Year |
Citation |
Score |
2012 |
McClure JP, Thornton JD, Jiang R, Chu D, Cuomo JJ, Fedkiwa PS. Oxygen reduction on metal-free nitrogen-doped carbon nanowall electrodes Journal of the Electrochemical Society. 159. DOI: 10.1149/2.056211Jes |
0.75 |
|
2008 |
Cho JS, Han Y, Cuomo JJ. Ion beam pretreatment of polymeric substrates for ITO thin film deposition Solid State Sciences. 10: 941-949. DOI: 10.1016/J.Solidstatesciences.2007.11.010 |
0.459 |
|
2007 |
Rabiei A, Thomas B, Neville B, Lee JW, Cuomo J. A novel technique for processing functionally graded HA coatings Materials Science and Engineering C. 27: 523-528. DOI: 10.1016/J.Msec.2006.05.037 |
0.487 |
|
2006 |
Rabiei A, Thomas B, Jin C, Narayan R, Cuomo J, Yang Y, Ong JL. A study on functionally graded HA coatings processed using ion beam assisted deposition with in situ heat treatment Surface and Coatings Technology. 200: 6111-6116. DOI: 10.1016/J.Surfcoat.2005.09.027 |
0.483 |
|
2005 |
Lee JW, Cuomo JJ, Cho YS, Keusseyan RL. Aluminum Nitride Thin Films on an LTCC Substrate Journal of the American Ceramic Society. 88: 1977-1980. DOI: 10.1111/J.1551-2916.2005.00250.X |
0.496 |
|
2004 |
Lee JW, Cuomo JJ, Bourham M. Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 260-263. DOI: 10.1116/1.1641049 |
0.424 |
|
2003 |
Lee JW, Cuomo JJ, Moody BF, Cho YS, Keusseyan RL. Pulsed DC Reactive Magnetron Sputtering of AlN Thin Films on High Frequency LTCC Substrates Mrs Proceedings. 783. DOI: 10.1557/Proc-783-B5.10 |
0.398 |
|
2003 |
Park M, Sakhrani V, Maria JP, Cuomo JJ, Teng CW, Muth JF, Ware ME, Rodriguez BJ, Nemanich RJ. Wavelength-dependent Raman scattering of hydrogenated amorphous silicon carbon with red, green, and blue light excitation Journal of Materials Research. 18: 768-771. DOI: 10.1557/Jmr.2003.0106 |
0.341 |
|
2003 |
Chang YC, Cai AL, Muth JF, Kolbas RM, Park M, Cuomo JJ, Hanser A, Bumgarner J. Optical and structural studies of hydride vapor phase epitaxy grown GaN Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 701-705. DOI: 10.1116/1.1568346 |
0.429 |
|
2002 |
Park M, Carlson E, Chang YC, Muth JF, Bumgarner J, Kolbas RM, Cuomo JJ, Nemanich RJ. Optical characterization of high quality GaN produced by high rate magnetron sputter epitaxy Materials Research Society Symposium - Proceedings. 743: 323-328. DOI: 10.1557/Proc-743-L4.12 |
0.389 |
|
2002 |
McCord MG, Hwang YJ, Hauser PJ, Qiu Y, Cuomo JJ, Hankins OE, Bourham MA, Canup LK. Modifying Nylon and Polypropylene Fabrics with Atmospheric Pressure Plasmas Textile Research Journal. 72: 491-498. DOI: 10.1177/004051750207200605 |
0.621 |
|
2002 |
Park M, Maria JP, Cuomo JJ, Chang YC, Muth JF, Kolbas RM, Nemanich RJ, Carlson E, Bumgarner J. X-ray and Raman analyses of GaN produced by ultrahigh-rate magnetron sputter epitaxy Applied Physics Letters. 81: 1797-1799. DOI: 10.1063/1.1506781 |
0.424 |
|
2001 |
Kang D, Zhirnov VV, Sanwald RC, Hren JJ, Cuomo JJ. Field emission from ultrathin coatings of AlN on Mo emitters Journal of Vacuum Science & Technology B. 19: 50-54. DOI: 10.1116/1.1340669 |
0.421 |
|
2001 |
Zhirnov VV, Lizzul-Rinne C, Wojak GJ, Sanwald RC, Cuomo JJ, Hren JJ. Optimizing high-current yields from diamond coated field emitters Journal of Vacuum Science & Technology B. 19: 17-22. DOI: 10.1116/1.1340009 |
0.311 |
|
2001 |
Hyun J, Aspnes DE, Cuomo JJ. Nondestructive measurement of a glass transition temperature at spin-cast semicrystalline polymer surfaces [1] Macromolecules. 34: 2395-2397. DOI: 10.1021/Ma0012797 |
0.303 |
|
2001 |
Liu JJ, Chiu DYT, Morton DC, Kang DH, Zhirnov VV, Hren JJ, Cuomo JJ. Band gap structure and electron emission property of chemical-vapor-deposited diamond films Solid-State Electronics. 45: 915-919. DOI: 10.1016/S0038-1101(00)00210-0 |
0.411 |
|
2000 |
Hyun J, Barletta P, Koh K, Yoo S, Oh J, Aspnes DE, Cuomo JJ. Effect of Ar+ ion beam in the process of plasma surface modification of PET films Journal of Applied Polymer Science. 77: 1679-1683. DOI: 10.1002/1097-4628(20000822)77:8<1679::Aid-App4>3.0.Co;2-F |
0.351 |
|
2000 |
Hyun J, Pope M, Smith J, Park M, Cuomo JJ. Ultrathin DLC and SiOx layer deposition on poly(ethylene terephthalate) and restriction of surface dynamics Journal of Applied Polymer Science. 75: 1158-1164. DOI: 10.1002/(Sici)1097-4628(20000228)75:9<1158::Aid-App9>3.0.Co;2-L |
0.463 |
|
1999 |
Kang DH, Zhirnov VV, Wojak GJ, Sanwald RC, Park M, Hren JJ, Cuomo JJ. Surface Treatment Effects on the Electron Emission Characteristics of Ultra Thin AIN Coated Molybdenum Tips Mrs Proceedings. 558: 563. DOI: 10.1557/Proc-558-563 |
0.301 |
|
1999 |
Park M, Sowers AT, Rinne CL, Schlesser R, Bergman L, Nemanich RJ, Sitar Z, Hren JJ, Cuomo JJ, Zhirnov VV, Choi WB. Effect of nitrogen incorporation on electron emission from chemical vapor deposited diamond Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 734. DOI: 10.1116/1.590630 |
0.45 |
|
1999 |
Park M, McGregor DR, Bergman L, Nemanich RJ, Hren JJ, Cuomo JJ, Choi WB, Zhirnov VV. Raman analysis and field emission study of ion beam etched diamond films Journal of Vacuum Science & Technology B. 17: 700-704. DOI: 10.1116/1.590622 |
0.473 |
|
1999 |
Kang DH, Zhirnov VV, Wojak GJ, Preble EA, Choi WB, Hren JJ, Cuomo JJ. Investigation of thickness effects on AlN coated metal tips by in situ I–V measurement Journal of Vacuum Science & Technology B. 17: 632-634. DOI: 10.1116/1.590608 |
0.385 |
|
1999 |
Park M, Camphausen SM, Myers AF, Barletta PT, Sakhrani V, Bergman L, Nemanich RJ, Cuomo JJ. Raman scattering of tetrahedrally-bonded amorphous carbon deposited at oblique angles Materials Letters. 41: 229-233. DOI: 10.1016/S0167-577X(99)00135-4 |
0.456 |
|
1998 |
Narayan R, Wei Q, Sharma A, Cuomo J, Narayan J. Diamondlike Carbon, Carbon Nitride, and Titanium Nitride Coatings on Metal and Polymer Substrates Mrs Proceedings. 526. DOI: 10.1557/Proc-526-355 |
0.46 |
|
1998 |
Zhirnov VV, Liu J, Wojak GJ, Cuomo JJ, Hren JJ. Environmental effect on the electron emission from diamond surfaces Journal of Vacuum Science & Technology B. 16: 1188-1193. DOI: 10.1116/1.590030 |
0.324 |
|
1998 |
Choi WB, Schlesser R, Wojak G, Cuomo JJ, Sitar Z, Hren JJ. Electron energy distribution of diamond-coated field emitters Journal of Vacuum Science & Technology B. 16: 716-719. DOI: 10.1116/1.589889 |
0.381 |
|
1998 |
Joshkin VA, Parker CA, Bedair SM, Krasnobaev LY, Cuomo JJ, Davis RF, Suvkhanov A. Fine structure of near-band-edge photoluminescence in He+-irradiated GaN grown on SiC Applied Physics Letters. 72: 2838-2840. DOI: 10.1063/1.121474 |
0.345 |
|
1998 |
Park M, Choi WB, Streiffer SK, Hren JJ, Cuomo JJ. Secondary electron emission patterning of diamond with hydrogen and oxygen plasmas Applied Physics Letters. 72: 2580-2582. DOI: 10.1063/1.121424 |
0.429 |
|
1997 |
Myers AF, Steel EB, Dingt MQ, Camphausen SM, Choi WB, Cuomo JJ, Hren JJ. TEM and EELS Investigation of a-C and ta-C Coated Field Emitters Mrs Proceedings. 498. DOI: 10.1557/Proc-498-83 |
0.469 |
|
1997 |
Park M, Bergman L, Choi WB, Sowers AT, Nemanich RJ, Hren JJ, Cuomo JJ. Field Emission from Nitrogen-Doped Diamond Film Mrs Proceedings. 498: 239. DOI: 10.1557/Proc-498-239 |
0.441 |
|
1997 |
Choi WB, Myers AF, Ding MQ, Sharma AK, Narayan J, Hren JJ, Cuomo JJ. Electron Emission Through Tetrahedral Amorphous Carbon Coatings on Mo and Si Emitters Mrs Proceedings. 498. DOI: 10.1557/Proc-498-233 |
0.37 |
|
1997 |
Camphausen SM, Myers AF, Bozeman SP, Baldwin DA, Cuomo JJ. Cathodic Arc Deposition of Tetrahedral Amorphous Carbon: Influence of Process Parameters on Microstructure and Hardness Mrs Proceedings. 498: 135. DOI: 10.1557/Proc-498-135 |
0.355 |
|
1997 |
Krasnobaev LY, Cuomo JJ. A Reversible Effect of Rapid Thermal Annealing of Indium in Ion Implanted Silicon Mrs Proceedings. 470: 335. DOI: 10.1557/Proc-470-335 |
0.309 |
|
1997 |
Bozeman SP, Camphausen SM, Cuomo JJ, Kim SI, Ahn YO, Ko Y. Electron field emission from amorphous carbon-cesium alloys Journal of Vacuum Science and Technology. 15: 1729-1732. DOI: 10.1116/1.580928 |
0.461 |
|
1997 |
Krasnobaev LY, Cuomo JJ, Vyletalina OI. Harnessing reverse annealing phenomenon for shallow p-n junction formation Journal of Applied Physics. 82: 5185-5190. DOI: 10.1063/1.366323 |
0.323 |
|
1997 |
Ding MQ, Choi WB, Myers AF, Sharma AK, Narayan J, Cuomo JJ, Hren JJ. Field emission enhancement from Mo tip emitters coated with N containing amorphous diamond films Surface & Coatings Technology. 672-675. DOI: 10.1016/S0257-8972(97)00513-6 |
0.465 |
|
1997 |
Rajan K, Roy R, Trogolo J, Cuomo JJ. Low energy ion beam assisted grain size evolution in thin film deposition Journal of Electronic Materials. 26: 1270-1273. DOI: 10.1007/S11664-997-0068-X |
0.442 |
|
1996 |
Choi WB, Myers AF, Cuomo JJ, Hren JJ. Field emission through diamond/Mo interfaces Mrs Proceedings. 448. DOI: 10.1557/Proc-448-339 |
0.324 |
|
1996 |
Choi WB, Liu J, McClure MT, Myers AF, Zhirnov VV, Cuomo JJ, Hren JJ. Field emission from diamond coated molybdenum field emitters Journal of Vacuum Science & Technology B. 14: 2050-2055. DOI: 10.1116/1.588984 |
0.378 |
|
1996 |
Myers AF, Camphausen SM, Cuomo JJ, Hren JJ, Liu J, Bruley J. Characterization of amorphous carbon coated silicon field emitters Journal of Vacuum Science & Technology B. 14: 2024-2029. DOI: 10.1116/1.588978 |
0.366 |
|
1996 |
Liu J, Zhirnov VV, Choi WB, Wojak GJ, Myers AF, Cuomo JJ, Hren JJ. Electron emission from a hydrogenated diamond surface Applied Physics Letters. 69: 4038-4040. DOI: 10.1063/1.117863 |
0.324 |
|
1996 |
Choi WB, Cuomo JJ, Zhirnov VV, Myers AF, Hren JJ. Field emission from silicon and molybdenum tips coated with diamond powder by dielectrophoresis Applied Physics Letters. 68: 720-722. DOI: 10.1063/1.116585 |
0.359 |
|
1996 |
Bozeman SP, Baumann PK, Ward BL, Powers MJ, Cuomo JJ, Nemanich RJ, Dreifus DL. Electron emission measurements from CVD diamond surfaces Diamond and Related Materials. 5: 802-806. DOI: 10.1016/0925-9635(95)00417-3 |
0.404 |
|
1996 |
Zhirnov VV, Choi WB, Cuomo JJ, Hren JJ. Diamond coated Si and Mo field emitters: diamond thickness effect Applied Surface Science. 123-128. DOI: 10.1016/0169-4332(95)00520-X |
0.338 |
|
1995 |
Myers AF, Tucker DA, Bozeman SP, Camphausen SM, Powers MJ, Bruley J, Hren JJ, Cuomo JJ. Deposition And Characterization Of Silicon And Carbon Nitride Mrs Proceedings. 410: 323. DOI: 10.1557/Proc-410-323 |
0.36 |
|
1995 |
Camphausen SM, Tucker DA, Bruley J, Cuomo JJ. Carbon Nitride Films Using a Filtered Cathodic ARC Mrs Proceedings. 388: 287. DOI: 10.1557/Proc-388-287 |
0.483 |
|
1995 |
Tomasino C, Cuomo JJ, Smith CB, Oehrlein G. Plasma Treatments of Textiles Journal of Industrial Textiles. 25: 115-127. DOI: 10.1177/152808379502500204 |
0.356 |
|
1995 |
Lossy R, Pappas DL, Roy RA, Doyle JP, Cuomo JJ, Bruley J. Properties of amorphous diamond films prepared by a filtered cathodic arc Journal of Applied Physics. 77: 4750-4756. DOI: 10.1063/1.359411 |
0.479 |
|
1995 |
Powers MJ, Benjamin MC, Porter LM, Nemanich RJ, Davis RF, Cuomo JJ, Doll GL, Harris SJ. Observation of a negative electron affinity for boron nitride Applied Physics Letters. 67: 3912. DOI: 10.1063/1.115315 |
0.478 |
|
1995 |
Cuomo JJ, Yehoda JE. Solid state ionic polishing of diamond Applied Physics Letters. 66: 1750-1752. DOI: 10.1063/1.113355 |
0.315 |
|
1994 |
Pignolet A, Roy RA, Doyle JP, Cuomo JJ. Model of lead loss in Pb(MgxNb1-x)Oz ion beam sputtered thin films Journal of Vacuum Science and Technology. 12: 2840-2845. DOI: 10.1116/1.578954 |
0.514 |
|
1994 |
Morath CJ, Maris HJ, Cuomo JJ, Pappas DL, Grill A, Patel VV, Doyle JP, Saenger KL. Picosecond optical studies of amorphous diamond and diamondlike carbon: Thermal conductivity and longitudinal sound velocity Journal of Applied Physics. 76: 2636-2640. DOI: 10.1063/1.357560 |
0.405 |
|
1994 |
Trogolo JA, Roy R, Cuomo JJ, Rajan K. Crystallographic evolution of microstructure in thin film processing: part I: grain size distribution Journal of Electronic Materials. 23: 889-892. DOI: 10.1007/Bf02655360 |
0.392 |
|
1993 |
Whitehair SJ, Yehoda JE, Fuentes R, Roy RA, Guarnieri CR, Cuomo JJ. Polycrystalline Diamond Films for X-Ray Lithography Mrs Proceedings. 306: 97. DOI: 10.1557/Proc-306-97 |
0.392 |
|
1993 |
Roy RA, Catania P, Saenger KL, Cuomo JJ, Lossy RL. Role of energetic atoms and ions in Ta films grown by different physical vapor deposition methods Journal of Vacuum Science & Technology B. 11: 1921-1927. DOI: 10.1116/1.586523 |
0.467 |
|
1993 |
Hopwood J, Guarnieri CR, Whitehair SJ, Cuomo JJ. Langmuir probe measurements of a radio frequency induction plasma Journal of Vacuum Science and Technology. 11: 152-156. DOI: 10.1116/1.578282 |
0.346 |
|
1993 |
Catania P, Roy RA, Cuomo JJ. Phase formation and microstructure changes in tantalum thin films induced by bias sputtering Journal of Applied Physics. 74: 1008-1014. DOI: 10.1063/1.354946 |
0.47 |
|
1993 |
Moske MA, Ho PS, Mikalsen DJ, Cuomo JJ, Rosenberg R. Measurement of thermal stress and stress relaxation in confined metal lines. I: Stresses during thermal cycling Journal of Applied Physics. 74: 1716-1724. DOI: 10.1063/1.354826 |
0.303 |
|
1993 |
Krakow W, Rivera NM, Roy RA, Ruoff RS, Cuomo JJ. The growth of crystalline vapor deposited carbon-60 thin films Applied Physics a Solids and Surfaces. 56: 185-192. DOI: 10.1007/Bf00539472 |
0.489 |
|
1992 |
Trogolo JA, Roy RA, Cuomo JJ, Rajan K. Microstructural Evolution and Texture Development in Thin Films Materials Science Forum. 537-542. DOI: 10.4028/Www.Scientific.Net/Msf.94-96.537 |
0.44 |
|
1992 |
Krakow W, Rivera NM, Roy RA, Ruoff RS, Cuomo JJ. Epitaxial growth of C60 thin films on mica Journal of Materials Research. 7: 784-787. DOI: 10.1557/Jmr.1992.0784 |
0.469 |
|
1992 |
Catania P, Doyle JP, Cuomo JJ. Low resistivity body‐centered cubic tantalum thin films as diffusion barriers between copper and silicon Journal of Vacuum Science and Technology. 10: 3318-3321. DOI: 10.1116/1.577818 |
0.462 |
|
1992 |
Cuomo JJ, Pappas DL, Lossy R, Doyle JP, Bruley J, Bello GWD, Krakow W. Energetic carbon deposition at oblique angles Journal of Vacuum Science and Technology. 10: 3414-3418. DOI: 10.1116/1.577794 |
0.466 |
|
1992 |
Pappas DL, Saenger KL, Cuomo JJ, Dreyfus RW. Characterization of laser vaporization plasmas generated for the deposition of diamond-like carbon Journal of Applied Physics. 72: 3966-3970. DOI: 10.1063/1.352249 |
0.405 |
|
1992 |
Pappas DL, Saenger KL, Bruley J, Krakow W, Cuomo JJ, Gu T, Collins RW. Pulsed laser deposition of diamond‐like carbon films Journal of Applied Physics. 71: 5675-5684. DOI: 10.1063/1.350501 |
0.485 |
|
1992 |
Lossy R, Pappas DL, Roy RA, Cuomo JJ, Sura VM. Filtered arc deposition of amorphous diamond Applied Physics Letters. 61: 171-173. DOI: 10.1063/1.108208 |
0.46 |
|
1992 |
Yehoda JE, Fuentes RI, Tsang JC, Whitehair SJ, Guarnieri CR, Cuomo JJ. Enhanced nucleation and growth of diamond on SiC by plasma enhanced chemical vapor deposition using thin metal films Applied Physics Letters. 60: 2865-2867. DOI: 10.1063/1.106826 |
0.461 |
|
1991 |
Narducci D, Guarnieri CR, Cuomo JJ. Defect Clustering and Boron Electrical Deactivation in p‐Doped Polycrystalline Diamond Films Journal of the Electrochemical Society. 138: 2446-2451. DOI: 10.1149/1.2085992 |
0.386 |
|
1991 |
Rossnagel SM, Mikalsen D, Kinoshita H, Cuomo JJ. Collimated magnetron sputter deposition Journal of Vacuum Science and Technology. 9: 261-265. DOI: 10.1116/1.577531 |
0.445 |
|
1991 |
Rossnagel SM, Schatz K, Whitehair SJ, Guarnieri RC, Ruzic DN, Cuomo JJ. The effects of substrate potentials on electron cyclotron resonance plasmas Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 9: 702-706. DOI: 10.1116/1.577347 |
0.328 |
|
1991 |
Cuomo JJ, Doyle JP, Bruley J, Liu JC. Ion‐beam sputtered diamond‐like carbon with densities of 2.9 g/cc Journal of Vacuum Science and Technology. 9: 2210-2215. DOI: 10.1116/1.577252 |
0.46 |
|
1991 |
Pappas DL, Cuomo JJ, Sachdev KG. Studies of adhesion of metal films to polyimide Journal of Vacuum Science and Technology. 9: 2704-2708. DOI: 10.1116/1.577228 |
0.395 |
|
1991 |
Cuomo JJ, Pappas DL, Bruley J, Doyle JP, Saenger KL. Vapor deposition processes for amorphous carbon films with sp3 fractions approaching diamond Journal of Applied Physics. 70: 1706-1711. DOI: 10.1063/1.349540 |
0.51 |
|
1991 |
Cuomo JJ, Doyle JP, Bruley J, Liu JC. Sputter deposition of dense diamond-like carbon films at low temperature Applied Physics Letters. 58: 466-468. DOI: 10.1063/1.104609 |
0.512 |
|
1991 |
Cuomo JJ, Doyle JP, Pappas DL, Saenger KL, Guarnieri CR, Whitehair SJ. High Density Amorphous Carbon Films and the Preparation of Diamond Membranes for X-Ray Lithography Materials Science Monographs. 73: 169-180. DOI: 10.1016/B978-0-444-89162-4.50028-2 |
0.51 |
|
1991 |
Guarnieri CR, d'Heurle FM, Cuomo JJ, Whitehair SJ. Reaction of niobium with diamond films Applied Surface Science. 53: 115-119. DOI: 10.1016/0169-4332(91)90250-N |
0.43 |
|
1991 |
Rossnagel SM, Yang I, Cuomo JJ. Compositional changes during magnetron sputtering of alloys Thin Solid Films. 199: 59-69. DOI: 10.1016/0040-6090(91)90052-Y |
0.398 |
|
1990 |
Moske MA, Ho PS, Mikalsen DJ, Cuomo JJ, Rosenberg R. Measurement of the Triaxial Stress State of Confined Line Structures During Thermal Cycling Mrs Proceedings. 203. DOI: 10.1557/Proc-203-77 |
0.315 |
|
1990 |
Cuomo JJ, Bruley J, Doyle JP, Pappas DL, Saenger KL, Liu JC, Batson PE. The Effects of Substrate Conditions on the Microstructural Evolution of Thin Diamond-Like Films Mrs Proceedings. 202. DOI: 10.1557/Proc-202-247 |
0.495 |
|
1990 |
Trogolo JA, Roy RA, Petkie R, Cuomo JJ, Rajan K. Microstructural Development in Ion Beam Assisted Evaporation of Ni, Co and Fe Films Mrs Proceedings. 202. DOI: 10.1557/Proc-202-187 |
0.481 |
|
1990 |
Roy RA, Etzold KF, Cuomo JJ. Lead Zirconate Titanate Films Produced by ‘Facing Targets’ RF-Sputtering Mrs Proceedings. 200. DOI: 10.1557/Proc-200-77 |
0.45 |
|
1990 |
Etzold KF, Roy RA, Saenger KL, Cuomo JJ. Electrical and Mechanical Properties of PZT Films Mrs Proceedings. 200: 297. DOI: 10.1557/Proc-200-297 |
0.469 |
|
1990 |
Roy RA, Etzold KF, Cuomo JJ. Ferroelectric Film Synthesis, Past and Present: A Select Review Mrs Proceedings. 200: 141. DOI: 10.1557/Proc-200-141 |
0.466 |
|
1990 |
Saenger KL, Roy RA, Etzold KF, Cuomo JJ. Lead Zirconate Titanate Films Produced by Pulsed Laser Deposition Mrs Proceedings. 200. DOI: 10.1557/Proc-200-115 |
0.489 |
|
1990 |
Berry BS, Pritchet WC, Cuomo JJ, Guarnieri CR, Whitehair SJ. Internal stress and elasticity of synthetic diamond films Applied Physics Letters. 57: 302-303. DOI: 10.1063/1.103721 |
0.415 |
|
1990 |
Roy RA, Petkie R, Cuomo JJ, Karasinski J. Material dependence of property modification in ion-assisted evaporation of iron, nickel and cobalt Surface and Coatings Technology. 43: 936-949. DOI: 10.1016/0257-8972(90)90033-9 |
0.425 |
|
1990 |
Doyle JP, Roy RA, Cuomo JJ. The effects of concurrent oxygen ion bombardment on ion beam sputtered Y1Ba2Cu3Ox thin films Thin Solid Films. 193: 832-840. DOI: 10.1016/0040-6090(90)90236-7 |
0.482 |
|
1989 |
Saenger KL, Roy RA, Gupta J, Doyle JP, Cuomo JJ. Laser Interferometric Temperature Measurement of Heated Substrates Used for High Tc Superconductor Deposition Mrs Proceedings. 169. DOI: 10.1557/Proc-169-1161 |
0.312 |
|
1989 |
Narducci D, Cuomo JJ. Electrical Behavior Of Diffused Impurities In Diamond Single-Crystals Mrs Proceedings. 162: 365-369. DOI: 10.1557/Proc-162-365 |
0.354 |
|
1989 |
Narducci D, Cuomo J, Guarnieri C, Whitehair S. Electrical Characterization of Metal Contacts on Diamond Thin Films Mrs Proceedings. 162: 333-339. DOI: 10.1557/Proc-162-333 |
0.413 |
|
1989 |
Russak MA, Rossnagel SM, Cohen SL, McGuire TR, Scilla GJ, Jahnes CV, Baker JM, Cuomo JJ, Hwang C. MnFe and NiFe Thin Films and Magnetic Exchange Bilayers Journal of the Electrochemical Society. 136: 1793-1798. DOI: 10.1149/1.2097014 |
0.383 |
|
1989 |
Marwick AD, Clark GJ, Tu K, Yee DS, Lee C, Singh UN, Doyle J, Cuomo JJ. Annealing of ion implant damage in the high-temperature superconductor YBa2Cu3O7−x Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms. 40: 612-614. DOI: 10.1016/0168-583X(89)91058-6 |
0.303 |
|
1988 |
Roy RA, Yee DS, Cuomo JJ. Control of Metal Film Properties by Ion Assisted Deposition Mrs Proceedings. 128: 23. DOI: 10.1557/Proc-128-23 |
0.462 |
|
1988 |
Mikalsen DJ, Roy RA, Yee DS, Shivashankar SA, Cuomo JJ. Superconducting thin films of the Bi-Sr-Ca-Cu-O system prepared by multilayer metal deposition Journal of Materials Research. 3: 613-618. DOI: 10.1557/Jmr.1988.0613 |
0.386 |
|
1988 |
Guarnieri CR, Ramanathan KV, Yee DS, Cuomo JJ. Improved ion source for use with oxygen Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 6: 2582-2583. DOI: 10.1116/1.575555 |
0.367 |
|
1988 |
Madakson P, Cuomo JJ, Yee DS, Roy RA, Scilla G. Processing of La1.8Sr0.2CuO4 and YBa 2Cu3O7 superconducting thin films by dual-ion-beam sputtering Journal of Applied Physics. 63: 2046-2053. DOI: 10.1063/1.341106 |
0.446 |
|
1988 |
Guarnieri CR, Roy RA, Saenger KL, Shivashankar SA, Yee DS, Cuomo JJ. Thin-film Bi-Sr-Ca-Cu-O high-temperature superconductors using pulsed laser evaporation from sintered disks Applied Physics Letters. 53: 532-533. DOI: 10.1063/1.100627 |
0.434 |
|
1987 |
Rossnagel SM, Russak MA, Cuomo JJ. Pressure and plasma effects on the properties of magnetron sputtered carbon films Journal of Vacuum Science and Technology. 5: 2150-2153. DOI: 10.1116/1.574941 |
0.46 |
|
1987 |
Cuomo JJ, Guarnieri CR, Shivashankar SA, Roy RA, Yee DS, Rosenberg R, Dicicco RL. LARGE AREA PLASMA SPRAY DEPOSITED SUPERCONDUCTING YBa2Cu3O7 THICK FILMS Advanced Ceramic Materials. 2: 422-429. DOI: 10.1111/J.1551-2916.1987.Tb00106.X |
0.49 |
|
1987 |
Scheuermann M, Chi CC, Tsuei CC, Yee DS, Cuomo JJ, Laibowitz RB, Koch RH, Braren B, Srinivasan R, Plechaty MM. Magnetron sputtering and laser patterning of high transition temperature Cu oxide films Applied Physics Letters. 51: 1951-1953. DOI: 10.1063/1.98986 |
0.475 |
|
1987 |
Cuomo JJ, Rossnagel SM. Property modification and synthesis by low energy particle bombardment concurrent with film growth Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms. 19: 963-974. DOI: 10.1016/S0168-583X(87)80194-5 |
0.492 |
|
1987 |
Vechten JAV, Solberg W, Batson P, Cuomo JJ, Rossnagel SM. Kink site saturation mechanism for whisker growth under sputtering conditions Journal of Crystal Growth. 82: 289-294. DOI: 10.1016/0022-0248(87)90316-2 |
0.355 |
|
1986 |
Yu LS, Harper JME, Cuomo JJ, Smith DA. Control of thin film orientation by glancing angle ion bombardment during growth Journal of Vacuum Science and Technology. 4: 443-447. DOI: 10.1116/1.573902 |
0.449 |
|
1985 |
Harper JME, Smith DA, Yu LS, Cuomo JJ. Microstructure of Niobium Films Oriented By Non-Normal Incidence Ion Bombardment During Growth Mrs Proceedings. 51: 343. DOI: 10.1557/Proc-51-343 |
0.434 |
|
1985 |
Yee DS, Floro J, Mikalsen DJ, Cuomo JJ, Ahn KY, Smith DA. Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation Journal of Vacuum Science and Technology. 3: 2121-2128. DOI: 10.1116/1.573265 |
0.398 |
|
1985 |
Yu LS, Harper JME, Cuomo JJ, Smith DA. Alignment of thin films by glancing angle ion bombardment during deposition Applied Physics Letters. 47: 932-933. DOI: 10.1063/1.95931 |
0.459 |
|
1985 |
Kelly R, Cuomo JJ, Leary PA, Rothenberg JE, Braren BE, Aliotta CF. Laser sputtering: Part I. On the existence of rapid laser sputtering at 193 nm Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms. 9: 329-340. DOI: 10.1016/0168-583X(85)90760-8 |
0.342 |
|
1985 |
Harper JME, Cuomo JJ, Gambino RJ, Kaufman HR. Modification of thin film properties by ion bombardment during deposition Nuclear Inst. and Methods in Physics Research, B. 7: 886-892. DOI: 10.1016/0168-583X(85)90489-6 |
0.443 |
|
1984 |
Oelhafen P, Freeouf JL, Harper JME, Cuomo JJ. Electron spectroscopy study of hydrogenated amorphous carbon films formed by methane ion beam deposition Thin Solid Films. 120: 231-238. DOI: 10.1016/0040-6090(84)90299-2 |
0.44 |
|
1983 |
Krusin-Elbaum L, Wittmer M, Ting C-, Cuomo JJ. ZrN diffusion barrier in aluminum metallization schemes Thin Solid Films. 104: 81-87. DOI: 10.1016/0040-6090(83)90550-3 |
0.374 |
|
1982 |
Krusin-Elbaum L, Wittmer M, Ting C-, Cuomo JJ. ZrN Diffusion Barrier in Aluminum Metallization Schemes Mrs Proceedings. 18: 81. DOI: 10.1557/Proc-18-81 |
0.379 |
|
1982 |
Speidell JL, Harper JME, Cuomo JJ, Kleinsasser AW, Kaufman HR, Tuttle AH. FABRICATION AND USE OF SILICON AND GALLIUM ARSENIDE ION SOURCE EXTRACTION GRIDS Journal of Vacuum Science &Amp; Technology. 21: 824-827. DOI: 10.1116/1.571830 |
0.311 |
|
1982 |
Kaufman HR, Harper JME, Cuomo JJ. DEVELOPMENTS IN BROAD-BEAM, ION-SOURCE TECHNOLOGY AND APPLICATIONS Journal of Vacuum Science &Amp; Technology. 21: 764-767. DOI: 10.1116/1.571822 |
0.39 |
|
1982 |
Harper JME, Cuomo JJ, Kaufman HR. TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING - 2. APPLICATIONS Journal of Vacuum Science &Amp; Technology. 21: 737-756. DOI: 10.1116/1.571820 |
0.372 |
|
1982 |
Kaufman HR, Cuomo JJ, Harper JME. TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING - 1. ION SOURCE TECHNOLOGY Journal of Vacuum Science &Amp; Technology. 21: 725-736. DOI: 10.1116/1.571819 |
0.312 |
|
1982 |
Cuomo JJ, Harper JME, Guarnieri CR, Yee DS, Attanasio LJ, Angilello J, Wu CT, Hammond RH. Modification of niobium film stress by low‐energy ion bombardment during deposition Journal of Vacuum Science and Technology. 20: 349-354. DOI: 10.1116/1.571462 |
0.476 |
|
1982 |
Kleinsasser AW, Harper JME, Cuomo JJ, Heiblum M. Oxidation processes using ion beams Thin Solid Films. 95: 333-342. DOI: 10.1016/0040-6090(82)90039-6 |
0.369 |
|
1981 |
Harper JME, Cuomo JJ, Gambino RJ, Kaufman HR, Robinson RS. Erratum: Mean free path of negative ions in diode sputtering [J.Vac.Sci. Technol. 15, 1597 (1978)] Journal of Vacuum Science and Technology. 18: 112-112. DOI: 10.1116/1.570687 |
0.317 |
|
1981 |
Harper JME, Heiblum M, Speidell JL, Cuomo JJ. Ion beam oxidation Journal of Applied Physics. 52: 4118-4121. DOI: 10.1063/1.329220 |
0.323 |
|
1980 |
Harper JME, Cuomo JJ, Leary PA, Summa GM, Kaufman HR, Bresnock FJ. LOW ENERGY ION BEAM ETCHING Proceedings - the Electrochemical Society. 80: 518-530. DOI: 10.1149/1.2127554 |
0.334 |
|
1979 |
Kaufman HR, Harper JME, Cuomo JJ. FOCUSED ION BEAM DESIGNS FOR SPUTTER DEPOSITION Journal of Vacuum Science &Amp; Technology. 16: 899-905. DOI: 10.1116/1.570110 |
0.374 |
|
1979 |
Cuomo JJ, Leary PA, Yu D, Reuter W, Frisch M. Reactive sputtering of carbon and carbide targets in nitrogen Journal of Vacuum Science and Technology. 16: 299-302. DOI: 10.1116/1.569931 |
0.496 |
|
1979 |
Molzen WW, Broers AN, Cuomo JJ, Harper JME, Laibowitz RB. Materials and techniques used in nanostructure fabrication Journal of Vacuum Science and Technology. 16: 269-272. DOI: 10.1116/1.569924 |
0.374 |
|
1979 |
Kaufman HR, Harper JME, Cuomo JJ. Abstract: Focused ion beam designs for sputter deposition Journal of Vacuum Science and Technology. 16: 179-180. DOI: 10.1116/1.569900 |
0.367 |
|
1978 |
Harper JME, Cuomo JJ, Gambino RJ, Kaufman HR, Robinson RS. Mean free path of negative ions in diode sputtering Journal of Vacuum Science and Technology. 15: 1597-1600. DOI: 10.1116/1.569816 |
0.361 |
|
1978 |
Cuomo JJ, Gambino RJ, Harper JME, Kuptsis JD, Webber JC. Significance of negative ion formation in sputtering and SIMS analysis Journal of Vacuum Science and Technology. 15: 281-287. DOI: 10.1116/1.569571 |
0.39 |
|
1978 |
Kobliska RJ, Aboaf JA, Gangulee A, Cuomo JJ, Klokholm E. Amorphous ferromagnetic thin films Applied Physics Letters. 33: 473-475. DOI: 10.1063/1.90384 |
0.467 |
|
1977 |
Cuomo JJ, Gambino RJ, Harper JME, Kuptsis JD. Origin and Effects of Negative Ions in the Sputtering of Intermetallic Compounds Ibm Journal of Research and Development. 21: 580-583. DOI: 10.1147/Rd.216.0580 |
0.435 |
|
1976 |
Dove DB, Gambino RJ, Cuomo JJ, Kobliska RJ. Steady‐state mass balance approach to substrate biased rf sputtering Journal of Vacuum Science and Technology. 13: 965-968. DOI: 10.1116/1.569030 |
0.45 |
|
1976 |
Dove DB, Gambino RJ, Cuomo JJ, Kobliska RJ. Abstract: Steady state mass‐balance analysis of substrate‐biased rf sputtering Journal of Vacuum Science and Technology. 13: 176-176. DOI: 10.1116/1.568819 |
0.474 |
|
1976 |
Broers AN, Molzen WW, Cuomo JJ, Wittels ND. Electron‐beam fabrication of 80‐Å metal structures Applied Physics Letters. 29: 596-598. DOI: 10.1063/1.89155 |
0.417 |
|
1974 |
Cuomo JJ, Gambino RJ, Rosenberg R. The influence of bias on the depostion of metallic films in rf and dc sputtering Journal of Vacuum Science and Technology. 11: 34-40. DOI: 10.1116/1.1318617 |
0.436 |
|
1974 |
Gambino RJ, Chaudhari P, Cuomo JJ. Amorphous Magnetic Materials Magnetism and Magnetic Materials. 18: 578-592. DOI: 10.1063/1.3141775 |
0.31 |
|
1974 |
Hasegawa R, Gambino RJ, Cuomo JJ, Ziegler JF. Effect of thermal annealing and ion radiation on the coercivity of amorphous GdSingle Bond signCo films Journal of Applied Physics. 45: 4036-4040. DOI: 10.1063/1.1663908 |
0.487 |
|
1974 |
Gambino RJ, Ziegler J, Cuomo JJ. Effects of ion radiation damage on the magnetic domain structure of amorphous Gd–Co alloys Applied Physics Letters. 24: 99-101. DOI: 10.1063/1.1655111 |
0.347 |
|
1974 |
Cuomo JJ, Chaudhari P, Gambino RJ. Amorphous magnetic materials for bubble domain and magneto-optics application Journal of Electronic Materials. 3: 517-529. DOI: 10.1007/Bf02652955 |
0.317 |
|
1973 |
Chaudhari P, Cuomo JJ, Gambino RJ. Amorphous metallic films for bubble domain applications Ibm Journal of Research and Development. 17: 66-68. DOI: 10.1147/Rd.171.0066 |
0.389 |
|
1973 |
Chaudhari P, Cuomo JJ, Gambino RJ. Amorphous metallic films for magneto-optic applications Applied Physics Letters. 22: 337-339. DOI: 10.1063/1.1654662 |
0.458 |
|
1972 |
Mayadas AF, Laibowitz RB, Cuomo JJ. ELECTRICAL CHARACTERISTICS OF rf-SPUTTERED SINGLE-CRYSTAL NIOBIUM FILMS. Journal of Applied Physics. 43: 1287-1289. DOI: 10.1063/1.1661258 |
0.442 |
|
1972 |
Cuomo JJ, Sadagopan V, DeLuca J, Chaudhari P, Rosenberg R. Growth of uniaxial magnetic garnet films by rf sputtering Applied Physics Letters. 21: 581-584. DOI: 10.1063/1.1654264 |
0.44 |
|
1969 |
Mayadas AF, Cuomo JJ, Rosenberg R. ELECTRICAL RESISTIVITY OF TUNGSTEN FILMS PREPARED BY WF$sub 6$ REDUCTION. Journal of the Electrochemical Society. 116: 1742-1745. DOI: 10.1149/1.2411692 |
0.394 |
|
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