Gilbert D. Feke, Ph.D.
|2001||Yale University, New Haven, CT|
Area:Optics Physics, Analytical Chemistry
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|Feke GD, Grober RD, Pohlers G, et al. (2001) On-wafer spectrofluorometric method for determination of relative quantum yields of photoacid generation in chemically amplified resists. Analytical Chemistry. 73: 3472-80|
|Feke GD, Grober RD, Pohlers G, et al. (2001) Method for measuring profiles of photoacid patterns in chemically amplified resists Materials Research Society Symposium - Proceedings. 636|
|Feke GD, Hessman D, Grober RD, et al. (2000) On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 136-139|
|Feke GD, Snow DP, Grober RD, et al. (1998) Interferometric back focal plane microellipsometry. Applied Optics. 37: 1796-802|