Year |
Citation |
Score |
2021 |
Geka G, Papageorgiou G, Chatzichristidi M, Karydas AG, Psycharis V, Makarona E. CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography. Nanomaterials (Basel, Switzerland). 11. PMID 33803056 DOI: 10.3390/nano11030762 |
0.303 |
|
2020 |
Nika A, Oikonomou P, Manouras T, Argitis P, Vamvakaki M, Sanopoulou M, Raptis I, Chatzichristidi M. Reversible chemocapacitor system based on PDMAEMA polymers for fast sensing of VOCs mixtures Microelectronic Engineering. 227: 111304. DOI: 10.1016/J.Mee.2020.111304 |
0.384 |
|
2019 |
Machairioti F, Petrou P, Oh HT, Lee JK, Kakabakos S, Argitis P, Chatzichristidi M. Bio-orthogonal fluorinated resist for biomolecules patterning applications. Colloids and Surfaces. B, Biointerfaces. 178: 208-213. PMID 30856590 DOI: 10.1016/J.Colsurfb.2019.03.006 |
0.715 |
|
2019 |
Filippidou MK, Chatzichristidi M, Chatzandroulis S. A fabrication process of flexible IDE capacitive chemical sensors using a two step lift-off method based on PVA patterning Sensors and Actuators B-Chemical. 284: 7-12. DOI: 10.1016/J.Snb.2018.12.095 |
0.365 |
|
2019 |
Botsi S, Tsamis C, Chatzichristidi M, Papageorgiou G, Makarona E. Facile and cost-efficient development of PMMA-based nanocomposites with custom-made hydrothermally-synthesized ZnO nanofillers Nano-Structures and Nano-Objects. 17: 7-20. DOI: 10.1016/J.Nanoso.2018.10.003 |
0.394 |
|
2018 |
Gavriil V, Chatzichristidi M, Kollia Z, Cefalas AC, Spyropoulos-Antonakakis N, Semashko VV, Sarantopoulou E. Photons Probe Entropic Potential Variation during Molecular Confinement in Nanocavities. Entropy (Basel, Switzerland). 20. PMID 33265634 DOI: 10.3390/E20080545 |
0.314 |
|
2015 |
Chavelas D, Oikonomou P, Botsialas A, Argitis P, Papanikolaou N, Goustouridis D, Beltsios K, Lidorikis E, Raptis I, Chatzichristidi M. Lithographically tuned one dimensional polymeric photonic crystal arrays Optics and Laser Technology. 68: 105-112. DOI: 10.1016/J.Optlastec.2014.11.008 |
0.378 |
|
2013 |
Midthun KM, Taylor PG, Newby C, Chatzichristidi M, Petrou PS, Lee JK, Kakabakos SE, Baird BA, Ober CK. Orthogonal patterning of multiple biomolecules using an organic fluorinated resist and imprint lithography. Biomacromolecules. 14: 993-1002. PMID 23439033 DOI: 10.1021/Bm301783T |
0.754 |
|
2012 |
Shayan G, Felix N, Cho Y, Chatzichristidi M, Shuler ML, Ober CK, Lee KH. Synthesis and characterization of high-throughput nanofabricated poly(4-hydroxy styrene) membranes for in vitro models of barrier tissue. Tissue Engineering. Part C, Methods. 18: 667-76. PMID 22435738 DOI: 10.1089/Ten.Tec.2011.0598 |
0.646 |
|
2011 |
Zakhidov AA, Lee JK, Defranco JA, Fong HH, Taylor PG, Chatzichristidi M, Ober CK, Malliaras GG. Orthogonal processing: A new strategy for organic electronics Chemical Science. 2: 1178-1182. DOI: 10.1039/C0Sc00612B |
0.733 |
|
2011 |
Georgaki MI, Oikonomou P, Botsialas A, Papanikolaou N, Raptis I, Argitis P, Chatzichristidi M. Powerless and reversible color humidity sensor Procedia Engineering. 25: 1177-1180. DOI: 10.1016/J.Proeng.2011.12.290 |
0.365 |
|
2010 |
Mir M, Dondapati SK, Duarte MV, Chatzichristidi M, Misiakos K, Petrou P, Kakabakos SE, Argitis P, Katakis I. Electrochemical biosensor microarray functionalized by means of biomolecule friendly photolithography. Biosensors & Bioelectronics. 25: 2115-21. PMID 20356728 DOI: 10.1016/J.Bios.2010.02.012 |
0.306 |
|
2010 |
Taylor PG, Lee JK, Zakhidov AA, Hwang HS, DeFranco JA, Fong HH, Chatzichristidi M, Murotani E, Malliaras GG, Ober CK. Orthogonal lithography for organic electronics Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848410 |
0.751 |
|
2009 |
Murotani E, Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, Schwartz EL, Malliaras GG, Ober CK. Cross-linkable molecular glasses: low dielectric constant materials patternable in hydrofluoroethers. Acs Applied Materials & Interfaces. 1: 2363-70. PMID 20355874 DOI: 10.1021/Am9004978 |
0.705 |
|
2009 |
Lee JK, Taylor PG, Zakhidov AA, Fong HH, Hwang HS, Chatzichristidi M, Malliaras GG, Ober CK. Orthogonal processing: A novel photolithographic patterning method for organic electronics Journal of Photopolymer Science and Technology. 22: 565-569. DOI: 10.2494/Photopolymer.22.565 |
0.754 |
|
2009 |
Lee JK, Chatzichristidi M, Zakhidov AA, Hwang HS, Schwartz EL, Sha J, Taylor PG, Fong HH, Defranco JA, Murotani E, Wong WWH, Malliaras GG, Ober CK. Acid-diffusion behaviour in organic thin films and its effect on patterning Journal of Materials Chemistry. 19: 2986-2992. DOI: 10.1039/B817286B |
0.736 |
|
2009 |
Christides C, Speliotis T, Chatzichristidi M, Raptis I. Large magnetoresistance in [Co(1nm)/Bi(2.5nm)]10 line structures Microelectronic Engineering. 86: 1050-1053. DOI: 10.1016/J.Mee.2008.11.070 |
0.306 |
|
2009 |
Pavli P, Petrou PS, Niakoula D, Douvas AM, Chatzichristidi M, Kakabakos SE, Dimotikali D, Argitis P. Chemical binding of biomolecules to micropatterned epoxy modified surfaces for biosensing applications Microelectronic Engineering. 86: 1473-1476. DOI: 10.1016/J.Mee.2008.11.009 |
0.386 |
|
2009 |
Taylor PG, Lee JK, Zakhidov AA, Chatzichristidi M, Fong HH, DeFranco JA, Malliaras GG, Ober CK. Orthogonal patterning of PEDOT:PSS for organic electronics using hydrofluoroether solvents Advanced Materials. 21: 2314-2317. DOI: 10.1002/Adma.200803291 |
0.77 |
|
2008 |
Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, DeFranco JA, Hwang HS, Fong HH, Holmes AB, Malliaras GG, Ober CK. Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics. Journal of the American Chemical Society. 130: 11564-5. PMID 18686954 DOI: 10.1021/Ja803493M |
0.719 |
|
2008 |
Sarantopoulou E, Kollia Z, Chatzichristidi M, Douvas A, Argitistis P, Kobe S, Cefalas A. Dynamics and Laser Processing of Functional Fluoride Organic Surfaces at VUV Wavelengths Journal of Laser Micro Nanoengineering. 3: 24-29. DOI: 10.2961/Jlmn.2008.01.0006 |
0.347 |
|
2008 |
Theodoni P, Bayiati P, Chatzichristidi M, Speliotis T, Vamvakas VE, Raptis I, Papanikolaou N. Efficient infrared emission from periodically patterned thin metal films on a Si photonic crystal Microelectronic Engineering. 85: 1112-1115. DOI: 10.1016/J.Mee.2007.12.062 |
0.329 |
|
2008 |
Chatzichristidi M, Valamontes E, Argitis P, Raptis I, Kan JAv, Zhang F, Watt F. High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists Microelectronic Engineering. 85: 945-948. DOI: 10.1016/J.Mee.2007.12.005 |
0.374 |
|
2008 |
Chatzichristidi M, Rajta I, Speliotis T, Valamontes E, Goustouridis D, Argitis P, Raptis I. Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems. 14: 1423-1428. DOI: 10.1007/S00542-008-0571-X |
0.383 |
|
2008 |
Theodoni P, Vamvakas VE, Speliotis T, Chatzichristidi M, Bayiati P, Raptis I, Papanikolaou N. Efficient infrared emission from patterned thin metal films on a Si photonic crystal Physica Status Solidi (a). 205: 2581-2584. DOI: 10.1002/Pssa.200780200 |
0.317 |
|
2008 |
Zakhidov AA, Lee JK, Fong HH, DeFranco JA, Chatzichristidi M, Taylor PG, Ober CK, Malliaras GG. Hydrofluoroethers as orthogonal solvents for the chemical processing of organic electronic materials Advanced Materials. 20: 3481-3484. DOI: 10.1002/Adma.200800557 |
0.723 |
|
2007 |
Petrou PS, Chatzichristidi M, Douvas AM, Argitis P, Misiakos K, Kakabakos SE. A biomolecule friendly photolithographic process for fabrication of protein microarrays on polymeric films coated on silicon chips. Biosensors & Bioelectronics. 22: 1994-2002. PMID 17027250 DOI: 10.1016/J.Bios.2006.08.036 |
0.445 |
|
2007 |
Raptis I, Chatzichristidi M, Sarantopoulou E, Kollia Z, Kobe S, Cefalas AC. Enhancement of Sensing Properties of Thin Poly(Methyl Methacrylate) Films by VUV Modification Journal of Laser Micro Nanoengineering. 2: 200-205. DOI: 10.2961/Jlmn.2007.03.0007 |
0.354 |
|
2007 |
Kitsara M, Goustouridis D, Chatzandroulis S, Chatzichristidi M, Raptis I, Ganetsos T, Igreja R, Dias CJ. Single chip interdigitated electrode capacitive chemical sensor arrays Sensors and Actuators B-Chemical. 127: 186-192. DOI: 10.1016/J.Snb.2007.07.021 |
0.315 |
|
2007 |
Rajta I, Chatzichristidi M, Baradács E, Cserháti C, Raptis I, Manoli K, Valamontes ES. Proton beam micromachined buried microchannels in negative tone resist materials Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms. 260: 414-418. DOI: 10.1016/J.Nimb.2007.02.055 |
0.336 |
|
2007 |
Chatzichristidi M, Speliotis T, Raptis I, Haritantis I, Niarchos D, Christides C. Effect of magnetic field on metal-insulator transitions in Bi-wire structures Microelectronic Engineering. 84: 1528-1531. DOI: 10.1016/J.Mee.2007.01.124 |
0.302 |
|
2007 |
Sarantopoulou E, Kollia Z, Cefalas AC, Douvas AM, Chatzichristidi M, Argitis P, Kobe S. Polymer self-assembled nano-structures and surface relief gratings induced with laser at 157 nm Applied Surface Science. 253: 7884-7889. DOI: 10.1016/J.Apsusc.2007.02.071 |
0.356 |
|
2006 |
Chatzichristidi M, Petrou PS, Douvas AM, Diakoumakos CD, Raptis I, Misiakos K, Kakabakos SS, Argitis P. Photolithographic Process Based on High Contrast Acrylate Photoresist for Multi-Protein Patterning Mrs Proceedings. 950. DOI: 10.1557/Proc-0950-D15-15 |
0.39 |
|
2006 |
Kitsara M, Chatzichristidi M, Niakoula D, Goustouridis D, Beltsios K, Argitis P, Raptis I. Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels Microelectronic Engineering. 83: 1298-1301. DOI: 10.1016/J.Mee.2006.01.157 |
0.317 |
|
2005 |
Rajta I, Baradács E, Chatzichristidi M, Valamontes ES, Uzonyi I, Raptis I. Proton beam micromachining on strippable aqueous base developable negative resist Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms. 231: 423-427. DOI: 10.1016/J.Nimb.2005.01.094 |
0.407 |
|
2002 |
Chatzichristidi M, Raptis I, Argitis P, Everett J. Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining Journal of Vacuum Science & Technology B. 20: 2968-2972. DOI: 10.1116/1.1521741 |
0.395 |
|
2002 |
Pistolis G, Boyatzis S, Chatzichristidi M, Argitis P. Highly Efficient Bicolor (Green−Blue) Fluorescence Imaging in Polymeric Films Chemistry of Materials. 14: 790-796. DOI: 10.1021/Cm0111783 |
0.31 |
|
2002 |
Chatzichristidi M, Raptis I, Diakoumakos CD, Glezos N, Argitis P, Sanopoulou M. Strippable aqueous base developable negative photoresist for high aspect ratio micromachining Microelectronic Engineering. 61: 729-735. DOI: 10.1016/S0167-9317(02)00481-1 |
0.415 |
|
2001 |
Raptis I, Chatzichristidi M, Diakoumakos CD, Douvas A, Niakoula D, Argitis P. Application of a Novel Aqueous Base Developable Resist in Micromachining Journal of Photopolymer Science and Technology. 14: 445-448. DOI: 10.2494/Photopolymer.14.445 |
0.402 |
|
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