Henry I. Smith
Affiliations: | Electrical Engineering | Massachusetts Institute of Technology, Cambridge, MA, United States |
Area:
lithography methodsWebsite:
http://www.chemheritage.org/discover/collections/oral-histories/details/smith-henry-i.aspxGoogle:
"Henry I. Smith"Bio:
http://www.bc.edu/schools/cas/physics/henry_smith_profile.html
http://web.mit.edu/nanomembranes/index_files/Page880.htm
http://www.chemheritage.org/Oral-Histories/Documents/H.Smith--Front-Matter-and-Index.pdf
http://nanoweb.mit.edu/fullpublist.html#Theses
http://adsabs.harvard.edu/abs/1966PhDT........26S
Mean distance: 9.88 | S | N | B | C | P |
Cross-listing: Chemistry Tree
Parents
Sign in to add mentorJoseph H. Chen | grad student | 1966 | Boston College | |
(Investigation of the Repulsive Interaction in Alkaline-Earth Flourides) |
Children
Sign in to add traineeStephen Yu Chou | grad student | 1986 | MIT (E-Tree) |
Harry A. Atwater | grad student | 1987 | MIT |
Thomas E. Murphy | grad student | 2001 | MIT (E-Tree) |
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Publications
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Sun J, Holzwarth CW, Smith HI. (2012) Phase-shift bragg grating in silicon using equivalent phase-shift method Ieee Photonics Technology Letters. 24: 25-27 |
Orcutt JS, Khilo A, Holzwarth CW, et al. (2011) Nanophotonic integration in state-of-the-art CMOS foundries. Optics Express. 19: 2335-46 |
Patel AA, Fucetola CP, Moon EE, et al. (2011) 3D fabrication by stacking prepatterned, rigidly held membranes Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29 |
Manfrinato VR, Cheong LL, Duan H, et al. (2011) Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist Microelectronic Engineering. 88: 3070-3074 |
Holzwarth CW, Khilo A, Dahlem M, et al. (2010) Device architecture and precision nanofabrication of microring-resonator filter banks for integrated photonic systems. Journal of Nanoscience and Nanotechnology. 10: 2044-52 |
Reisinger T, Eder S, Greve MM, et al. (2010) Free-standing silicon-nitride zoneplates for neutral-helium microscopy Microelectronic Engineering. 87: 1011-1014 |
Fucetola CP, Patel AA, Moon EE, et al. (2009) Coherent diffraction lithography: Periodic patterns via mask-based interference lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2947-2950 |
Choi WK, Liew TH, Dawood MK, et al. (2008) Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching. Nano Letters. 8: 3799-802 |
Dai J, Wang Q, Li W, et al. (2008) The fabrication of 2-D global fiducial grid with high resolution for spatial phase locked e-beam lithography Materials Science Forum. 575: 1252-1257 |
Barwicz T, Popovi? MA, Gan F, et al. (2008) Reconfigurable silicon photonic circuits for telecommunication applications Proceedings of Spie - the International Society For Optical Engineering. 6872 |