Dimitrios Louloudakis
Affiliations: | 2016 | University of Crete, Greece |
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Parents
Sign in to add mentorGeorge Kiriakidis | grad student | 2016 | University of Crete, Greece | |
(Growth and study of novel chromic coatings and devices for "Smart Windows") |
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Publications
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Louloudakis D, Thongpan W, Mouratis K, et al. (2019) Novel Spark Method for Deposition of Metal Oxide Thin Films: Deposition of Hexagonal Tungsten Oxide (Phys. Status Solidi A 7∕2019) Physica Status Solidi (a). 216: 1970028 |
Louloudakis D, Thongpan W, Mouratis K, et al. (2019) Novel Spark Method for Deposition of Metal Oxide Thin Films: Deposition of Hexagonal Tungsten Oxide Physica Status Solidi (a). 216: 1800513 |
Vernardou D, Louloudakis D, Rasoulis M, et al. (2017) Atmospheric Pressure Chemical Vapor Deposition of Vanadium Oxides at 300 °C for Li-Ion Batteries Materials Focus. 6: 314-318 |
Christou K, Louloudakis D, Vernardou D, et al. (2015) Effect of solution chemistry on the characteristics of hydrothermally grown WO3 for electroactive applications Thin Solid Films. 594: 333-337 |
Apostolopoulou M, Louloudakis D, Vernardou D, et al. (2015) Study of the pH effect on the properties of the hydrothermally grown V2O5 Thin Solid Films. 594: 338-342 |
Louloudakis D, Vernardou D, Spanakis E, et al. (2015) Effect of O2 flow rate on the thermochromic performance of VO2 coatings grown by atmospheric pressure CVD Physica Status Solidi (C). 12: 856-860 |
Psifis K, Louloudakis D, Vernardou D, et al. (2015) Effect of O |
Vernardou D, Apostolopoulou M, Louloudakis D, et al. (2015) Electrochemical Performance of Vanadium Oxide Coatings Grown using Atmospheric Pressure CVD Chemical Vapor Deposition. 21: 369-374 |
Vernardou D, Louloudakis D, Spanakis E, et al. (2014) Electrochemical properties of vanadium oxide coatings grown by hydrothermal synthesis on FTO substrates New J. Chem.. 38: 1959-1964 |
Louloudakis D, Vernardou D, Spanakis E, et al. (2013) Electrochemical properties of vanadium oxide coatings grown by APCVD on glass substrates Surface and Coatings Technology. 230: 186-189 |