Hameed A. Naseem

Affiliations: 
University of Arkansas, Fayetteville, Fayetteville, AR, United States 
Area:
Electronics and Electrical Engineering, System Science Engineering
Website:
https://engineering.uark.edu/directory/index/uid/hanaseem/name/Hameed+A.+Naseem/
Google:
"Hameed Naseem"
Bio:

https://www.muslimscientists.org/hameed-naseem
DOI: 10.1016/0040-6090(85)90093-8

Parents

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Larry C. Burton grad student 1983 Virginia Tech (Physics Tree)
 (Fabrication and modeling of the CdS/ZnSiAs2 heterojunction)
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Publications

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Banihashemian SF, Grant JM, Sabbar A, et al. (2020) Growth and characterization of low-temperature Si 1-x Sn x on Si using plasma enhanced chemical vapor deposition Optical Materials Express. 10: 2242-2253
Abu-Safe HH, Al-Esseili R, Sarollahi M, et al. (2020) Thermally-induced nonlinear optical properties of silver nano-films near surface plasmon resonance Optical Materials. 105: 109858
Sabbar A, Grant JM, Grant PC, et al. (2020) Growth and Characterization of SiGe on c-Plane Sapphire Using a Chemical Vapor Deposition System Journal of Electronic Materials. 49: 4809-4815
Abu‐Safe HH, Al‐Esseili R, El‐Nasser H, et al. (2020) Au–Ag–Al Nano‐Alloy Thin Films as an Advanced Material for Photonic Applications: XPS Analysis, Linear and Nonlinear Optical Properties Under CW Regime Crystal Research and Technology. 55: 1900228
Grant PC, Dou W, Alharthi B, et al. (2019) UHV-CVD growth of high quality GeSn using SnCl4: from material growth development to prototype devices Optical Materials Express. 9: 3277-3291
Alharthi B, Dou W, Grant PC, et al. (2019) Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications Applied Surface Science. 481: 246-254
Dou W, Alharthi B, Grant PC, et al. (2018) Crystalline GeSn growth by plasma enhanced chemical vapor deposition Optical Materials Express. 8: 3220-3229
Alharthi B, Grant JM, Dou W, et al. (2018) Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement Journal of Electronic Materials. 47: 4561-4570
Alahmad H, Mosleh A, Alher M, et al. (2018) GePb Alloy Growth Using Layer Inversion Method Journal of Electronic Materials. 47: 3733-3740
Ghetmiri SA, Zhou Y, Margetis J, et al. (2017) Study of a SiGeSn/GeSn/SiGeSn structure toward direct bandgap type-I quantum well for all group-IV optoelectronics. Optics Letters. 42: 387-390
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