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Erik R. Hosler, Ph.D. - Publications

Affiliations: 
2013 Chemistry University of California, Berkeley, Berkeley, CA, United States 
Area:
ultrafast laser investigations of soft x-ray
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16 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2017 Hosler ER, Wood OR, Barletta WA. Free-electron laser emission architecture impact on EUV lithography Proceedings of Spie. 10143. DOI: 10.1117/12.2260452  0.341
2017 Hosler ER, Wood OR, Barletta WA. Free-electron laser emission architecture impact on extreme ultraviolet lithography Journal of Micro-Nanolithography Mems and Moems. 16: 1. DOI: 10.1117/1.Jmm.16.4.041009  0.33
2016 Mohanty N, Farrell R, Periera C, Subhadeep K, Franke E, Smith J, Ko A, Devilliers A, Biolsi P, Sun L, Beique G, Hosler E, Verdujn E, Wang W, Labelle C, et al. LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782. DOI: 10.1117/12.2219259  0.321
2016 Hosler ER, Thiruvengadam S, Cantone JR, Civay DE, Schroeder UP. EUV and optical lithographic pattern shift at the 5nm node Proceedings of Spie. 9776: 977616. DOI: 10.1117/12.2217532  0.323
2016 Dixit D, Green A, Hosler ER, Kamineni V, Preil ME, Keller N, Race J, Chun JS, O'Sullivan M, Khare P, Montgomery W, Diebold AC. Optical critical dimension metrology for directed self-assembly assisted contact hole shrink Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.1.014004  0.372
2015 Dixit D, O'Mullane S, Sunkoju S, Hosler ER, Kamineni V, Preil M, Keller N, Race J, Muthinti GR, Diebold AC. Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry Proceedings of Spie - the International Society For Optical Engineering. 9424. DOI: 10.1117/12.2185543  0.35
2015 Hosler ER, Wood OR, Barletta WA, Mangat PJS, Preil ME. Considerations for a free-electron laser-based extreme-ultraviolet lithography program Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2085538  0.328
2015 Dixit D, Hosler ER, Preil M, Keller N, Race J, Chun JS, O'sullivan M, Montgomery MW, Diebold A. Optical CD metrology for directed self-assembly assisted contact hole shrink process Proceedings of Spie - the International Society For Optical Engineering. 9424. DOI: 10.1117/12.2085054  0.308
2015 Dixit D, O'Mullane S, Sunkoju S, Gottipati A, Hosler ER, Kamineni V, Preil M, Keller N, Race J, Muthinti GR, Diebold AC. Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.3.031208  0.372
2015 Dixit DJ, Kamineni V, Farrell R, Hosler ER, Preil M, Race J, Peterson B, Diebold AC. Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.2.021102  0.325
2014 Sayres SG, Hosler ER, Leone SR. Exposing the role of electron correlation in strong-field double ionization: X-ray transient absorption of orbital alignment in Xe+ and Xe2+. The Journal of Physical Chemistry. A. 118: 8614-24. PMID 24911960 DOI: 10.1021/Jp503468U  0.502
2014 Farrell RA, Hosler ER, Schmid GM, Xu J, Preil ME, Rastogi V, Mohanty N, Kumar K, Cicoria MJ, Hetzer DR, Devilliers AJ. Manufacturability considerations for DSA Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2048396  0.301
2014 Dixit D, Kamineni V, Farrell R, Hosler E, Preil M, Race J, Peterson B, Diebold AC. Metrology for directed self-assembly block lithography using optical scatterometry Proceedings of Spie. 9050. DOI: 10.1117/12.2047111  0.333
2013 Hosler ER, Leone SR. Characterization of vibrational wave packets by core-level high-harmonic transient absorption spectroscopy Physical Review a - Atomic, Molecular, and Optical Physics. 88. DOI: 10.1103/Physreva.88.023420  0.407
2013 Osipov T, Fang L, Murphy B, Tarantelli F, Hosler ER, Kukk E, Bozek JD, Bostedt C, Kanter EP, Berrah N. Sequential multiple ionization and fragmentation of SF6 induced by an intense free electron laser pulse Journal of Physics B: Atomic, Molecular and Optical Physics. 46. DOI: 10.1088/0953-4075/46/16/164032  0.35
2010 Hoener M, Fang L, Kornilov O, Gessner O, Pratt ST, Gühr M, Kanter EP, Blaga C, Bostedt C, Bozek JD, Bucksbaum PH, Buth C, Chen M, Coffee R, Cryan J, ... ... Hosler E, et al. Ultraintense x-ray induced ionization, dissociation, and frustrated absorption in molecular nitrogen. Physical Review Letters. 104: 253002. PMID 20867372 DOI: 10.1103/Physrevlett.104.253002  0.416
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