Nicholas C. Fuller, Ph.D.

Irving P. Herman	grad student	2002	Columbia
(Controlling the relative rates of adlayer formation and removal during etching in inductively coupled plasmas.)

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Volksen W, Purushothaman S, Darnon M, et al. (2012) Integration of a manufacturing grade, k = 2.0 spin-on material in a single damascene structure Ecs Journal of Solid State Science and Technology. 1
Shohet JL, Ren H, Nichols MT, et al. (2012) The effects of plasma exposure on low-k dielectric materials Proceedings of Spie - the International Society For Optical Engineering. 8328
Tsai HY, Miyazoe H, Engelmann S, et al. (2012) Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30
Sinha H, Ren H, Nichols MT, et al. (2012) The effects of vacuum ultraviolet radiation on low-k dielectric films Journal of Applied Physics. 112
Lin Q, Chen ST, Nelson A, et al. (2010) Multi-level integration of patternable low-κ material into advanced Cu BEOL Proceedings of Spie - the International Society For Optical Engineering. 7639
Guillorn M, Chang J, Fuller N, et al. (2009) Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2588-2592