Richard J. McNeely
Affiliations: | Northwestern University, Evanston, IL |
Area:
Inorganic ChemistryGoogle:
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Publications
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McNeely RJ, Belot JA, Marks TJ, et al. (2000) Analysis of the fluoride effect on the phase-selective growth of TlBa2Ca2Cu3O9−x thin films: Phase evolution and microstructure development Journal of Materials Research. 15: 1083-1097 |
McNeely RJ, Belot JA, Marks TJ, et al. (2000) Analysis of the fluoride effect on the phase-selective growth of TlBa |
Belot JA, McNeely RJ, Wang A, et al. (1999) Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth Journal of Materials Research. 14: 12-15 |
Belot JA, Wang A, McNeely RJ, et al. (1999) Highly Volatile, Low Melting, Fluorine-Free Precursors for Metal-Organic Chemical Vapor Deposition of Lanthanide Oxide-Containing Thin Films Chemical Vapor Deposition. 5: 65-69 |
Belot JA, Wang A, McNeely RJ, et al. (1999) Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films Chemical Vapor Deposition. 5: 65-69 |
McNeely RJ, Belot JA, Schindler JL, et al. (1998) Journal of Superconductivity: Incorporating Novel Magnetism. 11: 133-134 |
Wang A, Cheng SC, Belot JA, et al. (1998) Metal-organic chemical vapor deposition routes to films of transparent conducting oxides Materials Research Society Symposium - Proceedings. 495: 3-10 |
McNeely RJ, Belot JA, Schindler JL, et al. (1998) Novel metal-organic chemical vapor deposition / TlF annealing route to thin films of Tl |
Wang A, Cheng SC, Belot JA, et al. (1997) Metal-Organic Chemical Vapor Deposition Routes to Films of Transparent Conducting Oxides Mrs Proceedings. 495 |
Hinds BJ, McNeely RJ, Studebaker DB, et al. (1997) Thin films for superconducting electronics: Precursor performance issues, deposition mechanisms, and superconducting phase formation-processing strategies in the growth of Tl2Ba2CaCu2O8 films by metal-organic chemical vapor deposition Journal of Materials Research. 12: 1214-1236 |