Gilbert D. Feke, Ph.D.
Affiliations: | 2001 | Yale University, New Haven, CT |
Area:
Optics Physics, Analytical ChemistryGoogle:
"Gilbert Feke"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Robert D. Grober | grad student | 2001 | Yale | |
| (Characterization of photoacid generation in chemically amplified photoresists using pH -sensitive fluorescence imaging.) | ||||
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| Mason MD, Ray K, Feke GD, et al. (2003) Calibration and validation of projection lithography in chemically amplified resist systems using fluorescence imaging Proceedings of Spie - the International Society For Optical Engineering. 5038: 473-482 |
| Feke GD, Grober RD, Pohlers G, et al. (2002) Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 164-166 |
| Feke GD, Grober RD, Pohlers G, et al. (2001) On-wafer spectrofluorometric method for determination of relative quantum yields of photoacid generation in chemically amplified resists. Analytical Chemistry. 73: 3472-80 |
| Feke GD, Grober RD, Pohlers G, et al. (2001) Method for measuring profiles of photoacid patterns in chemically amplified resists Materials Research Society Symposium - Proceedings. 636 |
| Feke GD, Hessman D, Grober RD, et al. (2000) On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 136-139 |
| Wu Q, Feke GD, Grober RD, et al. (1999) Realization of numerical aperture 2.0 using a gallium phosphide solid immersion lens Applied Physics Letters. 75: 4064-4066 |
| Feke GD, Snow DP, Grober RD, et al. (1998) Interferometric back focal plane microellipsometry. Applied Optics. 37: 1796-802 |
| Bukofsky SJ, Feke GD, Wu Q, et al. (1998) Imaging of photogenerated acid in a chemically amplified photoresist Applied Physics Letters. 73: 408-410 |
| Dentinger PM, Lu B, Taylor JW, et al. (1998) On-wafer photoacid determination and imaging technique for chemically amplified photoresists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 3767-3772 |