John G. Ekerdt - Publications

Affiliations: 
Chemical Engineering University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
Chemical Engineering

264 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Lin EL, Edmondson BI, Hu S, Ekerdt JG. Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition. Journal of Visualized Experiments : Jove. PMID 27501462 DOI: 10.3791/54268  1
2016 Hu C, McDaniel MD, Jiang A, Posadas A, Demkov A, Ekerdt JG, Yu ET. A low-leakage epitaxial high-κ gate oxide for germanium metal-oxide-semiconductor devices. Acs Applied Materials & Interfaces. PMID 26859048 DOI: 10.1021/Acsami.5B10661  1
2016 Hu S, McDaniel MD, Posadas A, Hu C, Wu HW, Yu ET, Smith DJ, Demkov AA, Ekerdt JG. Monolithic integration of perovskites on Ge(001) by atomic layer deposition: a case study with SrHfxTi1−xO3 Mrs Communications. 1-8. DOI: 10.1557/Mrc.2016.36  1
2016 Smith DJ, Wu HW, Lu S, Aoki T, Ponath P, Fredrickson K, McDaniel MD, Lin E, Posadas AB, Demkov AA, Ekerdt J, McCartney MR. Recent studies of oxide-semiconductor heterostructures using aberration-corrected scanning transmission electron microscopy Journal of Materials Research. 1-9. DOI: 10.1557/Jmr.2016.273  1
2016 Liao W, Ekerdt JG. Precursor dependent nucleation and growth of ruthenium films during chemical vapor deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4953882  1
2016 Liao W, Bost D, Chiu CY, Hwang GS, Ekerdt JG. Materials science of Ru and Ru alloy thin films for barrier applications 2016 Ieee International Interconnect Technology Conference / Advanced Metallization Conference, Iitc/Amc 2016. 102-104. DOI: 10.1109/IITC-AMC.2016.7507697  1
2016 Lu S, Kormondy KJ, Ngo TQ, Aoki T, Posadas A, Ekerdt JG, Demkov AA, McCartney MR, Smith DJ. Spectrum and phase mapping across the epitaxial γ-Al2O3/SrTiO3 interface Applied Physics Letters. 108. DOI: 10.1063/1.4941290  1
2016 Mccrate JM, Ekerdt JG. Chemical nature of active sites for defect-mediated nucleation on silicon dioxide Aiche Journal. 62: 367-372. DOI: 10.1002/Aic.15023  1
2015 Ji L, McDaniel MD, Wang S, Posadas AB, Li X, Huang H, Lee JC, Demkov AA, Bard AJ, Ekerdt JG, Yu ET. A silicon-based photocathode for water reduction with an epitaxial SrTiO3 protection layer and a nanostructured catalyst. Nature Nanotechnology. 10: 84-90. PMID 25437745 DOI: 10.1038/Nnano.2014.277  1
2015 Ngo TQ, McDaniel MD, Posadas A, Demkov AA, Ekerdt JG. Oxygen vacancies at the γ-Al<inf>2</inf>O<inf>3</inf>/STO heterointerface grown by atomic layer deposition Materials Research Society Symposium Proceedings. 1730: 14-19. DOI: 10.1557/Opl.2015.294  1
2015 Ji L, McDaniel MD, Tao L, Li X, Posadas AB, Chang YF, Demkov AA, Ekerdt JG, Akinwande D, Ruoff RS, Lee JC, Yu ET. Atomic scale engineering of metal-oxide-semiconductor photoelectrodes for energy harvesting application integrated with Graphene and Epitaxy SrTiO3 Technical Digest - International Electron Devices Meeting, Iedm. 2015: 8.6.1-8.6.3. DOI: 10.1109/IEDM.2014.7047013  1
2015 McDaniel MD, Ngo TQ, Hu S, Posadas A, Demkov AA, Ekerdt JG. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors Applied Physics Reviews. 2. DOI: 10.1063/1.4934574  1
2015 Ngo TQ, Goble NJ, Posadas A, Kormondy KJ, Lu S, McDaniel MD, Jordan-Sweet J, Smith DJ, Gao XPA, Demkov AA, Ekerdt JG. Quasi-two-dimensional electron gas at the interface of γ-Al<inf>2</inf>O<inf>3</inf>/SrTiO<inf>3</inf> heterostructures grown by atomic layer deposition Journal of Applied Physics. 118. DOI: 10.1063/1.4930575  1
2015 Kormondy KJ, Posadas AB, Ngo TQ, Lu S, Goble N, Jordan-Sweet J, Gao XPA, Smith DJ, McCartney MR, Ekerdt JG, Demkov AA. Quasi-two-dimensional electron gas at the epitaxial alumina/SrTiO3 interface: Control of oxygen vacancies Journal of Applied Physics. 117. DOI: 10.1063/1.4913860  1
2015 McDaniel MD, Hu C, Lu S, Ngo TQ, Posadas A, Jiang A, Smith DJ, Yu ET, Demkov AA, Ekerdt JG. Atomic layer deposition of crystalline SrHfO3 directly on Ge (001) for high-k dielectric applications Journal of Applied Physics. 117. DOI: 10.1063/1.4906953  1
2015 Demkov AA, Ponath P, Fredrickson K, Posadas AB, McDaniel MD, Ngo TQ, Ekerdt JG. Integrated films of transition metal oxides for information technology Microelectronic Engineering. 147: 285-289. DOI: 10.1016/J.Mee.2015.04.090  1
2014 Elko-Hansen TD, Dolocan A, Ekerdt JG. Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis(N-tert-butyl-N'-ethylpropionamidinato) Cobalt(II). The Journal of Physical Chemistry Letters. 5: 1091-5. PMID 26274454 DOI: 10.1021/Jz500281K  1
2014 Hu C, McDaniel MD, Posadas A, Demkov AA, Ekerdt JG, Yu ET. Highly controllable and stable quantized conductance and resistive switching mechanism in single-crystal TiO2 resistive memory on silicon. Nano Letters. 14: 4360-7. PMID 25072099 DOI: 10.1021/Nl501249Q  1
2014 Yu ET, Hu C, McDaniel MD, Posadas A, Demkov AA, Ekerdt JG. Resistive switching characteristics and controllable quantized conductance in single-crystal anatase TiO2 on Si (001) Ecs Transactions. 64: 147-152. DOI: 10.1149/06408.0147ecst  1
2014 Ngo TQ, McDaniel MD, Posadas A, Demkov AA, Ekerdt JG. Growth of crystalline LaAlO3 by atomic layer deposition Proceedings of Spie - the International Society For Optical Engineering. 8987. DOI: 10.1117/12.2045532  1
2014 Zhai Y, Mathew L, Rao R, Palard M, Chopra S, Ekerdt JG, Register LF, Banerjee SK. High-performance vertical gate-all-around silicon nanowire FET with high-κ/metal gate Ieee Transactions On Electron Devices. 61: 3896-3900. DOI: 10.1109/Ted.2014.2353658  1
2014 McDaniel MD, Posadas A, Ngo TQ, Karako CM, Bruley J, Frank MM, Narayanan V, Demkov AA, Ekerdt JG. Incorporation of la in epitaxial SrTiO3 thin films grown by atomic layer deposition on SrTiO3-buffered Si (001) substrates Journal of Applied Physics. 115. DOI: 10.1063/1.4883767  1
2014 Ngo TQ, Posadas AB, McDaniel MD, Hu C, Bruley J, Yu ET, Demkov AA, Ekerdt JG. Epitaxial c -axis oriented BaTiO3 thin films on SrTiO 3-buffered Si(001) by atomic layer deposition Applied Physics Letters. 104. DOI: 10.1063/1.4867469  1
2014 Rettie AJE, Mozaffari S, McDaniel MD, Pearson KN, Ekerdt JG, Markert JT, Mullins CB. Pulsed laser deposition of epitaxial and polycrystalline bismuth vanadate thin films Journal of Physical Chemistry C. 118: 26543-26550. DOI: 10.1021/Jp5082824  1
2014 McCrate JM, Ekerdt JG. Coverage-dependent luminescence from two-dimensional systems of covalently attached perylene fluorophores on silica Journal of Physical Chemistry C. 118: 2104-2114. DOI: 10.1021/Jp411051Z  1
2014 Elko-Hansen TDM, Ekerdt JG. XPS investigation of the atomic layer deposition half reactions of bis(N-tert-butyl-N′-ethylpropionamidinato) cobalt(II) Chemistry of Materials. 26: 2642-2646. DOI: 10.1021/Cm5002237  1
2014 McCrate JM, Ekerdt JG. Detection of low-density surface sites on silica: Experimental evidence of intrinsic oxygen-vacancy defects Chemistry of Materials. 26: 2166-2171. DOI: 10.1021/Cm500095P  1
2014 Bost DE, Ekerdt JG. Chemical vapor deposition of ruthenium-phosphorus alloy thin films: Using phosphine as the phosphorus source Thin Solid Films. 558: 160-164. DOI: 10.1016/J.Tsf.2014.03.018  1
2014 McDaniel MD, Ngo TQ, Posadas A, Hu C, Lu S, Smith DJ, Yu ET, Demkov AA, Ekerdt JG. A Chemical Route to Monolithic Integration of Crystalline Oxides on Semiconductors Advanced Materials Interfaces. 1. DOI: 10.1002/Admi.201400081  1
2013 McCrate JM, Ekerdt JG. Titration of free hydroxyl and strained siloxane sites on silicon dioxide with fluorescent probes. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 11868-75. PMID 23978272 DOI: 10.1021/La402825T  0.84
2013 Hoang S, Ngo TQ, Berglund SP, Fullon RR, Ekerdt JG, Mullins CB. Improvement of solar energy conversion with Nb-incorporated TiO2 hierarchical microspheres. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. 14: 2270-6. PMID 23512241 DOI: 10.1002/Cphc.201201092  1
2013 Cox BJ, Ekerdt JG. Pretreatment of yellow pine in an acidic ionic liquid: extraction of hemicellulose and lignin to facilitate enzymatic digestion. Bioresource Technology. 134: 59-65. PMID 23500560 DOI: 10.1016/J.Biortech.2013.01.081  1
2013 McDaniel MD, Posadas A, Ngo TQ, Dhamdhere A, Smith DJ, Demkov AA, Ekerdt JG. Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO3-buffered Si(001) substrates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4770291  1
2013 Hu C, McDaniel MD, Ekerdt JG, Yu ET. High ON/OFF ratio and quantized conductance in resistive switching of TiO2 on silicon Ieee Electron Device Letters. 34: 1385-1387. DOI: 10.1109/Led.2013.2282154  1
2013 Ngo TQ, Posadas A, Seo H, Hoang S, McDaniel MD, Utess D, Triyoso DH, Buddie Mullins C, Demkov AA, Ekerdt JG. Atomic layer deposition of photoactive CoO/SrTiO3 and CoO/TiO2 on Si(001) for visible light driven photoelectrochemical water oxidation Journal of Applied Physics. 114. DOI: 10.1063/1.4819106  1
2013 Liao W, Ekerdt JG. Effect of CO on Ru nucleation and ultra-smooth thin film growth by chemical vapor deposition at low temperature Chemistry of Materials. 25: 1793-1799. DOI: 10.1021/Cm400321J  1
2013 Ngo TQ, Posadas A, McDaniel MD, Ferrer DA, Bruley J, Breslin C, Demkov AA, Ekerdt JG. Epitaxial growth of LaAlO3 on SrTiO3-buffered Si (001) substrates by atomic layer deposition Journal of Crystal Growth. 363: 150-157. DOI: 10.1016/J.Jcrysgro.2012.10.032  1
2013 Elko-Hansen T, Ekerdt JG. Surface chemistry enhanced selective ALD of Co capping layers on Cu Advanced Metallization Conference (Amc). 28-35.  1
2012 Cox BJ, Ekerdt JG. Depolymerization of oak wood lignin under mild conditions using the acidic ionic liquid 1-H-3-methylimidazolium chloride as both solvent and catalyst. Bioresource Technology. 118: 584-8. PMID 22698446 DOI: 10.1016/J.Biortech.2012.05.012  1
2012 McDaniel MD, Posadas A, Ngo TQ, Dhamdhere A, Smith DJ, Demkov AA, Ekerdt JG. Growth of epitaxial oxides on silicon using atomic layer deposition: Crystallization and annealing of TiO2 on SrTiO3-buffered Si(001) Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4734311  1
2012 McDaniel MD, Posadas A, Wang T, Demkov AA, Ekerdt JG. Growth and characterization of epitaxial anatase TiO 2(001) on SrTiO 3-buffered Si(001) using atomic layer deposition Thin Solid Films. 520: 6525-6530. DOI: 10.1016/J.Tsf.2012.06.061  1
2012 Bost DE, Ekerdt JG. Barrier performance for low carbon ruthenium-phosphorus alloy films grown by chemical vapor deposition Advanced Metallization Conference (Amc). 52.  1
2011 Wang T, Ekerdt JG. Atomic layer deposition of tantalum-incorporated hafnium dioxide: Strategies to enhance thermal stability Journal of the Electrochemical Society. 158: G185-G193. DOI: 10.1149/1.3598172  1
2011 Wang T, Wei J, Downer MC, Ekerdt JG. Optical properties of La-incorporated HfO2 upon crystallization Applied Physics Letters. 98. DOI: 10.1063/1.3567522  1
2011 Elko-Hansen TDM, McCrate JM, Ekerdt JG. Enhanced nucleation of Pt particles on boron-treated highly oriented pyrolytic graphite via chemical vapor deposition Journal of Physical Chemistry C. 115: 9048-9052. DOI: 10.1021/Jp1108366  1
2011 Kim H, Chou CY, Ekerdt JG, Hwang GS. Structure and properties of Li-Si alloys: A first-principles study Journal of Physical Chemistry C. 115: 2514-2521. DOI: 10.1021/Jp1083899  1
2011 Jia S, Cox BJ, Guo X, Zhang ZC, Ekerdt JG. Hydrolytic cleavage of β-O-4 ether bonds of lignin model compounds in an ionic liquid with metal chlorides Industrial and Engineering Chemistry Research. 50: 849-855. DOI: 10.1021/Ie101884H  1
2011 Wang T, Ekerdt JG. Structure versus thermal stability: The periodic structure of atomic layer deposition-grown al-incorporated HfO2 films and its effects on amorphous stabilization Chemistry of Materials. 23: 1679-1685. DOI: 10.1021/Cm102057D  1
2011 Salivati N, Shuall N, McCrate JM, Ekerdt JG. Effect of subsurface boron on photoluminescence from silicon nanocrystals Surface Science. 605: 799-801. DOI: 10.1016/J.Susc.2011.01.022  1
2011 Cox BJ, Jia S, Zhang ZC, Ekerdt JG. Catalytic degradation of lignin model compounds in acidic imidazolium based ionic liquids: Hammett acidity and anion effects Polymer Degradation and Stability. 96: 426-431. DOI: 10.1016/J.Polymdegradstab.2011.01.011  1
2011 Wu F, Valle N, Fitzpatrick R, Ekerdt JG, Houssiau L, Migeon HN. Elaboration and quantitative investigation of BCN-type films by dynamic SIMS using the MCsx+ mode Surface and Interface Analysis. 43: 669-672. DOI: 10.1002/Sia.3532  1
2011 Bost DE, Ekerdt JG. Chemical vapor deposition of low carbon ruthenium-phosphorus alloy films for Cu interconnect applications Advanced Metallization Conference (Amc). 100-101.  1
2010 Jia S, Cox BJ, Guo X, Zhang ZC, Ekerdt JG. Cleaving the β--O--4 bonds of lignin model compounds in an acidic ionic liquid, 1-H-3-methylimidazolium chloride: an optional strategy for the degradation of lignin. Chemsuschem. 3: 1078-84. PMID 20677206 DOI: 10.1002/Cssc.201000112  1
2010 Jia S, Cox BJ, Guo X, Zhang ZC, Ekerdt JG. Decomposition of a phenolic lignin model compound over organic N-bases in an ionic liquid Holzforschung. 64: 577-580. DOI: 10.1515/Hf.2010.075  1
2010 Henderson LB, Ekerdt JG. Effect of phosphorus and carbon incorporation in amorphous cobalt films prepared by chemical vapor deposition Journal of the Electrochemical Society. 157. DOI: 10.1149/1.3251283  1
2010 Henderson LB, Rivers JH, Bost DE, Jones RA, Ekerdt JG. Nanocrystalline cobalt-based films with high thermal stability from a single molecule Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 54-60. DOI: 10.1116/1.3264480  1
2010 Zhou W, Ushakov SV, Wang T, Ekerdt JG, Demkov AA, Navrotsky A. Hafnia: Energetics of thin films and nanoparticles Journal of Applied Physics. 107. DOI: 10.1063/1.3435317  1
2010 Salivati N, Shuall N, McCrate JM, Ekerdt JG. Effect of surface chemistry on quantum confinement and photoluminescence of ammonia-passivated silicon nanocrystals Journal of Physical Chemistry Letters. 1: 1957-1961. DOI: 10.1021/Jz100581C  1
2010 Salivati N, Shuall N, McCrate JM, Ekerdt JG. Chemistry of silicon nanocrystal surfaces exposed to ammonia Journal of Physical Chemistry C. 114: 16924-16928. DOI: 10.1021/Jp912052U  1
2010 Kim H, Kweon KE, Chou CY, Ekerdt JG, Hwang GS. On the nature and behavior of Li atoms in Si: A first principles study Journal of Physical Chemistry C. 114: 17942-17946. DOI: 10.1021/Jp104289X  1
2010 Wang T, Ekerdt JG. Subnanoscale lanthanum distribution in lanthanum-incorporated hafnium oxide thin films grown using atomic layer deposition Chemistry of Materials. 22: 3798-3806. DOI: 10.1021/Cm903386C  1
2010 Henderson LB, Ekerdt JG. Chemically capping copper with cobalt Microelectronic Engineering. 87: 588-592. DOI: 10.1016/J.Mee.2009.08.017  1
2010 Bost DE, Ekerdt JG. Chemical vapor deposition of ruthenium-phosphorus alloy films for Cu interconnect applications: Impact of the phosphorus source Advanced Metallization Conference (Amc). 47-48.  1
2010 Jia S, Cox BJ, Guo X, Zhang ZC, Ekerdt JG. Catalysis of lignin depolymerization in ionic liquids Acs National Meeting Book of Abstracts 1
2009 Henderson LB, Ekerdt JG. Chemical vapor deposition of amorphous cobalt-phosphorus alloy films Electrochemical and Solid-State Letters. 12. DOI: 10.1149/1.3082020  1
2009 Fitzpatrick PR, Ekerdt JG. Electrical characteristics of thin boron carbonitride films on Ge(100) and Si(100) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2366-2374. DOI: 10.1116/1.3253534  1
2009 Salivati N, Shuall N, Baskin E, Garber V, McCrate JM, Ekerdt JG. Influence of surface chemistry on photoluminescence from deuterium-passivated silicon nanocrystals Journal of Applied Physics. 106. DOI: 10.1063/1.3224952  1
2009 Wang T, Ekerdt JG. Atomic layer deposition of lanthanum stabilized amorphous hafnium oxide thin films Chemistry of Materials. 21: 3096-3101. DOI: 10.1021/Cm9001064  1
2009 Thom KM, Ekerdt JG. The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition Thin Solid Films. 518: 36-42. DOI: 10.1016/J.Tsf.2009.06.006  1
2009 Fitzpatrick PR, Wang T, Heitsch AT, Korgel BA, Ekerdt JG. Oxidation resistance of thin boron carbo-nitride films on Ge(100) and Ge nanowires Thin Solid Films. 517: 3686-3694. DOI: 10.1016/J.Tsf.2009.01.158  1
2009 Salivati N, An YQ, Downer MC, Ekerdt JG. Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica Thin Solid Films. 517: 3481-3483. DOI: 10.1016/J.Tsf.2009.01.060  1
2009 Henderson LB, Ekerdt JG. Time-to-failure analysis of 5 nm amorphous Ru(P) as a copper diffusion barrier Thin Solid Films. 517: 1645-1649. DOI: 10.1016/J.Tsf.2008.10.009  1
2009 Salivati N, Ekerdt JG. Temperature programmed desorption studies of deuterium passivated silicon nanocrystals Surface Science. 603: 1121-1125. DOI: 10.1016/J.Susc.2009.02.033  1
2009 Thom KM, Ekerdt JG. Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta Surface Science. 603: 921-932. DOI: 10.1016/J.Susc.2009.02.003  1
2009 Heitsch AT, Ekerdt JG, Korgel BA. Nanolab at the university of texas at austin: A model for interdisciplinary undergraduate science and engineering education Chemical Engineering Education. 43: 225-231.  1
2008 Lin MW, Hellebusch DJ, Wu K, Kim EK, Lu K, Tao L, Liechti KM, Ekerdt JG, Ho PS, Hu W, Willson CG. Interfacial adhesion studies for step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772797  1
2008 Lin MW, Hellebusch DJ, Wu K, Kim EK, Lu KH, Liechti KM, Ekerdt JG, Ho PS, Willson CG. Role of surfactants in adhesion reduction for step and flash imprint lithography Journal of Micro/Nanolithography, Mems, and Moems. 7. DOI: 10.1117/1.2968269  1
2008 Fitzpatrick PR, Ekerdt JG. Film continuity and interface bonding of thin boron carbonitride films on Ge(100) and Si(100) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1397-1406. DOI: 10.1116/1.2976564  1
2008 Shin J, Kim HW, Agapiou K, Jones RA, Hwang GS, Ekerdt JG. Effects of P on amorphous chemical vapor deposition Ru-P alloy films for Cu interconnect liner applications Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 974-979. DOI: 10.1116/1.2832360  1
2008 Liu H, Winkenwerder W, Liu Y, Ferrer D, Shahrjerdi D, Stanley SK, Ekerdt JG, Banerjee SK. Core-shell germanium-silicon nanocrystal floating gate for nonvolatile memory applications Ieee Transactions On Electron Devices. 55: 3610-3614. DOI: 10.1109/Ted.2008.2006889  1
2008 Brennecka GL, Parish CM, Scrymgeour DA, Tuttle BA, Brewer LN, Ekerdt JG. Micro- and nano-patterning of solution-derived functional electronic ceramics Microscopy and Microanalysis. 14: 1432-1433. DOI: 10.1017/S1431927608082299  1
2008 Ekerdt JG, Shin J, Kim H, Henderson LB, Hwang GS, Agapiou K, Jones RA. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications Advanced Metallization Conference (Amc). 179-185. DOI: 10.1016/J.Tsf.2007.01.002  1
2008 Winkenwerder WA, Ekerdt JG. Germanium interactions with Si-etched silicon dioxide Surface Science. 602: 3071-3076. DOI: 10.1016/J.Susc.2008.08.007  1
2008 Winkenwerder WA, Ekerdt JG. Interaction of germanium with silicon dioxide Surface Science. 602: 2796-2800. DOI: 10.1016/J.Susc.2008.07.010  1
2008 Bae J, Kulkarni NN, Zhou JP, Ekerdt JG, Shih CK. VLS growth of Si nanocones using Ga and Al catalysts Journal of Crystal Growth. 310: 4407-4411. DOI: 10.1016/J.Jcrysgro.2008.06.084  1
2008 Winkenwerder WA, Ekerdt JG. The role of oxidized germanium in the growth of germanium nanoparticles on hafnia Journal of Crystal Growth. 310: 3758-3762. DOI: 10.1016/J.Jcrysgro.2008.05.051  1
2008 Korgel BA, Ekerdt JG, Heitsch A. The nanolab: An interdisciplinary undergraduate science and engineering laboratory at the university of Texas at Austin Aiche Annual Meeting, Conference Proceedings 1
2008 Ekerdt JG, Shin J, Kim H, Henderson LB, Hwang GS, Agapiou K, Jones RA. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications Advanced Metallization Conference (Amc). 179-185.  1
2007 Wu K, Wang X, Kim EK, Willson CG, Ekerdt JG. Experimental and theoretical investigation on surfactant segregation in imprint lithography. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 1166-70. PMID 17241028 DOI: 10.1021/la061736y  1
2007 Ekerdt J, Shin J, Winkenwerder W, Kim HW, Thom K, Hwang GS, Agapiou K, Jones RA. Chemical routes to ultra thin films for copper barriers and liners Materials Research Society Symposium Proceedings. 990: 93-94. DOI: 10.1557/Proc-0990-B09-01  1
2007 Liu H, Winkenwerder W, Liu Y, Stanley SK, Ekerdt JG, Banerjee SK. Core-shell germanium-silicon nanoparticle structure for high κ nonvolatile memory applications 2007 International Semiconductor Device Research Symposium, Isdrs. DOI: 10.1109/ISDRS.2007.4422403  1
2007 Coffee SS, Ekerdt JG. Investigation of Volmer-Weber growth mode kinetics for germanium nanoparticles on hafnia Journal of Applied Physics. 102. DOI: 10.1063/1.2821746  1
2007 Waheed A, Jones RA, Agapiou K, Yang X, Moore JA, Ekerdt JG. Synthesis and structures of dinuclear 3,5-bis(trifluoromethyl)pyrazolate complexes of ruthenium Organometallics. 26: 6778-6783. DOI: 10.1021/Om700521Y  1
2007 Shin J, Kim HW, Hwang GS, Ekerdt JG. Chemical routes to ultra thin films for copper barriers and liners Surface and Coatings Technology. 201: 9256-9259. DOI: 10.1016/J.Surfcoat.2007.03.019  1
2007 Coffee SS, Shahrjerdi D, Banerjee SK, Ekerdt JG. Selective silicon nanoparticle growth on high-density arrays of silicon nitride Journal of Crystal Growth. 308: 269-277. DOI: 10.1016/J.Jcrysgro.2007.08.024  1
2006 Shin J, Waheed A, Agapiou K, Winkenwerder WA, Kim HW, Jones RA, Hwang GS, Ekerdt JG. Growth of ultrathin films of amorphous ruthenium-phosphorus alloys using a single source CVD precursor. Journal of the American Chemical Society. 128: 16510-1. PMID 17177394 DOI: 10.1021/Ja0673938  1
2006 Stanley SK, Ekerdt JG. Combinatorial studies for high density Si and Ge nanoparticle arrays Materials Research Society Symposium Proceedings. 933: 37-42. DOI: 10.1557/Proc-0933-G05-11  1
2006 Stanley SK, Ekerdt JG. Core-shell Ge nanoparticles on oxide surfaces for enhanced interface stability Materials Research Society Symposium Proceedings. 933: 7-12. DOI: 10.1557/Proc-0933-G02-07  1
2006 Coffee SS, Stanley SK, Ekerdt JG. Directed nucleation of ordered nanoparticle arrays on amorphous surfaces Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1913-1917. DOI: 10.1116/1.2221318  1
2006 Stanley SK, Joshi SV, Banerjee SK, Ekerdt JG. Ge interactions on HfO 2 surfaces and kinetically driven patterning of Ge nanocrystals on HfO 2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 24: 78-83. DOI: 10.1116/1.2137328  1
2006 Kirsch PD, Quevedo-Lopez MA, Li HJ, Senzaki Y, Peterson JJ, Song SC, Krishnan SA, Moumen N, Barnett J, Bersuker G, Hung PY, Lee BH, Lafford T, Wang Q, Gay D, ... Ekerdt JG, et al. Nucleation and growth study of atomic layer deposited HfO 2 gate dielectrics resulting in improved scaling and electron mobility Journal of Applied Physics. 99. DOI: 10.1063/1.2161819  1
2006 Stanley SK, Joshi SV, Banerjee SK, Ekerdt JG. Surface reactions and kinetically-driven patterning scheme for selective deposition of Si and Ge nanoparticle arrays on HfO2 Surface Science. 600. DOI: 10.1016/J.Susc.2005.12.029  1
2005 Wu K, Bailey TC, Willson CG, Ekerdt JG. Surface hydration and its effect on fluorinated SAM formation on SiO2 surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 21: 11795-801. PMID 16316116 DOI: 10.1021/La0516330  1
2005 Stanley SK, Coffee SS, Ekerdt JG. Influence of thermal treatments on the chemistry and self-assembly of Ge nanoparticles on SiO2 surfaces Materials Research Society Symposium Proceedings. 830: 51-56. DOI: 10.1557/Proc-830-D1.8  1
2005 Stanley SK, Coffee SS, Ekerdt JG. Directed self assembly of nanocrystals within macroscopic to nanoscopic features Materials Research Society Symposium Proceedings. 901: 281-286. DOI: 10.1557/Proc-0901-Ra19-03  1
2005 Engbrecht ER, Fitzpatrick PR, Junker KH, Sun YM, White JM, Ekerdt JG. Adhesion of chemical vapor deposited boron carbo-nitride to dielectric and copper films Journal of Materials Research. 20: 2218-2224. DOI: 10.1557/Jmr.2005.0279  1
2005 Kim EK, Stewart MD, Wu K, Palmieri FL, Dickey MD, Ekerdt JG, Willson CG. Vinyl ether formulations for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2967-2971. DOI: 10.1116/1.2131881  1
2005 Kim EK, Ekerdt JG, Willson CG. Importance of evaporation in the design of materials for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1515-1520. DOI: 10.1116/1.1990162  1
2005 Engbrecht ER, Sun YM, Junker KH, White JM, Ekerdt JG. Copper diffusion barrier properties of CVD boron carbo-nitride Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 463-467. DOI: 10.1116/1.1865072  1
2005 Kulkarni NN, Bae J, Shih CK, Stanley SK, Coffee SS, Ekerdt JG. Low-threshold field emission from cesiated silicon nanowires Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2136217  1
2005 Shin J, Gay D, Sun YM, White JM, Ekerdt JG. Growth and characterization of ultrathin metal films for ULSI interconnects Aip Conference Proceedings. 788: 482-487. DOI: 10.1063/1.2063006  1
2005 Lemonds AM, Bolom T, Ahearn WJ, Gay DC, White JM, Ekerdt JG. Atomic layer deposition of TaSix thin films on SiO2 using TaF5 and Si2H6 Thin Solid Films. 488: 9-14. DOI: 10.1016/J.Tsf.2005.03.043  1
2005 Stanley SK, Coffee SS, Ekerdt JG. Interactions of germanium atoms with silica surfaces Applied Surface Science. 252: 878-882. DOI: 10.1016/J.Apsusc.2005.01.149  1
2005 Stanley SK, Ekerdt JG. Interactions of Ge atoms with high-κ oxide dielectric surfaces Materials Research Society Symposium Proceedings. 879: 37-42.  1
2005 Stanley SK, Joshi SV, Banerjee SK, Ekerdt JG. Directed self assembly of Si and Ge nanocrystals on Hfo2 through kinetically driven patterning Aiche Annual Meeting, Conference Proceedings. 5265.  1
2005 Fitzpatrick PR, Satyanarayana S, Sun Y, White JM, Ekerdt JG. CVD boron carbo-nitride as pore sealant for ultra low-K interlayer dielectrics Materials Research Society Symposium Proceedings. 863: 85-90.  1
2004 Engbrecht ER, Sun YM, Junker KH, White JM, Ekerdt JG. Chemical vapor deposition boron carbo-nitride deposited using dimethylamine borane with ammonia and ethylene Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 2152-2158. DOI: 10.1116/1.1778405  1
2004 Wang Q, Ekerdt JG, Gay D, Sun YM, White JM. Low-temperature chemical vapor deposition and scaling limit of ultrathin Ru films Applied Physics Letters. 84: 1380-1382. DOI: 10.1063/1.1650044  1
2004 Sun YM, Engbrecht ER, Bolom T, Cilino C, Sim JH, White JM, Ekerdt JG, Pfeifer K. Ultra thin tungsten nitride film growth on dielectric surfaces Thin Solid Films. 458: 251-256. DOI: 10.1016/J.Tsf.2003.11.303  1
2004 Zhu J, Ekerdt JG. Formation of {1 1 3} facetted Si hut clusters on thin Si 1-xC x films on Si(0 0 1) Journal of Crystal Growth. 261: 479-484. DOI: 10.1016/J.Jcrysgro.2003.09.043  1
2003 Resnick DJ, Dauksher WJ, Mancini D, Nordquist KJ, Bailey TC, Johnson S, Stacey N, Ekerdt JG, Willson CG, Sreenivasan SV, Schumaker N. Imprint lithography: Lab curiosity or the real NGL? Proceedings of Spie - the International Society For Optical Engineering. 5037: 12-23. DOI: 10.1117/12.490126  1
2003 Johnson SC, Bailey TC, Dickey MD, Smith BJ, Kim EK, Jamieson AT, Stacey NA, Ekerdt JG, Willson CG, Mancini DP, Dauksher WJ, Nordquist KJ, Resnick DJ. Advances in step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 5037: 197-202. DOI: 10.1117/12.484985  1
2003 Resnick DJ, Dauksher WJ, Mancini D, Nordquist KJ, Bailey TC, Johnson S, Stacey N, Ekerdt JG, Willson CG, Sreenivasan SV, Schumaker N. Imprint lithography for integrated circuit fabrication Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2624-2631. DOI: 10.1116/1.1618238  1
2003 Resnick DJ, Mancini D, Dauksher WJ, Nordquist K, Bailey TC, Johnson S, Sreenivasan SV, Ekerdt JG, Willson CG. Improved step and flash imprint lithography templates for nanofabrication Microelectronic Engineering. 69: 412-419. DOI: 10.1016/S0167-9317(03)00329-0  1
2003 Johnson S, Resnick DJ, Mancini D, Nordquist K, Dauksher WJ, Gehoski K, Baker JH, Dues L, Hooper A, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG. Fabrication of multi-tiered structures on step and flash imprint lithography templates Microelectronic Engineering. 67: 221-228. DOI: 10.1016/S0167-9317(03)00075-3  1
2003 Lemonds AM, White JM, Ekerdt JG. Surface science investigations of atomic layer deposition half-reactions using TaF5 and Si2H6 Surface Science. 538: 191-203. DOI: 10.1016/S0039-6028(03)00729-5  1
2003 Lemonds AM, White JM, Ekerdt JG. Surface chemistry of TaCl5 on polycrystalline Ta Surface Science. 527: 124-136. DOI: 10.1016/S0039-6028(02)02685-7  1
2003 Engbrecht ER, Cilino CJ, Junker KH, Sun YM, White JM, Ekerdt JG. Characterization of boron carbo-nitride films deposited by low temperature chemical vapor deposition Materials Research Society Symposium - Proceedings. 766: 351-356.  1
2002 Bailey TC, Johnson SC, Sreenivasan SV, Ekerdt JG, Willson CG, Resnick DJ. Step and flash imprint lithography: An efficient nanoscale printing technology Journal of Photopolymer Science and Technology. 15: 481-486. DOI: 10.2494/Photopolymer.15.481  1
2002 Zhu JH, Leach WT, Ekerdt JG. Control of nucleation to realize high density Si nanoparticles on SiO2 thin films Materials Research Society Symposium - Proceedings. 704: 355-360. DOI: 10.1557/Proc-704-W10.10.1  1
2002 Leach WT, Zhu JH, Ekerdt JG, Mashiro S, Sakai J, Kawshima T. A model for heterogeneous nucleation and growth of silicon nanoparticles on silicon dioxide from disilane Materials Research Society Symposium - Proceedings. 686: 161-166. DOI: 10.1557/Proc-686-A6.3  1
2002 Lemonds AM, Kershen K, Bennett J, Pfeifer K, Sun YM, White JM, Ekerdt JG. Adhesion of Cu and low-k dielectric thin films with tungsten carbide Journal of Materials Research. 17: 1320-1328. DOI: 10.1557/Jmr.2002.0197  1
2002 Resnick DJ, Dauksher WJ, Mancini D, Nordquist KJ, Ainley E, Gehoski K, Baker JH, Bailey TC, Choi BJ, Johnson S, Sreenivasan SV, Ekerdt JG, Willson CG. High resolution templates for step and flash imprint lithography Journal of Microlithography, Microfabrication and Microsystems. 1: 284-289. DOI: 10.1117/1.1508410  1
2002 Dauksher WJ, Nordquist KJ, Mancini DP, Resnick DJ, Baker JH, Hooper AE, Talin AA, Bailey TC, Lemonds AM, Sreenivasan SV, Ekerdt JG, Willson CG. Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2857-2861. DOI: 10.1116/1.1520575  1
2002 Mancini DP, Gehoski KA, Ainley E, Nordquist KJ, Resnick DJ, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG. Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2896-2901. DOI: 10.1116/1.1515311  1
2002 Zhu J, Leach WT, Stanley SK, Ekerdt JG, Yan X. Growth of high-density Si nanoparticles on Si 3N 4 and SiO 2 thin films by hot-wire chemical vapor deposition Journal of Applied Physics. 92: 4695-4698. DOI: 10.1063/1.1509841  1
2002 Kirsch PD, Kang CS, Lozano J, Lee JC, Ekerdt JG. Electrical and spectroscopic comparison of HfO 2/Si interfaces on nitrided and un-nitrided Si(100) Journal of Applied Physics. 91: 4353-4363. DOI: 10.1063/1.1455155  1
2002 Bailey TC, Resnick DJ, Mancini D, Nordquist KJ, Dauksher WJ, Ainley E, Talin A, Gehoski K, Baker JH, Choi BJ, Johnson S, Colburn M, Meissl M, Sreenivasan SV, Ekerdt JG, et al. Template fabrication schemes for step and flash imprint lithography Microelectronic Engineering. 61: 461-467. DOI: 10.1016/S0167-9317(02)00462-8  1
2002 Engbrecht ER, Sun YM, Smith S, Pfiefer K, Bennett J, White JM, Ekerdt JG. Chemical vapor deposition growth and properties of TaCxNy Thin Solid Films. 418: 145-150. DOI: 10.1016/S0040-6090(02)00724-1  1
2002 Leach WT, Zhu JH, Ekerdt JG. Thermal desorption effects in chemical vapor deposition of silicon nanoparticles Journal of Crystal Growth. 243: 30-40. DOI: 10.1016/S0022-0248(02)01472-0  1
2002 Leach WT, Zhu J, Ekerdt JG. Cracking assisted nucleation in chemical vapor deposition of silicon nanoparticles on silicon dioxide Journal of Crystal Growth. 240: 415-422. DOI: 10.1016/S0022-0248(02)01076-X  1
2001 Choi BJ, Meissl M, Colburn M, Bailey T, Ruchhoeft P, Sreenivasan SV, Prins F, Banerjee S, Ekerdt JG, Willson CG. Layer-to-layer alignment for step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 4343: 436-442. DOI: 10.1117/12.436662  1
2001 Bailey T, Smith B, Choi BJ, Colburn M, Meissl M, Sreenivasan SV, Ekerdt JG, Willson CG. Step and flash imprint lithography: Defect analysis Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2806-2810. DOI: 10.1116/1.1420203  1
2001 Colburn M, Suez I, Choi BJ, Meissl M, Bailey T, Sreenivasan SV, Ekerdt JG, Willson CG. Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2685-2689. DOI: 10.1116/1.1420199  1
2001 Colburn M, Grot A, Choi BJ, Amistoso M, Bailey T, Sreenivasan SV, Ekerdt JG, Willson CG. Patterning nonflat substrates with a low pressure, room temperature, imprint lithography process Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2162-2172. DOI: 10.1116/1.1417543  1
2001 Kirsch PD, Ekerdt JG. Interfacial chemistry of the Sr/SioxNy/Si(100) nanostructure Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 19: 2222-2231. DOI: 10.1116/1.1379803  1
2001 Ekerdt JG. Interfacial chemistry of the Ba/SiOxNy/Si(100) nanostructure Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 19: 207-214. DOI: 10.1116/1.1322645  1
2001 Gavrilenko VI, Wu RQ, Downer MC, Ekerdt JG, Lim D, Parkinson P. Optical second-harmonic spectra of Si(001) with H and Ge adatoms: First-principles theory and experiment Physical Review B - Condensed Matter and Materials Physics. 63: 1653251-1653258. DOI: 10.1103/Physrevb.63.165325  1
2001 Kirsch PD, Ekerdt JG. Chemical and thermal reduction of thin films of copper (II) oxide and copper (I) oxide Journal of Applied Physics. 90: 4256-4264. DOI: 10.1063/1.1403675  1
2001 Sun YM, Lee SY, Lemonds AM, Engbrecht ER, Veldman S, Lozano J, White JM, Ekerdt JG, Emesh I, Pfeifer K. Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers Thin Solid Films. 397: 109-115. DOI: 10.1016/S0040-6090(01)01367-0  1
2001 Endle JP, Sun YM, Nguyen N, Madhukar S, Hance RL, White JM, Ekerdt JG. Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films Thin Solid Films. 388: 126-133. DOI: 10.1016/S0040-6090(01)00808-2  1
2001 Endle JP, Sun YM, Silverman J, Nguyen N, Cowley AH, White JM, Ekerdt JG. Titanium-aluminum nitride film growth and related chemistry using dimethylamino-based precursors Thin Solid Films. 385: 66-73. DOI: 10.1016/S0040-6090(00)01879-4  1
2001 Yong K, Ekerdt JG. Surface decomposition of triethylindium on InSb(100) Surface Science. 490: 13-19. DOI: 10.1016/S0039-6028(01)01346-2  1
2001 Colburn M, Bailey T, Choi BJ, Ekerdt JG, Sreenivasan SV, Willson CG. Development and advantages of step-and-flash lithography Solid State Technology. 44: 67-77.  1
2000 Lim D, Downer MC, Ekerdt JG, Arzate N, Mendoza BS, Gavrilenko VI, Wu RQ. Optical second harmonic spectroscopy of boron-reconstructed Si(001) Physical Review Letters. 84: 3406-9. PMID 11019101 DOI: 10.1103/Physrevlett.84.3406  0.36
2000 Jo SK, Kang JH, Yan X, White JM, Ekerdt JG, Keto JW, Lee J. Direct absorption of gas-phase atomic hydrogen by si(100): A narrow temperature window Physical Review Letters. 85: 2144-7. PMID 10970483 DOI: 10.1103/Physrevlett.85.2144  0.56
2000 Sun YM, Lozano J, Mettlach N, Ekerdt JG, Madhukar S, Hance RL, White JM. PT film growth with tetra-kis(triflurophosphine)platinum Materials Research Society Symposium - Proceedings. 596: 103-108. DOI: 10.1557/Proc-596-103  1
2000 Bailey T, Choi BJ, Colburn M, Meissl M, Shaya S, Ekerdt JG, Sreenivasan SV, Willson CG. Step and flash imprint lithography: Template surface treatment and defect analysis Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3572-3577. DOI: 10.1116/1.1324618  1
2000 Jo SK, Kang JH, Yan XM, White JM, Ekerdt JG, Keto JW, Lee J. Direct absorption of gas-phase atomic hydrogen by Si(100): A narrow temperature window Physical Review Letters. 85: 2144-2147. DOI: 10.1103/PhysRevLett.85.2144  1
2000 Lim D, Downer MC, Ekerdt JG. Second-harmonic spectroscopy of bulk boron-doped Si(001) Applied Physics Letters. 77: 181-183. DOI: 10.1063/1.126917  1
2000 Mantese L, Selinidis K, Wilson PT, Lim D, Jiang YY, Ekerdt JG, Downer MC. In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation Applied Surface Science. 154: 229-237. DOI: 10.1016/S0169-4332(99)00386-4  0.36
2000 Gavrilenko VI, Wu RQ, Downer MC, Ekerdt JG, Lim D, Parkinson P. Optical second harmonic spectra of silicon-adatom surfaces: Theory and experiment Thin Solid Films. 364: 1-5. DOI: 10.1016/S0040-6090(99)00900-1  1
2000 McEllistrem MT, Jackson MS, Culp RD, Ekerdt JG. Ligand lability of triethylgallium on GaAs(100) Surface Science. 448: 117-130. DOI: 10.1016/S0039-6028(99)01213-3  1
2000 Yong K, Ekerdt JG. Surface reaction of triethylgallium and triethylantimony on GaSb(100)-(1 × 3) Surface Science. 448: 108-116. DOI: 10.1016/S0039-6028(99)01212-1  1
1999 Sun YM, Endle J, Smith K, Ekerdt JG, Hance RL, Alluri P, White JM. Metallorganic chemical vapor deposition of Ir films with iridium acetylacetonate and carbonyl precursors Materials Research Society Symposium - Proceedings. 541: 101-106. DOI: 10.1557/Proc-541-101  1
1999 Kang JH, Jo SK, Gong B, Parkinson P, Brown DE, White JM, Ekerdt JG. Amorphization of single-crystalline silicon by thermal-energy atomic hydrogen Applied Physics Letters. 75: 91-93. DOI: 10.1063/1.124286  1
1999 Sampson GM, White JM, Ekerdt JG. Low energy argon ion-enhanced removal of carbon from silicon dioxide surfaces with atomic deuterium Applied Surface Science. 143: 30-38. DOI: 10.1016/S0169-4332(99)00074-4  1
1999 Sun YM, Endle JP, Smith K, Whaley S, Mahaffy R, Ekerdt JG, White JM, Hance RL. Iridium film growth with iridium tris-acetylacetonate: Oxygen and substrate effects Thin Solid Films. 346: 100-107. DOI: 10.1016/S0040-6090(98)01458-8  1
1999 Yong K, Kirsch PD, Ekerdt JG. Surface reaction of trisdimethylaminoantimony on GaSb(100) Surface Science. 440: 187-195. DOI: 10.1016/S0039-6028(99)00792-X  1
1999 Parkinson PS, Lim D, Büngener R, Ekerdt JG, Downer MC. Second-harmonic spectroscopy of Ge/Si(001) and Si1-xGex(001)/Si(001) Applied Physics B: Lasers and Optics. 68: 641-648.  1
1999 Kang JH, Jo SK, Lee J, Gong B, Lim D, White JM, Ekerdt JG. Molecular hydrogen evolution from bulk crystalline silicon pretreated with thermal hydrogen atoms Physical Review B - Condensed Matter and Materials Physics. 59: 13170-13175.  1
1999 Sun YM, Endle JP, Ekerdt JG, Russell NM, Healy MD, White JM. Aluminum titanium nitride films grown with multiple precursors Materials Science in Semiconductor Processing. 2: 253-261.  1
1999 Ruchhoeft P, Colburn M, Choi B, Nounu H, Johnson S, Bailey T, Damle S, Stewart M, Ekerdt J, Sreenivasan SV, Wolfe JC, Willson CG. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 2965-2969.  1
1998 Sun YM, Endle J, Ekerdt JG, Russell NM, Healy MD, White JM. Low pressure CVD growth of AlxTi1-xN films with tetrakis(dimethylamido)titanium (TDMAT) and dimethyl aluminum hydride (DMAH) precursors Materials Research Society Symposium - Proceedings. 495: 165-170. DOI: 10.1557/Proc-495-165  1
1998 Wilson PT, Lee YS, Jiang Y, Lim D, Kempf R, Bungener R, Hu XF, Dadap JI, Anderson MH, Ter Beek M, Xu Z, Russell NM, Ekerdt JG, Parkinson PS, Mishina ED, et al. New directions in surface spectroscopy enabled by ultrafast lasers Proceedings of Spie - the International Society For Optical Engineering. 3272: 51-56. DOI: 10.1117/12.307114  1
1998 Endle JP, Sun YM, White JM, Ekerdt JG. X-ray photoelectron spectroscopy study of TiN films produced with tetrakis(dimethylamido)titanium and selected N-containing precursors on SiO2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 1262-1267. DOI: 10.1116/1.581271  1
1998 Carmalt CJ, Whaley SR, Lall PS, Cowley AH, Jones RA, McBurnett BG, Ekerdt JG. Titanium(IV)azido and imido complexes as potential precursors to titanium nitride Journal of the Chemical Society - Dalton Transactions. 553-557. DOI: 10.1039/A705246D  1
1998 Ostromecki MM, Burcham LJ, Wachs IE, Ramani N, Ekerdt JG. The influence of metal oxide additives on the molecular structures of surface tungsten oxide species on alumina: I. Ambient conditions Journal of Molecular Catalysis a: Chemical. 132: 43-57. DOI: 10.1016/S1381-1169(97)00226-4  1
1998 Wong KC, McBurnett BG, Culp RD, Cowley AH, Ekerdt JG. Homolysis versus β-hydride elimination in the decomposition of trialkylgallium on GaAs(100) Surface Science. 416: 480-487. DOI: 10.1016/S0039-6028(98)00641-4  1
1998 Wong KC, McEllistrem MT, McBurnett BG, Culp RD, Cowley AH, Ekerdt JG. Direct evidence for the β-hydride elimination mechanism in the decomposition of triethylgallium on GaAs(100) Surface Science. 396: 260-265. DOI: 10.1016/S0039-6028(97)00674-2  1
1998 Sullivan DL, Ekerdt JG. Mechanism of thiophene hydrodesulfurization on model molybdenum catalysts Acs Division of Petroleum Chemistry, Inc. Preprints. 43: 15-19. DOI: 10.1006/Jcat.1998.2162  1
1998 Ramani NC, Sullivan DL, Ekerdt JG, Jehng JM, Wachs IE. Selective oxidation of 1-butene over silica-supported Cr(VI), Mo(VI), and W(VI) oxides Journal of Catalysis. 176: 143-154. DOI: 10.1006/Jcat.1998.2056  1
1998 Ramani NC, Sullivan DL, Ekerdt JG. Isomerization of 1-butene over silica-supported Mo(VI), W(VI), and Cr(VI) Journal of Catalysis. 173: 105-114. DOI: 10.1006/Jcat.1997.1912  1
1998 Sullivan DL, Ekerdt JG. Mechanisms of thiophene hydrodesulfurization on model molybdenum catalysts Journal of Catalysis. 178: 226-233.  1
1998 Sampson GM, White JM, Ekerdt JG. Reactions of atomic deuterium with C2D5Br on Si(100) Surface Science. 411: 163-175.  1
1998 Junker KH, Hess G, Ekerdt JG, White JM. Thermal and electron-driven chemistry of CCl4 on clean and hydrogen precovered Si(100) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 2995-3005.  1
1997 Xu Z, Hu XF, Lim D, Ekerdt JG, Downer MC. Second harmonic spectroscopy of Si(001) surfaces: Sensitivity to surface hydrogen and doping, and applications to kinetic measurements Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 1059-1064. DOI: 10.1116/1.589415  1
1997 Wong KC, Jackson MS, McEllistrem MT, Culp RD, Ekerdt JG. Static secondary ion mass spectrometry study of the decomposition of triethylgallium on GaAs (100) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 3127-3133. DOI: 10.1116/1.580856  1
1997 Hess G, Russell M, Gong B, Parkinson P, Ekerdt JG. Hydrogen desorption from ion-roughened Si(100) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 1129-1134. DOI: 10.1116/1.580442  1
1997 Dadap JI, Xu Z, Hu XF, Downer MC, Russell NM, Ekerdt JG, Aktsipetrov OA. Second-harmonic spectroscopy of a Si(001) surface during calibrated variations in temperature and hydrogen coverage Physical Review B - Condensed Matter and Materials Physics. 56: 13367-13379. DOI: 10.1103/Physrevb.56.13367  1
1997 Sullivan DL, Ekerdt JG. Effect of catalyst oxidation state and structure on thiophene hydrodesulfurization over model molybdenum catalysts Journal of Catalysis. 172: 64-75. DOI: 10.1006/Jcat.1997.1867  1
1997 Xu Z, Hu XF, Ekerdt JG, Downer MC. Second harmonic azimuthal anisotropy spectroscopy and doping dependence at hydrogen-covered Si(001) surfaces Conference On Quantum Electronics and Laser Science (Qels) - Technical Digest Series. 12: 87-88.  1
1997 Jo SK, Gong B, Hess G, White JM, Ekerdt JG. Low-temperature Si(100) etching: Facile abstraction of SiH3(a) by thermal hydrogen atoms Surface Science. 394.  1
1997 Schwitzgebel J, Ekerdt JG, Sunada F, Lindquist SE, Heller A. Increasing the efficiency of the photocatalytic oxidation of organic films on aqueous solutions by reactively coating the TiO2 photocatalyst with a chlorinated silicone Journal of Physical Chemistry B. 101: 2621-2624.  1
1997 Hu XF, Xu Z, Parkinson PS, Lim D, Ekerdt JG, Downer MC. In situ optical second harmonic monitoring of hydrogen adsorption and desorption kinetics during epitaxial growth on Si(001) Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-Leos. 11: 487-488.  1
1996 Ekerdt JG, Sun YM, Szabo A, Szulczewski GJ, White JM. Role of Surface Chemistry in Semiconductor Thin Film Processing. Chemical Reviews. 96: 1499-1518. PMID 11848800 DOI: 10.1021/Cr950236Z  0.56
1996 Neumayer DA, Carmalt CJ, Arendt MF, White JM, Cowley AH, Jones RA, Ekerdt JG. New single source precursor approach to gallium and aluminum nitride Materials Research Society Symposium - Proceedings. 395: 85-90. DOI: 10.1557/Proc-395-85  1
1996 Neumayer DA, Ekerdt JG. Growth of group III nitrides. A review of precursors and techniques Chemistry of Materials. 8: 9-25. DOI: 10.1021/Cm950108R  1
1996 Russell NM, Ekerdt JG. Kinetics of hydrogen desorption from germanium-covered Si(100) Surface Science. 369: 51-68. DOI: 10.1016/S0039-6028(96)00888-6  1
1996 Russell NM, Ekerdt JG. Nonlinear parameter estimation technique for kinetic analysis of thermal desorption data Surface Science. 364: 199-218. DOI: 10.1016/0039-6028(96)00593-6  1
1996 Dadap JI, Hu XF, Anderson MH, Beek Mt, Aktsipetrov OA, Russell NM, Ekerdt JG, Downer MC. Applications of Femtosecond Lasers to Nonlinear Spectroscopy and Process Control of Si(001) Interfaces Springer Series in Chemical Physics. 62: 452-454. DOI: 10.1007/978-3-642-80314-7_197  0.4
1996 Ekerdt JG, Sun YM, Szabo A, Szulczewski GJ, White JM. Role of surface chemistry in semiconductor thin film processing Chemical Reviews. 96: 1499-1517.  1
1995 Mahajan A, Kellerman BK, Heitzinger JM, Banerjee S, Tasch A, White JM, Ekerdt JG. Surface chemistry of diethylsilane and diethylgermane on Ge(100) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1461-1468. DOI: 10.1116/1.579687  1
1995 Kellerman BK, Mahajan A, Russell NM, Ekerdt JG, Banerjee SK, Tasch AF, Campion A, White JM, Bonser DJ. Adsorption and decomposition of diethylsilane and diethylgermane on Si(100): Surface reactions for an atomic layer epitaxial approach to column IV epitaxy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1819-1825. DOI: 10.1116/1.579665  1
1995 Dadap JI, Hu XF, Russell NM, Ekerdt JG, Lowell JK, Downer MC. Analysis of Second-Harmonic Generation by Unamplified, High-Repetition-Rate, Ultrashort Laser Pulses at Si(001) Interfaces Ieee Journal On Selected Topics in Quantum Electronics. 1: 1145-1155. DOI: 10.1109/2944.488693  1
1995 Heitzinger JM, Jackson MS, Ekerdt JG. Comparison of triethylaluminum, triethylgallium, triethylindium, and triethylantimony on GaAs(100) Applied Physics Letters. 352. DOI: 10.1063/1.114210  1
1995 Neumayer DA, Cowley AH, Decken A, Jones RA, Lakhotia V, Ekerdt JG. New single-source precursor approach to gallium nitride Journal of the American Chemical Society. 117: 5893-5894. DOI: 10.1021/Ja00126A046  1
1995 Schwitzgebel J, Ekerdt JG, Gerischer H, Heller A. Role of the oxygen molecule and of the photogenerated electron in TiO2-photocatalyzed air oxidation reactions Journal of Physical Chemistry. 99: 5633-5638. DOI: 10.1021/J100015A055  1
1995 Neumayer DA, Cowley AH, Decken A, Jones RA, Lakhotia V, Ekerdt JG. Hydrazide derivatives of gallium Inorganic Chemistry. 34: 4698-4700. DOI: 10.1021/Ic00122A029  1
1995 Lakhotia V, Neumayer DA, Cowley AH, Jones RA, Ekerdt JG. GaN film growth using single-source precursors Chemistry of Materials. 7: 546-552. DOI: 10.1021/Cm00051A016  1
1995 Kim DS, Ostromecki M, Wachs IE, Kohler SD, Ekerdt JG. Preparation and characterization of WO3/SiO2 catalysts Catalysis Letters. 33: 209-215. DOI: 10.1007/Bf00814225  1
1995 Sullivan DL, Roark RD, Ekerdt JG, Deutsch SE, Gates BC. Reaction and spectroscopic study of silica-supported molybdenum(IV) and tungsten(IV) dimers Journal of Physical Chemistry. 99: 3678-3686.  1
1994 Johannes JE, Ekerdt JG. Resonance enhanced multiphonon ionization of silicon produced during disilane pyrolysis Journal of Applied Physics. 76: 3144-3148. DOI: 10.1063/1.357497  1
1994 Kohler SD, Ekerdt JG. Infrared spectroscopic characterization of chromium carbonyl species formed by ultraviolet photoreduction of silica-supported chromium(VI) in carbon monoxide Journal of Physical Chemistry. 98: 4336-4342. DOI: 10.1021/J100067A021  1
1994 Lakhotia V, Heitzinger JM, Cowley AH, Jones RA, Ekerdt JG. Growth and Characterization of GaAs Films from Tris(di-tert-butylarsino)gallane Chemistry of Materials. 6: 871-874. DOI: 10.1021/Cm00042A028  0.36
1994 Roark RD, Narayanan CR, Sullivan DL, Ekerdt JG. Formation of molybdenum and tungsten cation pairs on silica from cyclopentadienylmolybdenum di- and tricarbonyl dimer, cyclopentadienyltungsten di- and tricarbonyl dimer, and 1,2-bis(cyclopentadienyl)-1,1,2,2-tetracarbonylmolybdenumtungsten Chemistry of Materials. 6: 739-743. DOI: 10.1021/Cm00042A007  1
1994 Miller JE, Ekerdt JG. Chemical beam epitaxy and characterization of GaAs from bis(tert-butylarsenido)dimethylgallane dimer and bis(tert-butylarsenido)diethylgallane dimer Chemistry of Materials. 6: 343-348. DOI: 10.1021/Cm00039A016  1
1994 Asami S, Russell NM, Mahajan A, Steiner PA, Bonser DJ, Fretwell J, Bannerjee S, Tasch A, White JM, Ekerdt JG. Adaptive temperature program ALE of Si1 − xGex/Si heterostructures from Si2H6/Ge2H6 Applied Surface Science. 359-366. DOI: 10.1016/0169-4332(94)90242-9  0.56
1994 Jackson MS, Heitzinger JM, Nail JW, Culp RD, Ekerdt JG. A temperature-programmed desorption/X-ray photoelectron spectroscopy study of ditertiarybutylarsine on GaAs(100) Applied Surface Science. 81: 195-201. DOI: 10.1016/0169-4332(94)00170-7  1
1994 Heitzinger JM, White JM, Ekerdt JG. Mechanisms of GaAs atomic layer epitaxy: a review of progress Surface Science. 299: 892-908. DOI: 10.1016/0039-6028(94)90705-6  1
1994 Kohler SD, Ekerdt JG. Infrared spectroscopic characterization of tungsten carbonyl species formed by ultraviolet photoreduction of silica-supported W(VI) in carbon monoxide Journal of Physical Chemistry. 98: 1276-1281.  1
1994 Lakhotia V, Heitzinger JM, Cowley AH, Jones RA, Ekerdt JG. Growth and characterization of GaAs films from tris(di-tert-butylarsino)gallane Chemistry of Materials. 6: 871-874.  1
1993 Sun YM, Sloan DW, Huett T, White JM, Ekerdt JG. Electron induced adsorption, desorption and decomposition of ammonia on GaAs(100) Surface Science. 295. DOI: 10.1016/0039-6028(93)90172-G  1
1993 Williams CC, Ekerdt JG. The Absence of Molybdenum Precursor Effects for Methanol Oxidation over Molybdenum Oxide Supported on Silica Journal of Catalysis. 141: 430-437. DOI: 10.1006/Jcat.1993.1152  1
1992 Lapinski MP, Ekerdt JG. In situ Fourier transform infrared study of ethylene surface reaction kinetics on alumina-supported nickel Journal of Physical Chemistry. 96: 5069-5077. DOI: 10.1021/J100191A061  1
1992 Miller JE, Mardones MA, Nail JW, Cowley AH, Jones RA, Ekerdt JG. Pyrolysis studies of the single-source GaAs precursors [Me2Ga(μ-As-i-Pr2)]3, [Me2Ga(μ-AsMe2)]3, [Me2Ga(μ-As-t-Bu2)]2, and [Et2Ga(μ-As-t-Bu2)]2 Chemistry of Materials. 4: 447-452. DOI: 10.1021/Cm00020A038  1
1992 Ekerdt JG, Sun YM, Jackson MS, Lakhotia V, Pacheco KA, Koschmieder SU, Cowley AH, Jones RA. Chemical beam epitaxy of GaAs films using single-source precursors Journal of Crystal Growth. 124: 158-164. DOI: 10.1016/0022-0248(92)90453-P  1
1992 Roark RD, Kohler SD, Ekerdt JG, Du Kim S, Wachs IE. Monolayer dispersion of molybdenum on silica Catalysis Letters. 16: 77-83. DOI: 10.1007/Bf00764357  1
1992 Roark RD, Kohler SD, Ekerdt JG. Role of silanol groups in dispersing Mo(VI) on silica Catalysis Letters. 16: 71-76. DOI: 10.1007/Bf00764356  1
1992 Kohler SD, Ekerdt JG, Kim DS, Wachs IE. Relationship between structure and point of zero surface charge for molybdenum and tungsten oxides supported on alumina Catalysis Letters. 16: 231-239. DOI: 10.1007/Bf00764335  1
1992 Karies GD, Ekerdt JG. CO hydrogenation catalysis-selective formation of isobutene American Chemical Society, Division of Petroleum Chemistry, Preprints. 37: 239-244.  1
1992 Miller JE, Ekerdt JG. Growth of epitaxial (100) GaAs films using the single-source precursor [Me2Ga(μ-t-Bu2As)]2 Chemistry of Materials. 4: 7-9.  1
1991 Williams CC, Ekerdt JG, Jehng JM, Hardcastle FD, Wachs IE. A Raman and ultraviolet diffuse reflectance spectroscopic investigation of alumina-supported molybdenum oxide Journal of Physical Chemistry. 95: 8791-8797. DOI: 10.1021/J100175A068  1
1991 Jackson NB, Wang CM, Luo Z, Schwitzgebel J, Ekerdt JG, Brock JR, Heller A. Attachment of TiO2 powders to hollow glass microbeads. Activity of the TiO2-coated beads in the photoassisted oxidation of ethanol to acetaldehyde Journal of the Electrochemical Society. 138: 3660-3664.  1
1990 Lapinski MP, Ekerdt JG. Infrared identification of adsorbed surface species on Ni/SiO2 and Ni/Al2O3 from ethylene and acetylene adsorption Journal of Physical Chemistry. 94: 4599-4610. DOI: 10.1021/J100374A044  1
1990 Jackson NB, Ekerdt JG. Isotope studies of the effect of acid sites on the reactions of C3 intermediates during isosynthesis over zirconium dioxide and modified zirconium dioxide Journal of Catalysis. 126: 46-56. DOI: 10.1016/0021-9517(90)90045-L  1
1990 Jackson NB, Ekerdt JG. The surface characteristics required for isosynthesis over zirconium dioxide and modified zirconium dioxide Journal of Catalysis. 126: 31-45. DOI: 10.1016/0021-9517(90)90044-K  1
1989 Your JJA, Karles GD, Ekerdt JG, Trachtenberg I, Barlow JW. Development of a reaction injection molding encapsulant system. 1. Kinetic studies of butyllithium-catalyzed styrene polymerization Industrial and Engineering Chemistry Research. 28: 1456-1463. DOI: 10.1021/Ie00094A003  1
1989 Silver RG, Hou CJ, Ekerdt JG. The role of lattice anion vacancies in the activation of CO and as the catalytic site for methanol synthesis over zirconium dioxide and yttria-doped zirconium dioxide Journal of Catalysis. 118: 400-416. DOI: 10.1016/0021-9517(89)90327-8  1
1989 Anderson KG, Ekerdt JG. Hydrocarbon surface fragments over Co SiO2: An FTIR study Journal of Catalysis. 116: 556-567. DOI: 10.1016/0021-9517(89)90121-8  1
1988 Cowley AH, Benac BL, Ekerdt JG, Jones RA, Kidd KB, Lee JY, Miller JE. Organometallic chemical vapor deposition of III/V compound semiconductors with novel organometallic precursors. Journal of the American Chemical Society. 110: 6248-9. PMID 22148811 DOI: 10.1021/Ja00226A051  0.36
1988 Ekerdt JG, Klabunde KJ, Shapley JR, White JM, Yates JT. Surface chemistry of organophosphorus compounds Journal of Physical Chemistry. 92: 6182-6188. DOI: 10.1021/J100333A005  1
1988 Lapinski MP, Ekerdt JG. Infrared evidence for ethylidyne formation on alumina-supported nickel Journal of Physical Chemistry. 92: 1708-1712. DOI: 10.1021/J100318A003  1
1988 Tseng SC, Jackson NB, Ekerdt JG. Isosynthesis reactions of CO H2 over zirconium dioxide Journal of Catalysis. 109: 284-297. DOI: 10.1016/0021-9517(88)90211-4  1
1987 Lapinski MP, Silver RG, Ekerdt JG, McCabe RW. Formaldehyde oxidation on silica-supported platinum: Spectroscopic evidence for adsorbed carbon monoxide intermediate Journal of Catalysis. 105: 258-262. DOI: 10.1016/0021-9517(87)90026-1  1
1986 Chen HW, White JM, Ekerdt JG. Electronic effect of supports on copper catalysts Journal of Catalysis. 99: 293-303. DOI: 10.1016/0021-9517(86)90354-4  1
1986 Jackson NB, Ekerdt JG. Methanol synthesis mechanism over zirconium dioxide Journal of Catalysis. 101: 90-102. DOI: 10.1016/0021-9517(86)90232-0  1
1986 Campione TJ, Ekerdt JG. Fourier transform infrared study of butene adsorption and reaction on a silica-supported nickel catalyst Journal of Catalysis. 102: 64-79. DOI: 10.1016/0021-9517(86)90141-7  1
1985 He MY, White JM, Ekerdt JG. CO and CO2 hydrogenation over metal oxides: a comparison of ZnO, TiO2 and ZrO2 Journal of Molecular Catalysis. 30: 415-430. DOI: 10.1016/0304-5102(85)85051-3  1
1985 Fang SM, White JM, Campione TJ, Ekerdt JG. CO hydrogenation and adsorption studies on supported-nickel SMSI catalysts Journal of Catalysis. 96: 491-498. DOI: 10.1016/0021-9517(85)90317-3  1
1985 Huang KW, Ekerdt JG. Alkyl and π-allyl intermediates in n-C4 hydrocarbon reactions over ruthenium Journal of Catalysis. 92: 232-239. DOI: 10.1016/0021-9517(85)90257-X  1
1985 Ekerdt JG, Huang KW, Campione TJ. N-C//4 HYDROCARBON REACTIONS OVER TRANSITION METALS American Chemical Society, Division of Petroleum Chemistry, Preprints. 30: 190.  1
1985 Ekerdt JG, Huang KW, Campione TJ. N-C4 hydrocarbon reactions over transition metals Preprints Symposia. 30: 190.  1
1984 Park SC, Ekerdt JG. Infrared study of polystyrene-bound rhodium under hydroformylation conditions Journal of Molecular Catalysis. 24: 33-46. DOI: 10.1016/0304-5102(84)85037-3  1
1984 Wang CJ, Ekerdt JG. Evidence for alkyl intermediates during Fischer-Tropsch synthesis and their relation to hydrocarbon products Journal of Catalysis. 86: 239-244. DOI: 10.1016/0021-9517(84)90369-5  1
1984 Roucis JB, Ekerdt JG. The influence of intraparticle mass transfer on the activity of a gel-form polymer-bound transition metal catalyst Journal of Catalysis. 86: 32-47. DOI: 10.1016/0021-9517(84)90345-2  1
1984 He MY, Ekerdt JG. Infrared studies of the adsorption of synthesis gas on zirconium dioxide Journal of Catalysis. 87: 381-388. DOI: 10.1016/0021-9517(84)90198-2  1
1984 He MY, Ekerdt JG. Temperature-programmed studies of the adsorption of synthesis gas on zirconium dioxide Journal of Catalysis. 87: 238-254. DOI: 10.1016/0021-9517(84)90184-2  1
1984 He MY, Ekerdt JG. Methanol formation on zirconium dioxide Journal of Catalysis. 90: 17-23. DOI: 10.1016/0021-9517(84)90079-4  1
1984 He MY, Ekerdt JG. CO and CO2 hydrogenation over ZrO2 Preprints Symposia. 29: 532-540.  1
1984 He MY, Ekerdt JG. CO AND CO//2 HYDROGENATION OVER ZrO//2 American Chemical Society, Division of Petroleum Chemistry, Preprints. 29: 532-540.  1
1983 Wang CJ, Ekerdt JG. Study of Fischer-Tropsch synthesis over Fe SiO2: Reactive scavenging with pyridine and cyclohexene Journal of Catalysis. 80: 172-187. DOI: 10.1016/0021-9517(83)90241-5  1
1979 Ekerdt JG, Bell AT. Synthesis of hydrocarbons from CO and H2 over silica-supported Ru: Reaction rate measurements and infrared spectra of adsorbed species Journal of Catalysis. 58: 170-187. DOI: 10.1016/0021-9517(79)90255-0  1
1978 Ekerdt JG, Bell AT. INFRARED AND KINETIC STUDIES OF HYDROCARBON SYNTHESIS OVER A Ru CATALYST American Chemical Society, Division of Petroleum Chemistry, Preprints. 23: 475-481.  1
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