John J. Garramone
Affiliations: | 2011 | Nanoscale Science and Engineering-Nanoscale Science | State University of New York, Albany, Albany, NY, United States |
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"John Garramone"Mean distance: 16.32 | S | N | B | C | P |
Parents
Sign in to add mentorVincent P. LaBella | grad student | 2011 | SUNY Albany | |
(Role of interface band structure on hot electron transport.) |
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Publications
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Karmel HJ, Garramone JJ, Emery JD, et al. (2014) Self-assembled organic monolayers on epitaxial graphene with enhanced structural and thermal stability. Chemical Communications (Cambridge, England). 50: 8852-5 |
Sitnitsky I, Garramone JJ, Abel J, et al. (2012) Schottky barrier and attenuation length for hot hole injection in nonepitaxial Au on p-type GaAs Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30 |
Abel J, Matsubayashi A, Garramone JJ, et al. (2012) Temperature dependent spin precession measurements in trilayer graphene utilizing co/graphene contacts Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 30: 03D115 |
Garramone JJ, Abel JR, Barraza-Lopez S, et al. (2012) Signatures of the semiconductor crystallographic orientation on the charge transport across non-epitaxial diodes Applied Physics Letters. 100 |
Garramone JJ, Abel JR, Sitnitsky IL, et al. (2010) Hot-electron transport studies of the Ag/Si(001) interface using ballistic electron emission microscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 643-646 |
Abel J, Garramone JJ, Sitnitsky IL, et al. (2010) Studies of Al2 O3 barriers for use in tunnel junctions for nonlocal spin detection experiments Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 702-705 |
Garramone JJ, Abel JR, Sitnitsky IL, et al. (2010) Erratum: “Measurement of the hot electron attenuation length of copper” [Appl. Phys. Lett. 96, 062105 (2010)] Applied Physics Letters. 96: 269901 |
Garramone JJ, Abel JR, Sitnitsky IL, et al. (2010) Measurement of the hot electron attenuation length of copper Applied Physics Letters. 96 |
Garramone JJ, Abel JR, Sitnitsky IL, et al. (2009) Hot electron transport studies of the Cu/Si(001) interface using ballistic electron emission microscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2044-2047 |
Stollenwerk AJ, Spadafora EJ, Garramone JJ, et al. (2008) Effect of interface band structure on hot-electron attenuation lengths in Au thin films Physical Review B - Condensed Matter and Materials Physics. 77 |