☰

Eric Y. Chin, Ph.D. - Publications

Affiliations: 
2011 Electrical Engineering & Computer Sciences University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices
Tree Info Similar researchers PubMed Report error

6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2011 Neureuther AR, Rubinstein J, Miller M, Yamazoe K, Chin E, Levy C, Wang L, Xu N, Spanos C, Qian K, Poolla K, Ghan J, Subramanian A, Liu TJK, Sun X, et al. Collaborative research on emerging technologies and design Proceedings of Spie - the International Society For Optical Engineering. 8081. DOI: 10.1117/12.899394  0.641
2010 Neureuther AR, Rubinstein J, Chin E, Wang L, Miller M, Clifford C, Yamazoe K. Modeling optical lithography physics Japanese Journal of Applied Physics. 49: 06GA011-06GA017. DOI: 10.1143/Jjap.49.06Ga01  0.514
2010 Chin EY, Levy CS, Neureuther AR. Variability aware timing models at the standard cell level Proceedings of Spie - the International Society For Optical Engineering. 7641. DOI: 10.1117/12.846689  0.621
2009 Chin EY, Neureuther AR. Variability aware interconnect timing models for double patterning Proceedings of Spie - the International Society For Optical Engineering. 7275. DOI: 10.1117/12.814281  0.637
2007 Neureuther A, Poppe W, Holwill J, Chin E, Wang L, Yang JS, Miller M, Ceperley D, Clifford C, Kikuchi K, Choi J, Dornfeld D, Friedberg P, Spanos C, Hoang J, et al. Collaborative platform, tool-kit, and physical models for DfM Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.721199  0.484
2007 Chin EY, Holwill JA, Neureuther AR. Prediction of interconnect delay variations using pattern matching Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.712257  0.638
Show low-probability matches.