng KC, Orimoto T, Pittenger J, Horie T, Adam K, Cheng M, Croffie E, Deng Y, Gennari F, Pistor T, Robins G, Williamson M, Wu B, Yuan L, et al. LAVA web-based remote simulation: Enhancements for education and technology innovation Proceedings of Spie - the International Society For Optical Engineering. 4346: 1500-1506. DOI: 10.1117/12.435691 |
0.467 |
|
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