Year |
Citation |
Score |
2015 |
Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Kawakami S, Muramatsu M, Iijima E, Rastogi V, Nakano T, Iwao F, Nagahara S, Iwaki H, Dojun M, Yatsuda K, ... ... Rathsack B, et al. Driving DSA into volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085776 |
0.691 |
|
2015 |
Peters BL, Rathsack B, Somervell M, Nakano T, Schmid G, De Pablo JJ. Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes Journal of Polymer Science, Part B: Polymer Physics. 53: 430-441. DOI: 10.1002/Polb.23652 |
0.697 |
|
2014 |
Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Iijima E, Nakano T, Ishiguro T, Nagahara S, Iwaki H, Dojun M, Ozawa M, Yatsuda K, Tobana T, Romo Negreira A, ... ... Rathsack B, et al. High-volume manufacturing equipment and processing for directed self-assembly applications Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2045975 |
0.695 |
|
2013 |
Rathsack B, Somervell M, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Iwaki H, Akai K, Ozawa M, Negreira AR, Tahara S, Nafus K. Advances in directed self assembly integration and manufacturability at 300 mm Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012018 |
0.686 |
|
2013 |
Schmid G, Farrell R, Xu J, Park C, Preil M, Chakrapani V, Mohanty N, Ko A, Cicoria M, Hetzer D, Somervell M, Rathsack B. Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011607 |
0.721 |
|
2013 |
Harukawa R, Aoki M, Cross A, Nagaswami V, Tomita T, Nagahara S, Muramatsu M, Kawakami S, Kosugi H, Rathsack B, Kitano T, Sweis J, Mokhberi A. DSA hole defectivity analysis using advanced optical inspection tool Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2011177 |
0.39 |
|
2012 |
Somervell M, Gronheid R, Hooge J, Nafus K, Delgadillo PR, Thode C, Younkin T, Matsunaga K, Rathsack B, Scheer S, Nealey P. Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916406 |
0.673 |
|
2012 |
Rathsack B, Somervell M, Hooge J, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Hiroyuki I, Akai K, Hayakawa T. Pattern scaling with directed self assembly through lithography and etch process integration Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916311 |
0.703 |
|
2011 |
Gronheid R, Pret AV, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist Journal of Micro/Nanolithography, Mems, and Moems. 10. DOI: 10.1117/1.3555090 |
0.369 |
|
2010 |
Gronheid R, Vaglio Pret A, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. EUV RLS performance tradeoffs for a polymer bound PAG resist Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.847489 |
0.37 |
|
2004 |
Meiring JE, Schmid MJ, Grayson SM, Rathsack BM, Johnson DM, Kirby R, Kannappan R, Manthiram K, Hsia B, Hogan ZL, Ellington AD, Pishko MV, Willson CG. Hydrogel biosensor array platform indexed by shape Chemistry of Materials. 16: 5574-5580. DOI: 10.1021/Cm049488J |
0.694 |
|
2004 |
Tattersall PI, Breslin D, Grayson SM, Heath WH, Lou K, McAdams CL, McKean D, Rathsack BM, Willson CG. Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists Chemistry of Materials. 16: 1770-1774. DOI: 10.1021/Cm034638W |
0.585 |
|
2002 |
Mark Ma Z, Kim W, Rathsack B, Xing G, Somervell M, Hong H. CD variations from non-trivial mask related factors Proceedings of Spie - the International Society For Optical Engineering. 4754: 677-683. DOI: 10.1117/12.476928 |
0.616 |
|
2001 |
Albelo JA, Rathsack BM, Pirogovsky PY. Process development for 257 nm photomask fabrication using environmentally stable chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 4186: 73-84. DOI: 10.1117/12.410734 |
0.305 |
|
1998 |
Henderson CL, Scheer SA, Tsiartas PC, Rathsack BM, Sagan JP, Dammel RR, Erdmann A, Willson CG. Modeling parameter extraction for DNQ-novolak thick film resists Proceedings of Spie - the International Society For Optical Engineering. 3333: 256-267. DOI: 10.1117/12.312415 |
0.451 |
|
1998 |
Dammel RR, Sagan JP, Kokinda E, Eilbeck N, Mack CA, Arthur GG, Henderson CL, Scheer SA, Rathsack BM, Willson CG. Improved simulation of photoresists using new development models Proceedings of Spie - the International Society For Optical Engineering. 3333: 401-416. DOI: 10.1117/12.312399 |
0.439 |
|
Low-probability matches (unlikely to be authored by this person) |
2002 |
Kim WD, Rathsack BM. Aerial image degradation effects due to imperfect sidewall-profiles of EAPSM mask for 130 nm-device node: 3D EMF simulations and wafer printing results Proceedings of Spie - the International Society For Optical Engineering. 4691: 268-279. DOI: 10.1117/12.474576 |
0.26 |
|
1999 |
Rathsack BM, Tabery CE, Stachowiak TB, Dallas T, Xu CB, Pochkowski M, Willson CG. Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator Proceedings of Spie - the International Society For Optical Engineering. 3873: 80-92. |
0.239 |
|
1999 |
Rathsack BM, Tabery CE, Philbin C, Willson CG. Lithography simulation of sub-0.30 micron resist features for photomask fabrication using I-line optical pattern generators Proceedings of Spie - the International Society For Optical Engineering. 3873: 484-492. |
0.233 |
|
1999 |
Rathsack BM, Tabery CE, Scheer SA, Pochkowski M, Philbin C, Kalk F, Henderson CL, Buck PD, Willson CG. Optical lithography simulation and photoresist optimization for photomask fabrication Proceedings of Spie - the International Society For Optical Engineering. 3678: 1215-1226. |
0.227 |
|
2000 |
Rathsack BM, Tabery CE, Stachowiak TB, Albelo J, Willson CG. Simulation based formulation of a non-chemically amplified resist for 257 nm laser mask fabrication Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-. |
0.192 |
|
2008 |
Rathsack B, Hooge J, Scheer S, Nafus K, Hatakeyama S, Kouichi H, Kitano J, Van Den Heuvel D, Leray P, Hendrickx E, Foubert P, Gronheid R. Image contrast contributions to immersion lithography defect formation and process yield Proceedings of Spie - the International Society For Optical Engineering. 6924. DOI: 10.1117/12.772728 |
0.188 |
|
2009 |
Gronheid R, Rathsack B, Bernard S, Pret AV, Nafus K, Hatakeyama S. Effect of PAG distribution on ArF and EUV resist performance Journal of Photopolymer Science and Technology. 22: 97-104. DOI: 10.2494/photopolymer.22.97 |
0.184 |
|
2001 |
Rathsack BM, Tabery CE, Albelo JA, Buck PD, Willson CG. Characterization of an acetal based chemically amplified resist for 257 nm laser mask fabrication Proceedings of Spie - the International Society For Optical Engineering. 4186: 578-588. DOI: 10.1117/12.410739 |
0.184 |
|
2005 |
Rathsack BM, Bushman SG, Celii FG, Ayres SF, Kris R. Inline sidewall angle monitoring of memory capacitor profiles Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5752: 1237-1247. DOI: 10.1117/12.600750 |
0.177 |
|
2010 |
Kondo Y, Ookouchi A, Tsuruda T, Yamamoto M, Saito T, Shibata T, Shimura S, Iwao F, Rathsack B, Carcasi M. The optimizations of resist shrink process using track-based technology Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846497 |
0.151 |
|
2008 |
Rathsack BM, Scheer S, Kuwahara Y, Kitano J, Gronheid R, Baerts C. Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772850 |
0.148 |
|
2014 |
Torres JA, Sakajiri K, Fryer D, Granik Y, Ma Y, Krasnova P, Fenger G, Nagahara S, Kawakami S, Rathsack B, Khaira G, De Pablo J, Ryckaert J. Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes Proceedings of Spie - the International Society For Optical Engineering. 9053. DOI: 10.1117/12.2045328 |
0.12 |
|
2009 |
Rathsack B, Nafus K, Hatakeyama S, Kuwahara Y, Kitano J, Gronheid R, Pret AV. Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814287 |
0.117 |
|
2001 |
Rathsack BM, Tattersall PI, Tabery CE, Lou K, Stachowiak TB, Medeiros DR, Albelo JA, Pirogovsky PY, McKean DR, Willson CG. The rational design of bleachable non-chemically amplified DUV photoactive compounds Proceedings of Spie - the International Society For Optical Engineering. 4345: 543-556. DOI: 10.1117/12.436887 |
0.066 |
|
Hide low-probability matches. |