Year |
Citation |
Score |
2014 |
Keller S, Li H, Laurent M, Hu Y, Pfaff N, Lu J, Brown DF, Fichtenbaum NA, Speck JS, Denbaars SP, Mishra UK. Recent progress in metal-organic chemical vapor deposition of (0001¯) N-polar group-III nitrides Semiconductor Science and Technology. 29. DOI: 10.1088/0268-1242/29/11/113001 |
0.806 |
|
2013 |
Wong MH, Keller S, Dasgupta NS, Denninghoff DJ, Kolluri S, Brown DF, Lu J, Fichtenbaum NA, Ahmadi E, Singisetti U, Chini A, Rajan S, Denbaars SP, Speck JS, Mishra UK. N-polar GaN epitaxy and high electron mobility transistors Semiconductor Science and Technology. 28. DOI: 10.1088/0268-1242/28/7/074009 |
0.78 |
|
2011 |
Wu YF, Coffie R, Fichtenbaum N, Dora Y, Suh CS, Shen L, Parikh P, Mishra UK. Total GaN solution to electrical power conversion Device Research Conference - Conference Digest, Drc. 217-218. DOI: 10.1109/DRC.2011.5994505 |
0.79 |
|
2011 |
Roy T, Zhang EX, Puzyrev YS, Shen X, Fleetwood DM, Schrimpf RD, Koblmueller G, Chu R, Poblenz C, Fichtenbaum N, Suh CS, Mishra UK, Speck JS, Pantelides ST. Temperature-dependence and microscopic origin of low frequency 1/f noise in GaN/AlGaN high electron mobility transistors Applied Physics Letters. 99. DOI: 10.1063/1.3662041 |
0.524 |
|
2009 |
Masui H, Keller S, Fellows N, Fichtenbaum NA, Furukawa M, Nakamura S, Mishra UK, DenBaars SP. Luminescence characteristics of N-polar GaN and InGaN films grown by metal organic chemical vapor deposition Japanese Journal of Applied Physics. 48. DOI: 10.1143/Jjap.48.071003 |
0.491 |
|
2008 |
Chu R, Shen L, Fichtenbaum N, Chen Z, Keller S, DenBaars SP, Mishra UK. Correlation between DC-RF dispersion and gate leakage in deeply recessed GaN/AlGaN/GaN HEMTs Ieee Electron Device Letters. 29: 303-305. DOI: 10.1109/Led.2008.917939 |
0.742 |
|
2008 |
Pei Y, Chu R, Shen L, Fichtenbaum NA, Chen Z, Brown D, Keller S, Denbaars SP, Mishra UK. Effect of Al composition and gate recess on power performance of AlGaN/ GaN high-electron mobility transistors Ieee Electron Device Letters. 29: 300-302. DOI: 10.1109/Led.2008.917936 |
0.79 |
|
2008 |
Chu R, Shen L, Fichtenbaum N, Brown D, Keller S, Mishra UK. Plasma treatment for leakage reduction in AlGaN/GaN and GaN Schottky contacts Ieee Electron Device Letters. 29: 297-299. DOI: 10.1109/Led.2008.917814 |
0.687 |
|
2008 |
Chu R, Shen L, Fichtenbaum N, Brown D, Chen Z, Keller S, DenBaars SP, Mishra UK. V-Gate GaN HEMTs for X-Band power applications Ieee Electron Device Letters. 29: 974-976. DOI: 10.1109/Led.2008.2001639 |
0.746 |
|
2008 |
Keller S, Suh CS, Fichtenbaum NA, Furukawa M, Chu R, Chen Z, Vijayraghavan K, Rajan S, Denbaars SP, Speck JS, Mishra UK. Influence of the substrate misorientation on the properties of N-polar InGaN/GaN and AlGaN/GaN heterostructures Journal of Applied Physics. 104. DOI: 10.1063/1.3006132 |
0.726 |
|
2008 |
Lian C, Xing HG, Chang YC, Fichtenbaum N. Electrical transport properties of wafer-fused p-GaAs/n-GaN heterojunctions Applied Physics Letters. 93. DOI: 10.1063/1.2983648 |
0.561 |
|
2008 |
Keller S, Suh CS, Chen Z, Chu R, Rajan S, Fichtenbaum NA, Furukawa M, DenBaars SP, Speck JS, Mishra UK. Properties of N-polar AlGaN/GaN heterostructures and field effect transistors grown by metalorganic chemical vapor deposition Journal of Applied Physics. 103. DOI: 10.1063/1.2838214 |
0.741 |
|
2008 |
Fichtenbaum NA, Mates TE, Keller S, DenBaars SP, Mishra UK. Impurity incorporation in heteroepitaxial N-face and Ga-face GaN films grown by metalorganic chemical vapor deposition Journal of Crystal Growth. 310: 1124-1131. DOI: 10.1016/J.Jcrysgro.2007.12.051 |
0.367 |
|
2008 |
Chen Z, Fichtenbaum N, Brown D, Keller S, Mishra UK, Denbaars SP, Nakamura S. Influence of Mg doping on the morphological, optical, and structural properties of InGaN/GaN multiple quantum wells Journal of Electronic Materials. 37: 546-549. DOI: 10.1007/s11664-007-0332-0 |
0.306 |
|
2008 |
Umana-Membreno GA, Parish G, Fichtenbaum N, Keller S, Mishra UK, Nener BD. Electrically active defects in GaN layers grown with and without Fe-doped buffers by metal-organic chemical vapor deposition Journal of Electronic Materials. 37: 569-572. DOI: 10.1007/S11664-007-0313-3 |
0.551 |
|
2008 |
Lian C, Xing HG, Chang YC, Fichtenbaum N. The role of doping type in setback layers on wafer-fused AlGaAs/GaAs/GaN HBTs Physica Status Solidi (C) Current Topics in Solid State Physics. 5: 2960-2962. DOI: 10.1002/Pssc.200779307 |
0.539 |
|
2008 |
Schaake CA, Fichtenbaum NA, Neufeld CJ, Keller S, Denbaars SP, Speck JS, Mishra UK. M-plane InGaN/GaN light emitting diodes fabricated by MOCVD regrowth on c-plane patterned templates Physica Status Solidi (C) Current Topics in Solid State Physics. 5: 2963-2965. DOI: 10.1002/Pssc.200779284 |
0.798 |
|
2008 |
Cuerdo R, Pei Y, Recht F, Fichtenbaum N, Keller S, Denbaars SP, Calle F, Mishra UK. Temperature-dependent high-frequency performance of deep submicron AlGaN/GaN HEMTs Physica Status Solidi (C) Current Topics in Solid State Physics. 5: 2994-2997. DOI: 10.1002/Pssc.200779240 |
0.765 |
|
2008 |
Kocan M, Umana-Membreno GA, Recht F, Baharin A, Fichtenbaum NA, McCarthy L, Keller S, Menozzi R, Mishra UK, Parish G, Nener BD. GaN vertical n-p junctions prepared by Si ion implantation Physica Status Solidi (C) Current Topics in Solid State Physics. 5: 1938-1940. DOI: 10.1002/Pssc.200778496 |
0.779 |
|
2007 |
Pei Y, Shen L, Palacios T, Fichtenbaum NA, McCarthy LS, Keller S, DenBaars SP, Mishra UK. Study of the n+ GaN cap in AlGaN/GaN high electron mobility transistors with reduced source-drain resistance Japanese Journal of Applied Physics, Part 2: Letters. 46: L842-L844. DOI: 10.1143/Jjap.46.L842 |
0.813 |
|
2007 |
Fichtenbaum NA, Neufeld CJ, Schaake C, Wu Y, Wong MH, Grundmann M, Keller S, DenBaars SP, Speck JS, Mishra UK. Metalorganic chemical vapor deposition regrowth of InGaN and GaN on N-polar pillar and stripe nanostructures Japanese Journal of Applied Physics, Part 2: Letters. 46: L230-L233. DOI: 10.1143/Jjap.46.L230 |
0.79 |
|
2007 |
Pei Y, Chu R, Fichtenbaum NA, Chen Z, Brown D, Shen L, Keller S, DenBaars SP, Mishra UK. Recessed slant gate AlGaN/GaN high electron mobility transistors with 20.9 W/mm at 10 GHz Japanese Journal of Applied Physics, Part 2: Letters. 46: L1087-L1089. DOI: 10.1143/Jjap.46.L1087 |
0.801 |
|
2007 |
Shen L, Pei Y, McCarthy L, Poblenz C, Corrion A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK. Deep-recessed GaN HEMTs using selective etch technology exhibiting high microwave performance without surface passivation Ieee Mtt-S International Microwave Symposium Digest. 623-626. DOI: 10.1109/MWSYM.2007.379978 |
0.782 |
|
2007 |
Chu R, Shu CS, Wong MH, Fichtenbaum N, Brown D, McCarthy L, Keller S, Feng W, Speck JS, Mishra UK. Impact of CF4 plasma treatment on GaN Ieee Electron Device Letters. 28: 781-783. DOI: 10.1109/Led.2007.902849 |
0.73 |
|
2007 |
Keller S, Fichtenbaum NA, Wu F, Brown D, Rosales A, Denbaars SP, Speck JS, Mishra UK. Influence of the substrate misorientation on the properties of N-polar GaN films grown by metal organic chemical vapor deposition Journal of Applied Physics. 102. DOI: 10.1063/1.2801406 |
0.324 |
|
2007 |
Fichtenbaum NA, Schaake C, Mates TE, Cobb C, Keller S, Denbaars SP, Mishra UK. Electrical characterization of p -type N-polar and Ga-polar GaN grown by metalorganic chemical vapor deposition Applied Physics Letters. 91. DOI: 10.1063/1.2800304 |
0.817 |
|
2007 |
Keller S, Fichtenbaum NA, Furukawa M, Speck JS, Denbaars SP, Mishra UK. Growth and characterization of N-polar InGaNGaN multiquantum wells Applied Physics Letters. 90. DOI: 10.1063/1.2738381 |
0.383 |
|
2007 |
Pei Y, Recht F, Fichtenbaum N, Keller S, Denbaars SP, Mishra UK. Deep submicron AlGaN/GaN HEMTs with ion implanted source/drain regions and non-alloyed ohmic contacts Electronics Letters. 43: 1466-1467. DOI: 10.1049/El:20072969 |
0.792 |
|
2007 |
Neufeld CJ, Schaake C, Grundmann M, Fichtenbaum NA, Keller S, Mishra UK. InGaN/GaN nanopillar-array light emitting diodes Physica Status Solidi (C) Current Topics in Solid State Physics. 4: 1605-1608. DOI: 10.1002/Pssc.200674292 |
0.803 |
|
2007 |
Fichtenbaum NA, Neufeld CJ, Schaake C, Wu Y, Wong MH, Grundmann M, Keller S, DenBaars SP, Speck JS, Mishra UK. MOCVD regrowth of InGaN on N-polar and Ga-polar pillar and stripe nanostructures Physica Status Solidi (B) Basic Research. 244: 1802-1805. DOI: 10.1002/Pssb.200674753 |
0.783 |
|
2007 |
Keller S, Fichtenbaum NA, Schaake C, Neufeld CJ, David A, Matioli E, Wu Y, DenBaars SP, Speck JS, Weisbuch C, Mishra UK. Optical properties of GaN nanopillar and nanostripe arrays with embedded InGaN/GaN multi quantum wells Physica Status Solidi (B) Basic Research. 244: 1797-1801. DOI: 10.1002/Pssb.200674752 |
0.785 |
|
2006 |
Keller S, Fichtenbaum N, Wu F, Lee G, Denbaars SP, Speck JS, Mishra UK. Effect of the nucleation conditions on the polarity of AlN and GaN films grown on C-face 6H-SiC Japanese Journal of Applied Physics, Part 2: Letters. 45: L322-L325. DOI: 10.1143/Jjap.45.L322 |
0.462 |
|
2006 |
Shen L, Palacios T, Poblenz C, Corrion A, Chakraborty A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK. Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment Ieee Electron Device Letters. 27: 214-216. DOI: 10.1109/Led.2006.871887 |
0.715 |
|
2006 |
Suh CS, Dora Y, Fichtenbaum N, McCarthy L, Keller S, Mishra UK. High-breakdown enhancement-mode AlGaN/GaN HEMTs with integrated slant field-plate Technical Digest - International Electron Devices Meeting, Iedm. DOI: 10.1109/IEDM.2006.346931 |
0.771 |
|
2006 |
Keller S, Schaake C, Fichtenbaum NA, Neufeld CJ, Wu Y, McGroddy K, David A, Denbaars SP, Weisbuch C, Speck JS, Mishra UK. Optical and structural properties of GaN nanopillar and nanostripe arrays with embedded InGaN/GaN multi-quantum wells Journal of Applied Physics. 100. DOI: 10.1063/1.2234812 |
0.79 |
|
2006 |
Shen L, Chakraborty A, McCarthy L, Fichtenbaum N, Keller S, Denbaars SP, Mishra UK. High performance deeply-recessed GaN power HEMTs without surface passivation Electronics Letters. 42: 555-556. DOI: 10.1049/El:20064262 |
0.804 |
|
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