Hameed A. Naseem
Affiliations: | University of Arkansas, Fayetteville, Fayetteville, AR, United States |
Area:
Electronics and Electrical Engineering, System Science EngineeringWebsite:
https://engineering.uark.edu/directory/index/uid/hanaseem/name/Hameed+A.+Naseem/Google:
"Hameed Naseem"Bio:
https://www.muslimscientists.org/hameed-naseem
DOI: 10.1016/0040-6090(85)90093-8
Parents
Sign in to add mentorLarry C. Burton | grad student | 1983 | Virginia Tech (Physics Tree) | |
(Fabrication and modeling of the CdS/ZnSiAs2 heterojunction) |
Children
Sign in to add traineeMosleh H. Alotaibi | grad student | 2002 | University of Arkansas |
Marwan A. Albarghouti | grad student | 2004 | University of Arkansas |
Maruf Hossain | grad student | 2004 | University of Arkansas |
Khalil H. Sharif | grad student | 2005 | University of Arkansas |
BETA: Related publications
See more...
Publications
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
Banihashemian SF, Grant JM, Sabbar A, et al. (2020) Growth and characterization of low-temperature Si 1-x Sn x on Si using plasma enhanced chemical vapor deposition Optical Materials Express. 10: 2242-2253 |
Abu-Safe HH, Al-Esseili R, Sarollahi M, et al. (2020) Thermally-induced nonlinear optical properties of silver nano-films near surface plasmon resonance Optical Materials. 105: 109858 |
Sabbar A, Grant JM, Grant PC, et al. (2020) Growth and Characterization of SiGe on c-Plane Sapphire Using a Chemical Vapor Deposition System Journal of Electronic Materials. 49: 4809-4815 |
Abu‐Safe HH, Al‐Esseili R, El‐Nasser H, et al. (2020) Au–Ag–Al Nano‐Alloy Thin Films as an Advanced Material for Photonic Applications: XPS Analysis, Linear and Nonlinear Optical Properties Under CW Regime Crystal Research and Technology. 55: 1900228 |
Grant PC, Dou W, Alharthi B, et al. (2019) UHV-CVD growth of high quality GeSn using SnCl4: from material growth development to prototype devices Optical Materials Express. 9: 3277-3291 |
Alharthi B, Dou W, Grant PC, et al. (2019) Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications Applied Surface Science. 481: 246-254 |
Dou W, Alharthi B, Grant PC, et al. (2018) Crystalline GeSn growth by plasma enhanced chemical vapor deposition Optical Materials Express. 8: 3220-3229 |
Alharthi B, Grant JM, Dou W, et al. (2018) Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement Journal of Electronic Materials. 47: 4561-4570 |
Alahmad H, Mosleh A, Alher M, et al. (2018) GePb Alloy Growth Using Layer Inversion Method Journal of Electronic Materials. 47: 3733-3740 |
Ghetmiri SA, Zhou Y, Margetis J, et al. (2017) Study of a SiGeSn/GeSn/SiGeSn structure toward direct bandgap type-I quantum well for all group-IV optoelectronics. Optics Letters. 42: 387-390 |