Benjamen M. Rathsack, Ph.D. - Publications

Affiliations: 
2001 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials

29/30 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2015 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Kawakami S, Muramatsu M, Iijima E, Rastogi V, Nakano T, Iwao F, Nagahara S, Iwaki H, Dojun M, Yatsuda K, ... ... Rathsack B, et al. Driving DSA into volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085776  0.92
2015 Peters BL, Rathsack B, Somervell M, Nakano T, Schmid G, De Pablo JJ. Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes Journal of Polymer Science, Part B: Polymer Physics. 53: 430-441. DOI: 10.1002/polb.23652  0.92
2014 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Iijima E, Nakano T, Ishiguro T, Nagahara S, Iwaki H, Dojun M, Ozawa M, Yatsuda K, Tobana T, Romo Negreira A, ... ... Rathsack B, et al. High-volume manufacturing equipment and processing for directed self-assembly applications Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2045975  0.92
2014 Torres JA, Sakajiri K, Fryer D, Granik Y, Ma Y, Krasnova P, Fenger G, Nagahara S, Kawakami S, Rathsack B, Khaira G, De Pablo J, Ryckaert J. Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2045328  0.92
2013 Rathsack B, Somervell M, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Iwaki H, Akai K, Ozawa M, Negreira AR, Tahara S, Nafus K. Advances in directed self assembly integration and manufacturability at 300 mm Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012018  0.92
2013 Schmid G, Farrell R, Xu J, Park C, Preil M, Chakrapani V, Mohanty N, Ko A, Cicoria M, Hetzer D, Somervell M, Rathsack B. Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011607  0.92
2013 Harukawa R, Aoki M, Cross A, Nagaswami V, Tomita T, Nagahara S, Muramatsu M, Kawakami S, Kosugi H, Rathsack B, Kitano T, Sweis J, Mokhberi A. DSA hole defectivity analysis using advanced optical inspection tool Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2011177  0.92
2012 Somervell M, Gronheid R, Hooge J, Nafus K, Delgadillo PR, Thode C, Younkin T, Matsunaga K, Rathsack B, Scheer S, Nealey P. Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916406  0.92
2012 Rathsack B, Somervell M, Hooge J, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Hiroyuki I, Akai K, Hayakawa T. Pattern scaling with directed self assembly through lithography and etch process integration Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916311  0.92
2011 Gronheid R, Pret AV, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist Journal of Micro/Nanolithography, Mems, and Moems. 10. DOI: 10.1117/1.3555090  0.92
2010 Gronheid R, Vaglio Pret A, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. EUV RLS performance tradeoffs for a polymer bound PAG resist Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.847489  0.92
2010 Kondo Y, Ookouchi A, Tsuruda T, Yamamoto M, Saito T, Shibata T, Shimura S, Iwao F, Rathsack B, Carcasi M. The optimizations of resist shrink process using track-based technology Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846497  0.92
2009 Gronheid R, Rathsack B, Bernard S, Pret AV, Nafus K, Hatakeyama S. Effect of PAG distribution on ArF and EUV resist performance Journal of Photopolymer Science and Technology. 22: 97-104. DOI: 10.2494/photopolymer.22.97  0.92
2009 Rathsack B, Nafus K, Hatakeyama S, Kuwahara Y, Kitano J, Gronheid R, Pret AV. Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814287  0.92
2008 Rathsack BM, Scheer S, Kuwahara Y, Kitano J, Gronheid R, Baerts C. Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772850  0.92
2008 Rathsack B, Hooge J, Scheer S, Nafus K, Hatakeyama S, Kouichi H, Kitano J, Van Den Heuvel D, Leray P, Hendrickx E, Foubert P, Gronheid R. Image contrast contributions to immersion lithography defect formation and process yield Proceedings of Spie - the International Society For Optical Engineering. 6924. DOI: 10.1117/12.772728  0.92
2004 Meiring JE, Schmid MJ, Grayson SM, Rathsack BM, Johnson DM, Kirby R, Kannappan R, Manthiram K, Hsia B, Hogan ZL, Ellington AD, Pishko MV, Willson CG. Hydrogel biosensor array platform indexed by shape Chemistry of Materials. 16: 5574-5580. DOI: 10.1021/cm049488j  0.92
2004 Tattersall PI, Breslin D, Grayson SM, Heath WH, Lou K, McAdams CL, McKean D, Rathsack BM, Willson CG. Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists Chemistry of Materials. 16: 1770-1774. DOI: 10.1021/cm034638w  0.92
2002 Mark Ma Z, Kim W, Rathsack B, Xing G, Somervell M, Hong H. CD variations from non-trivial mask related factors Proceedings of Spie - the International Society For Optical Engineering. 4754: 677-683. DOI: 10.1117/12.476928  0.92
2002 Kim WD, Rathsack BM. Aerial image degradation effects due to imperfect sidewall-profiles of EAPSM mask for 130 nm-device node: 3D EMF simulations and wafer printing results Proceedings of Spie - the International Society For Optical Engineering. 4691: 268-279. DOI: 10.1117/12.474576  0.92
2001 Rathsack BM, Tattersall PI, Tabery CE, Lou K, Stachowiak TB, Medeiros DR, Albelo JA, Pirogovsky PY, McKean DR, Willson CG. The rational design of bleachable non-chemically amplified DUV photoactive compounds Proceedings of Spie - the International Society For Optical Engineering. 4345: 543-556. DOI: 10.1117/12.436887  0.92
2001 Rathsack BM, Tabery CE, Albelo JA, Buck PD, Willson CG. Characterization of an acetal based chemically amplified resist for 257 nm laser mask fabrication Proceedings of Spie - the International Society For Optical Engineering. 4186: 578-588. DOI: 10.1117/12.410739  0.92
2001 Albelo JA, Rathsack BM, Pirogovsky PY. Process development for 257 nm photomask fabrication using environmentally stable chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 4186: 73-84. DOI: 10.1117/12.410734  0.92
2000 Rathsack BM, Tabery CE, Stachowiak TB, Albelo J, Willson CG. Simulation based formulation of a non-chemically amplified resist for 257 nm laser mask fabrication Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  0.92
1999 Rathsack BM, Tabery CE, Stachowiak TB, Dallas T, Xu CB, Pochkowski M, Willson CG. Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator Proceedings of Spie - the International Society For Optical Engineering. 3873: 80-92.  0.92
1999 Rathsack BM, Tabery CE, Philbin C, Willson CG. Lithography simulation of sub-0.30 micron resist features for photomask fabrication using I-line optical pattern generators Proceedings of Spie - the International Society For Optical Engineering. 3873: 484-492.  0.92
1999 Rathsack BM, Tabery CE, Scheer SA, Pochkowski M, Philbin C, Kalk F, Henderson CL, Buck PD, Willson CG. Optical lithography simulation and photoresist optimization for photomask fabrication Proceedings of Spie - the International Society For Optical Engineering. 3678: 1215-1226.  0.92
1998 Henderson CL, Scheer SA, Tsiartas PC, Rathsack BM, Sagan JP, Dammel RR, Erdmann A, Willson CG. Modeling parameter extraction for DNQ-novolak thick film resists Proceedings of Spie - the International Society For Optical Engineering. 3333: 256-267. DOI: 10.1117/12.312415  0.92
1998 Dammel RR, Sagan JP, Kokinda E, Eilbeck N, Mack CA, Arthur GG, Henderson CL, Scheer SA, Rathsack BM, Willson CG. Improved simulation of photoresists using new development models Proceedings of Spie - the International Society For Optical Engineering. 3333: 401-416. DOI: 10.1117/12.312399  0.92
Low-probability matches
2005 Rathsack BM, Bushman SG, Celii FG, Ayres SF, Kris R. Inline sidewall angle monitoring of memory capacitor profiles Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5752: 1237-1247. DOI: 10.1117/12.600750  0.01
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