Scott W. Schmucker, Ph.D. - Publications

2012 University of Illinois, Urbana-Champaign, Urbana-Champaign, IL 
scanning tunneling microscopy, nanofabrication, nanoelectronics, and IC chip reliability

16 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Cress CD, Schmucker SW, Friedman AL, Dev P, Culbertson JC, Lyding JW, Robinson JT. Nitrogen-Doped Graphene and Twisted Bilayer Graphene via Hyperthermal Ion Implantation with Depth Control. Acs Nano. PMID 26910346 DOI: 10.1021/Acsnano.6B00252  0.68
2016 Arnold HN, Cress CD, McMorrow JJ, Schmucker SW, Sangwan VK, Jaber-Ansari L, Kumar R, Puntambekar KP, Luck KA, Marks TJ, Hersam MC. Tunable Radiation Response in Hybrid Organic-Inorganic Gate Dielectrics for Low-Voltage Graphene Electronics. Acs Applied Materials & Interfaces. PMID 26882215 DOI: 10.1021/Acsami.5B12259  0.68
2016 Friedman AL, Cress CD, Schmucker SW, Robinson JT, Van'T Erve OMJ. Electronic transport and localization in nitrogen-doped graphene devices using hyperthermal ion implantation Physical Review B - Condensed Matter and Materials Physics. 93. DOI: 10.1103/Physrevb.93.161409  0.68
2016 Arnold HN, Sangwan VK, Schmucker SW, Cress CD, Luck KA, Friedman AL, Robinson JT, Marks TJ, Hersam MC. Reducing flicker noise in chemical vapor deposition graphene field-effect transistors Applied Physics Letters. 108. DOI: 10.1063/1.4942468  0.68
2015 Schmucker SW, Cress CD, Culbertson JC, Beeman JW, Dubon OD, Robinson JT. Raman signature of defected twisted bilayer graphene Carbon. 93: 250-257. DOI: 10.1016/J.Carbon.2015.05.076  0.68
2015 Lock EH, Delongchamp DM, Schmucker SW, Simpkins B, Laskoski M, Mulvaney SP, Hines DR, Baraket M, Hernandez SC, Robinson JT, Sheehan PE, Jaye C, Fisher DA, Walton SG. Dry graphene transfer print to polystyrene and ultra-high molecular weight polyethylene - Detailed chemical, structural, morphological and electrical characterization Carbon. 86: 288-300. DOI: 10.1016/J.Carbon.2015.01.048  0.68
2014 Lock EH, Hernández SC, Anderson TJ, Schmucker SW, Laskoski M, Mulvaney SP, Bezares FJ, Caldwell JD, Sheehan PE, Robinson JT, Feygelson BN, Walton SG. Etch free graphene transfer to polymers Surface and Coatings Technology. 241: 118-122. DOI: 10.1016/J.Surfcoat.2013.10.080  0.68
2014 Robinson ZR, Schmucker SW, McCreary KM, Cobas ED. Chemical Vapor Deposition of Two-Dimensional Crystals Handbook of Crystal Growth: Thin Films and Epitaxy: Second Edition. 3: 785-833. DOI: 10.1016/B978-0-444-63304-0.00019-6  0.68
2013 Robinson JT, Schmucker SW, Diaconescu CB, Long JP, Culbertson JC, Ohta T, Friedman AL, Beechem TE. Electronic hybridization of large-area stacked graphene films. Acs Nano. 7: 637-44. PMID 23240977 DOI: 10.1021/Nn304834P  0.68
2012 Schmucker SW, Kumar N, Abelson JR, Daly SR, Girolami GS, Bischof MR, Jaeger DL, Reidy RF, Gorman BP, Alexander J, Ballard JB, Randall JN, Lyding JW. Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. Nature Communications. 3: 935. PMID 22760634 DOI: 10.1038/Ncomms1907  0.68
2012 Wood JD, Schmucker SW, Haasch RT, Doidge GP, Nienhaus L, Damhorst GL, Lyons AS, Gruebele M, Bashir R, Pop E, Lyding JW. Improved graphene growth and fluorination on Cu with clean transfer to surfaces Proceedings of the Ieee Conference On Nanotechnology. DOI: 10.1109/NANO.2012.6322101  0.68
2011 Wood JD, Schmucker SW, Lyons AS, Pop E, Lyding JW. Effects of polycrystalline cu substrate on graphene growth by chemical vapor deposition. Nano Letters. 11: 4547-54. PMID 21942318 DOI: 10.1021/Nl201566C  0.68
2011 Xu Y, He KT, Schmucker SW, Guo Z, Koepke JC, Wood JD, Lyding JW, Aluru NR. Inducing electronic changes in graphene through silicon (100) substrate modification. Nano Letters. 11: 2735-42. PMID 21661740 DOI: 10.1021/Nl201022T  0.68
2010 Randall JN, Ballard JB, Lyding JW, Schmucker S, Von Ehr JR, Saini R, Xu H, Ding Y. Atomic precision patterning on Si: An opportunity for a digitized process Microelectronic Engineering. 87: 955-958. DOI: 10.1016/J.Mee.2009.11.143  0.68
2009 Choi H, Huang M, Ballard JB, He KT, Schmucker SW, Lyding JW, Randall JN, Cho K. Theoretical and experimental study of tip electronic structures in scanning tunneling microscope Materials Research Society Symposium Proceedings. 1177: 19-24. DOI: 10.1557/Proc-1177-Z06-03  0.68
2009 Randall JN, Lyding JW, Schmucker S, Von Ehr JR, Ballard J, Saini R, Xu H, Ding Y. Atomic precision lithography on Si Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2764-2768. DOI: 10.1116/1.3237096  0.68
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