☰

Karl O. Stuen, Ph.D. - Publications

Affiliations: 
University of Wisconsin, Madison, Madison, WI 
Tree Info Similar researchers PubMed Report error

14 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Farrell RA, Kinahan NT, Hansel S, Stuen KO, Petkov N, Shaw MT, West LE, Djara V, Dunne RJ, Varona OG, Gleeson PG, Jung SJ, Kim HY, Koleśnik MM, Lutz T, et al. Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly. Nanoscale. 4: 3228-36. PMID 22481430 DOI: 10.1039/C2Nr00018K  0.562
2011 Päivänranta B, Sahoo PK, Tocce E, Auzelyte V, Ekinci Y, Solak HH, Liu CC, Stuen KO, Nealey PF, David C. Nanofabrication of broad-band antireflective surfaces using self-assembly of block copolymers. Acs Nano. 5: 1860-4. PMID 21323325 DOI: 10.1021/Nn103361D  0.735
2010 Stuen KO, Detcheverry FA, Craig GS, Thomas CS, Farrell RA, Morris MA, de Pablo JJ, Nealey PF. Graphoepitaxial assembly of asymmetric ternary blends of block copolymers and homopolymers. Nanotechnology. 21: 495301. PMID 21071827 DOI: 10.1088/0957-4484/21/49/495301  0.651
2010 Kang H, Stuen KO, Nealey PF. Directed assembly of cylinder-forming ternary blend of block copolymer and their respective homopolymers on chemical patterns with density multiplication of features Journal of Photopolymer Science and Technology. 23: 297-299. DOI: 10.2494/Photopolymer.23.297  0.635
2010 Liu G, Delcambre SP, Stuen KO, Craig GSW, De Pablo JJ, Nealey PF, Nygrd K, Satapathy DK, Bunk O, Solak HH. Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6B14-C6B19. DOI: 10.1116/1.3518918  0.709
2010 Kang H, Detcheverry F, Stuen KO, Craig GSW, De Pablo JJ, Gopalan P, Nealey PF. Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6B24-C6B29. DOI: 10.1116/1.3518910  0.7
2009 Liu G, Ji S, Stuen KO, Craig GSW, Nealey PF, Himpsel FJ. Modification of a polystyrene brush layer by insertion of poly(methyl methacrylate) molecules Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3038-3042. DOI: 10.1116/1.3253607  0.704
2009 Stuen KO, Thomas CS, Liu G, Ferrier N, Nealey PF. Dimensional scaling of cylinders in thin films of block copolymer-Homopolymer ternary blends Macromolecules. 42: 5139-5145. DOI: 10.1021/Ma900520V  0.715
2009 Han E, Stuen KO, Leolukman M, Liu CC, Nealey PF, Gopalan P. Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions Macromolecules. 42: 4896-4901. DOI: 10.1021/Ma9002903  0.742
2009 Liu G, Stoykovich MP, Ji S, Stuen KO, Craig GSW, Nealey PF. Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films Macromolecules. 42: 3063-3072. DOI: 10.1021/Ma802773H  0.769
2008 Stuen KO, Liu C, Welander AM, Liu G, De Pablo JJ, Nealey PF, Satapathy DK, Nygrd K, Bunk O, Solak HH, Van Der Veen JF. In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved small angle x-ray scattering Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2504-2508. DOI: 10.1116/1.2991977  0.687
2008 Han E, Stuen KO, La YH, Nealey PF, Gopalan P. Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains Macromolecules. 41: 9090-9097. DOI: 10.1021/Ma8018393  0.683
2008 Welander AM, Kang H, Stuen KO, Solak HH, Müller M, De Pablo JJ, Nealey PF. Rapid directed assembly of block copolymer films at elevated temperatures Macromolecules. 41: 2759-2761. DOI: 10.1021/Ma800056S  0.703
2007 Stuen KO, In I, Han E, Streifer JA, Hamers RJ, Nealey PF, Gopalan P. Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1958-1962. DOI: 10.1116/1.2799970  0.668
Show low-probability matches.