Jason T. Drotar, Ph.D.
Affiliations: | 2002 | Rensselaer Polytechnic Institute, Troy, NY, United States |
Area:
Condensed Matter PhysicsGoogle:
"Jason Drotar"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Gwo-Ching Wang | grad student | 2002 | RPI | |
| (Temporal evolution of surface structure and morphology in thin-film growth and etching processes.) | ||||
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Publications
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| Drotar JT, Lu TM, Wang GC. (2004) Real-time observation of initial stages of copper film growth on silicon oxide using reflection high-energy electron diffraction Journal of Applied Physics. 96: 7071-7079 |
| Senkevich JJ, Tang F, Rogers D, et al. (2003) Substrate-Independent Palladium Atomic Layer Deposition Advanced Materials. 15: 258-264 |
| Lu TM, Zhao YP, Drotar JT, et al. (2002) Novel Mechanisms on the Growth Morphology of Films Materials Research Society Symposium - Proceedings. 749: 3-8 |
| Zhao YP, Drotar JT, Wang GC, et al. (2001) Morphology transition during low-pressure chemical vapor deposition. Physical Review Letters. 87: 136102 |
| Drotar JT, Zhao YP, Lu TM, et al. (2001) Why is KPZ type surface roughening so hard to observe? Materials Research Society Symposium - Proceedings. 648 |
| Drotar JT, Zhao YP, Lu TM, et al. (2001) Surface roughening in low-pressure chemical vapor deposition Physical Review B - Condensed Matter and Materials Physics. 64: 1254111-1254115 |
| Drotar JT, Zhao YP, Lu TM, et al. (2000) Surface roughening in shadowing growth and etching in 2+1 dimensions Physical Review B - Condensed Matter and Materials Physics. 62: 2118-2125 |
| Drotar JT, Zhao YP, Lu TM, et al. (2000) Mechanisms for plasma and reactive ion etch-front roughening Physical Review B - Condensed Matter and Materials Physics. 61: 3012-3021 |
| Zhao YP, Drotar JT, Wang GC, et al. (1999) Roughening in plasma etch fronts of Si(100) Physical Review Letters. 82: 4882-4885 |
| Drotar JT, Zhao YP, Lu TM, et al. (1999) Numerical analysis of the noisy Kuramoto-Sivashinsky equation in 2+1 dimensions Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 59: 177-185 |