Anisur Rahman, Ph.D. - Publications
Affiliations: | 2005 | Purdue University, West Lafayette, IN, United States |
Area:
Electronics and Electrical EngineeringYear | Citation | Score | |||
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2015 | Rahman A, Lundstrom MS. Erratum: A Compact Scattering Model for the Nanoscale Double-Gate MOSFET [Mar 02 481-489] Ieee Transactions On Electron Devices. 62: 2367-2367. DOI: 10.1109/Ted.2015.2437276 | 0.489 | |||
2005 | Rahman A, Klimeck G, Lundstrom M, Boykin TB, Vagidov N. Atomistic Approach for Nanoscale Devices at the Scaling Limit and Beyond– Valley Splitting in Si Japanese Journal of Applied Physics. 44: 2187-2190. DOI: 10.1143/Jjap.44.2187 | 0.515 | |||
2005 | Wang J, Rahman A, Ghosh A, Klimeck G, Lundstrom M. On the Validity of the Parabolic Effective-Mass Approximation for the I–V Calculation of Silicon Nanowire Transistors Ieee Transactions On Electron Devices. 52: 1589-1595. DOI: 10.1109/Ted.2005.850945 | 0.498 | |||
2005 | Wang J, Rahman A, Ghosh A, Klimeck G, Lundstrom M. Performance evaluation of ballistic silicon nanowire transistors with atomic-basis dispersion relations Applied Physics Letters. 86: 093113. DOI: 10.1063/1.1873055 | 0.508 | |||
2005 | Rahman A, Lundstrom MS, Ghosh AW. Generalized effective-mass approach for n -type metal-oxide-semiconductor field-effect transistors on arbitrarily oriented wafers Journal of Applied Physics. 97. DOI: 10.1063/1.1845586 | 0.505 | |||
2004 | Rahman A, Klimeck G, Vagidov N, Boykin TB, Lundstrom M. Nanoscale Device Simulation at the Scaling Limit and Beyond The Japan Society of Applied Physics. 2004: 726-727. DOI: 10.7567/Ssdm.2004.A-9-1 | 0.469 | |||
2003 | Rahman A, Guo J, Datta S, Lundstrom MS. Theory of ballistic nanotransistors Ieee Transactions On Electron Devices. 50: 1853-1864. DOI: 10.1109/Ted.2003.815366 | 0.507 | |||
2002 | Rahman A, Lundstrom MS. A compact scattering model for the nanoscale double-gate MOSFET Ieee Transactions On Electron Devices. 49: 481-489. DOI: 10.1109/16.987120 | 0.517 | |||
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