| Year |
Citation |
Score |
| 2007 |
Pawloski AR, McGall G, Kuimelis RG, Barone D, Cuppoletti A, Ciccolella P, Spence E, Afroz F, Bury P, Chen C, Pao D, Le M, McGee B, Harkins E, Savage M, et al. Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2537-2546. DOI: 10.1116/1.2794325 |
0.328 |
|
| 2006 |
Naulleau PP, Rammeloo C, Cain JP, Dean K, Denham P, Goldberg KA, Hoef B, La Fontaine B, Pawloski AR, Larson C, Wallraff G. Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists Proceedings of Spie - the International Society For Optical Engineering. 6151. DOI: 10.1117/12.657005 |
0.328 |
|
| 2006 |
Pawloski AR, Acheta A, Levinson HJ, Michaelson TB, Jamieson A, Nishimura Y, Grant Willson C. Line edge roughness and intrinsic bias for two methacrylate polymer resist systems Journal of Microlithography, Microfabrication and Microsystems. 5. DOI: 10.1117/1.2200675 |
0.503 |
|
| 2004 |
Pawloski AR, Nealey PF. Useful protocol for evaluating subtle and important differences between photoresist formulations Journal of Vacuum Science & Technology B. 22: 869-874. DOI: 10.1116/1.1695337 |
0.614 |
|
| 2004 |
Leeson MJ, Yueh W, Tattersall PI, Pawloski A, Grayson SM, Willson CG. Synthesis and Reactivity of 3-Diazo-4-oxocoumarins for Photolithographic Applications Chemistry of Materials. 16: 1763-1769. DOI: 10.1021/Cm0346374 |
0.313 |
|
| 2002 |
Pawloski AR, Nealey PF. Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2413-2420. DOI: 10.1116/1.1525811 |
0.629 |
|
| 2002 |
Pawloski AR, Christian, Nealey PF. Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2162-2168. DOI: 10.1116/1.1511217 |
0.636 |
|
| 2002 |
Pawloski AR, Christian, Nealey PF. The multifunctional role of base quenchers in chemically amplified photoresists Chemistry of Materials. 14: 4192-4201. DOI: 10.1021/Cm0200947 |
0.635 |
|
| 2002 |
Pawloski AR, Nealey PF, Conley W. Efficiency of photoacid generators in chemically amplified resists for 157nm lithography Journal of Photopolymer Science and Technology. 15: 731-739. |
0.448 |
|
| 2001 |
Pawloski AR, Christian, Nealey PF. A standard addition technique to quantify photoacid generation in chemically amplified photoresist Chemistry of Materials. 13: 4154-4162. DOI: 10.1021/Cm010529A |
0.593 |
|
| 1999 |
Pawloski AR, Torres JA, Nealey PF, Pablo JJd. Applications of molecular modeling in nanolithography Journal of Vacuum Science & Technology B. 17: 3371-3378. DOI: 10.1116/1.591013 |
0.51 |
|
| 1999 |
Szmanda CR, Brainard RL, Mackevich JF, Awaji A, Tanaka T, Yamada Y, Bohland J, Tedesco S, Dal'Zotto B, Bruenger W, Torkler M, Fallmann W, Loeschner H, Kaesmaier R, Nealey PM, ... Pawloski AR, et al. Measuring acid generation efficiency in chemically amplified resists with all three beams Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 3356-3361. |
0.366 |
|
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