Year |
Citation |
Score |
2011 |
Neureuther AR, Rubinstein J, Miller M, Yamazoe K, Chin E, Levy C, Wang L, Xu N, Spanos C, Qian K, Poolla K, Ghan J, Subramanian A, Liu TJK, Sun X, et al. Collaborative research on emerging technologies and design Proceedings of Spie - the International Society For Optical Engineering. 8081. DOI: 10.1117/12.899394 |
0.641 |
|
2010 |
Neureuther AR, Rubinstein J, Chin E, Wang L, Miller M, Clifford C, Yamazoe K. Modeling optical lithography physics Japanese Journal of Applied Physics. 49: 06GA011-06GA017. DOI: 10.1143/Jjap.49.06Ga01 |
0.514 |
|
2010 |
Chin EY, Levy CS, Neureuther AR. Variability aware timing models at the standard cell level Proceedings of Spie - the International Society For Optical Engineering. 7641. DOI: 10.1117/12.846689 |
0.621 |
|
2009 |
Chin EY, Neureuther AR. Variability aware interconnect timing models for double patterning Proceedings of Spie - the International Society For Optical Engineering. 7275. DOI: 10.1117/12.814281 |
0.637 |
|
2007 |
Neureuther A, Poppe W, Holwill J, Chin E, Wang L, Yang JS, Miller M, Ceperley D, Clifford C, Kikuchi K, Choi J, Dornfeld D, Friedberg P, Spanos C, Hoang J, et al. Collaborative platform, tool-kit, and physical models for DfM Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.721199 |
0.484 |
|
2007 |
Chin EY, Holwill JA, Neureuther AR. Prediction of interconnect delay variations using pattern matching Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.712257 |
0.637 |
|
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