William J. McMahon, Ph.D. - Publications
Affiliations: | 2002 | University of Illinois, Urbana-Champaign, Urbana-Champaign, IL |
Area:
Condensed Matter PhysicsYear | Citation | Score | |||
---|---|---|---|---|---|
2003 | McMahon W, Haggag A, Hess K. Reliability scaling issues for nanoscale devices Ieee Transactions On Nanotechnology. 2: 33-38. DOI: 10.1109/Tnano.2003.808515 | 0.703 | |||
2003 | Penzin O, Haggag A, McMahon W, Lyumkis E, Hess K. MOSFET degradation kinetics and its simulation Ieee Transactions On Electron Devices. 50: 1445-1450. DOI: 10.1109/Ted.2003.813333 | 0.665 | |||
2002 | McMahon W, Hess K. A Multi-Carrier Model for Interface Trap Generation Journal of Computational Electronics. 1: 395-398. DOI: 10.1023/A:1020716111756 | 0.529 | |||
2002 | McMahon W, Haggag A, Hess K. A new paradigm for examining MOSFET failure modes Physica B-Condensed Matter. 314: 358-362. DOI: 10.1016/S0921-4526(01)01424-7 | 0.686 | |||
2001 | Haggag A, McMahon W, Hess K, Fischer B, Register LF. Impact of scaling on CMOS chip failure rate, and design rules for hot carrier reliability Vlsi Design. 13: 111-115. DOI: 10.1155/2001/90787 | 0.693 | |||
2001 | Hess K, Haggag A, McMahon W, Cheng K, Lee J, Lyding J. The physics of determining chip reliability Ieee Circuits and Devices Magazine. 17: 33-38. DOI: 10.1109/101.933789 | 0.681 | |||
2000 | Tuttle BR, McMahon W, Hess K. Hydrogen and hot electron defect creation at the Si(100)/SiO2 interface of metal-oxide-semiconductor field effect transistors Superlattices and Microstructures. 27: 229-233. DOI: 10.1006/Spmi.1999.0804 | 0.565 | |||
1999 | Hess K, Register LF, McMahon W, Tuttle B, Aktas O, Ravaioli U, Lyding JW, Kizilyalli IC. Theory of channel hot-carrier degradation in MOSFETs Physica B: Condensed Matter. 272: 527-531. DOI: 10.1016/S0921-4526(99)00363-4 | 0.596 | |||
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