Kenneth A Goldberg, Ph.D.
Affiliations: | 1992-1997 | Physics | University of California, Berkeley, Berkeley, CA, United States |
Area:
Short-wavelength optics, synchrotron instrumentation, interferometry, imaging, EUV LithographyWebsite:
http://goldberg.lbl.govGoogle:
"Kenneth A. Goldberg"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Jeffrey Bokor | grad student | 1993-1997 | UC Berkeley |
| Roger W. Falcone | grad student | 1993-1997 | UC Berkeley |
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Sanchez Del Rio M, Wojdyla A, Goldberg KA, et al. (2020) Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study. Journal of Synchrotron Radiation. 27: 1141-1152 |
| Goldberg KA, Bryant D, Wojdyla A, et al. (2020) Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing. Optics Letters. 45: 4694-4697 |
| Cocco D, Hardin C, Morton D, et al. (2020) Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating. Optics Express. 28: 19242-19254 |
| Gunjala G, Wojdyla A, Sherwin S, et al. (2020) Extreme ultraviolet microscope characterization using photomask surface roughness. Scientific Reports. 10: 11673 |
| Naulleau PP, Benk M, Goldberg KA, et al. (2017) Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. Applied Optics. 56: 3325-3328 |
| Levinson Z, Burbine A, Verduijn E, et al. (2017) Image-based pupil plane characterization via a space-domain basis Journal of Micro-Nanolithography Mems and Moems. 16: 23509-23509 |
| Goldberg KA, Yashchuk VV. (2016) Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power. The Review of Scientific Instruments. 87: 051805 |
| Shanker A, Wojdyla A, Gunjala G, et al. (2016) Off-axis Aberration Estimation in an EUV Microscope Using Natural Speckle Rundbrief Der Gi-Fachgruppe 5.10 Informationssystem-Architekturen |
| Levinson Z, Burbine A, Verduijn E, et al. (2016) Image-Based Pupil Plane Characterization via Principal Component Analysis for EUVL Tools Proceedings of Spie. 9776: 977618 |
| Wojdyla A, Donoghue A, Benk MP, et al. (2016) Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks Proceedings of Spie - the International Society For Optical Engineering. 9776 |