Donghun Choi, Ph.D. - Publications
Affiliations: | 2008 | Stanford University, Palo Alto, CA |
Year | Citation | Score | |||
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2009 | Choi D, Harris JS, Kim E, McIntyre PC, Cagnon J, Stemmer S. High-quality III–V semiconductor MBE growth on Ge/Si virtual substrates for metal-oxide-semiconductor device fabrication Journal of Crystal Growth. 311: 1962-1971. DOI: 10.1016/J.Jcrysgro.2008.09.138 | 0.629 | |||
2008 | Shin B, Choi D, Harris JS, McIntyre PC. Pre-atomic layer deposition surface cleaning and chemical passivation of (100) In0.2Ga0.8As and deposition of ultrathin Al2O3 gate insulators Applied Physics Letters. 93: 052911. DOI: 10.1063/1.2966357 | 0.559 | |||
2008 | Choi D, Kim E, McIntyre PC, Harris JS. Molecular-beam epitaxial growth of III–V semiconductors on Ge∕Si for metal-oxide-semiconductor device fabrication Applied Physics Letters. 92: 203502. DOI: 10.1063/1.2929386 | 0.632 | |||
2008 | Choi D, Ge Y, Harris JS, Cagnon J, Stemmer S. Low surface roughness and threading dislocation density Ge growth on Si (0 0 1) Journal of Crystal Growth. 310: 4273-4279. DOI: 10.1016/J.Jcrysgro.2008.07.029 | 0.552 | |||
2007 | Choi D, Warusawithana M, Chui CO, Chen J, Tsai W, Schlom DG, Harris JS. The electrical characterization of molecular-beam-deposited LaA10 3 on gaas and its annealing effects Materials Research Society Symposium Proceedings. 996: 127-132. DOI: 10.1557/Proc-0996-H05-31 | 0.602 | |||
2007 | Choi D, Harris JS, Warusawithana M, Schlom DG. Annealing condition optimization and electrical characterization of amorphous LaAl O3 GaAs metal-oxide-semiconductor capacitors Applied Physics Letters. 90. DOI: 10.1063/1.2748308 | 0.597 | |||
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