Lei Yuan, Ph.D. - Publications

Affiliations: 
2005 University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices

7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Lei S, Ryu J, Wen K, Twitchell E, Bui T, Ramesh A, Weiss M, Li G, Samuel H, Clark-Deener S, Jiang X, Lee K, Yuan L. Increased and prolonged human norovirus infection in RAG2/IL2RG deficient gnotobiotic pigs with severe combined immunodeficiency. Scientific Reports. 6: 25222. PMID 27118081 DOI: 10.1038/Srep25222  0.055
2016 Lei S, Samuel H, Twitchell E, Bui T, Ramesh A, Wen K, Weiss M, Li G, Yang X, Jiang X, Yuan L. Enterobacter cloacae inhibits human norovirus infectivity in gnotobiotic pigs. Scientific Reports. 6: 25017. PMID 27113278 DOI: 10.1038/Srep25017  0.037
2016 Wen K, Bui T, Weiss M, Li G, Kocher J, Yang X, Jobst PM, Vaught T, Ramsoondar J, Ball S, Clark-Deener S, Ayares D, Yuan L. B-Cell-Deficient and CD8 T-Cell-Depleted Gnotobiotic Pigs for the Study of Human Rotavirus Vaccine-Induced Protective Immune Responses. Viral Immunology. PMID 26824402 DOI: 10.1089/Vim.2015.0105  0.03
2006 Neureuther AR, Pease RFW, Yuan L, Parizi KB, Esfandyarpour H, Poppe WJ, Liddle JA, Anderson EH. Shot noise models for sequential processes and the role of lateral mixing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1902-1908. DOI: 10.1116/1.2218875  0.661
2002 Cheng M, Yuan L, Croffie E, Neureuther A. Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 734-740. DOI: 10.1116/1.1464835  0.703
2000 Cheng M, Croffie E, Yuan L, Neureuther A. Enhancement of resist resolution and sensitivity via applied electric field Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3318-3322. DOI: 10.1116/1.1324646  0.691
2000 Croffie E, Yuan L, Cheng M, Neureuther A, Houlihan F, Cirelli R, Watson P, Nalamasu O, Gabor A. Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3340-3344. DOI: 10.1116/1.1324636  0.684
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