Lucas B. Henderson, Ph.D. - Publications
Affiliations: | 2009 | Chemical Engineering | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
Materials Science Engineering, Electronics and Electrical EngineeringYear | Citation | Score | |||
---|---|---|---|---|---|
2010 | Henderson LB, Ekerdt JG. Effect of phosphorus and carbon incorporation in amorphous cobalt films prepared by chemical vapor deposition Journal of the Electrochemical Society. 157. DOI: 10.1149/1.3251283 | 0.652 | |||
2010 | Henderson LB, Rivers JH, Bost DE, Jones RA, Ekerdt JG. Nanocrystalline cobalt-based films with high thermal stability from a single molecule Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 54-60. DOI: 10.1116/1.3264480 | 0.643 | |||
2010 | Henderson LB, Ekerdt JG. Chemically capping copper with cobalt Microelectronic Engineering. 87: 588-592. DOI: 10.1016/J.Mee.2009.08.017 | 0.586 | |||
2009 | Henderson LB, Ekerdt JG. Chemical vapor deposition of amorphous cobalt-phosphorus alloy films Electrochemical and Solid-State Letters. 12. DOI: 10.1149/1.3082020 | 0.634 | |||
2009 | Henderson LB, Ekerdt JG. Time-to-failure analysis of 5 nm amorphous Ru(P) as a copper diffusion barrier Thin Solid Films. 517: 1645-1649. DOI: 10.1016/J.Tsf.2008.10.009 | 0.571 | |||
2008 | Ekerdt JG, Shin J, Kim H, Henderson LB, Hwang GS, Agapiou K, Jones RA. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications Advanced Metallization Conference (Amc). 179-185. | 0.641 | |||
Show low-probability matches. |