Carlos Melendres

Affiliations: 
Advanced Photon Source Argonne National Laboratory, Lemont, IL, United States 
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"Carlos Melendres"
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Hahn F, Melendres CA. (2010) Synchrotron infrared reflectance microspectroscopy study of film formation and breakdown on copper. Journal of Synchrotron Radiation. 17: 81-5
MANSOUR AN, MELENDRES CA, PANKUCH M, et al. (2010) ChemInform Abstract: X-Ray Absorption Fine Structure Spectra and the Oxidation State of Nickel in Some of Its Oxycompounds. Cheminform. 25: no-no
MELENDRES CA, PANKUCH M, LI YS, et al. (2010) ChemInform Abstract: Surface Enhanced Raman Spectroelectrochemical Studies of the Corrosion Films on Iron and Chromium in Aqueous Solution Environments. Cheminform. 23: no-no
MELENDRES CA, PANKUCH M. (2010) ChemInform Abstract: Composition of the Passive Film on Nickel: A Surface-Enhanced Raman Spectroelectrochemical Study. Cheminform. 23: no-no
Hahn F, Mathis Y-, Bonnefont A, et al. (2007) In situ synchrotron far-infrared spectromicroscopy of a copper electrode at grazing incidence angle. Journal of Synchrotron Radiation. 14: 446-8
Van Gils S, Melendres CA, Terryn H. (2003) Quantitative chemical composition of thin films with infrared spectroscopic ellipsometry: application to hydrated oxide films on aluminium Surface and Interface Analysis. 35: 387-394
Melendres C, Van Gils S, Terryn H. (2001) Toward a quantitative description of the anodic oxide films on aluminum Electrochemistry Communications. 3: 737-741
Balasubramanian M, Melendres CA, Mini S. (2000) X-ray Absorption Spectroscopy Studies of the Local Atomic and Electronic Structure of Iron Incorporated into Electrodeposited Hydrous Nickel Oxide Films† The Journal of Physical Chemistry B. 104: 4300-4306
Balasubramanian M, Melendres C. (1999) Local structure of chromium incorporated into electrodeposited nickel hydroxide films. Journal of Synchrotron Radiation. 6: 594-5
Balasubramanian M, Melendres CA, Mansour AN. (1999) X‐Ray Absorption Spectroscopy Study of the Local Structure of Heavy Metal Ions Incorporated into Electrodeposited Nickel Oxide Films Journal of the Electrochemical Society. 146: 607-614
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